{"id":"https://openalex.org/W2162220185","doi":"https://doi.org/10.1016/j.phpro.2011.10.008","title":"The Thermal Drift Characteristics of Piezoresistive Pressure Sensor","display_name":"The Thermal Drift Characteristics of Piezoresistive Pressure Sensor","publication_year":2011,"publication_date":"2011-01-01","ids":{"openalex":"https://openalex.org/W2162220185","doi":"https://doi.org/10.1016/j.phpro.2011.10.008","mag":"2162220185"},"language":"en","primary_location":{"id":"doi:10.1016/j.phpro.2011.10.008","doi":"https://doi.org/10.1016/j.phpro.2011.10.008","is_oa":true,"landing_page_url":"https://doi.org/10.1016/j.phpro.2011.10.008","pdf_url":null,"source":{"id":"https://openalex.org/S132457063","display_name":"Physics Procedia","issn_l":"1875-3892","issn":["1875-3892"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":"cc-by-nc-nd","license_id":"https://openalex.org/licenses/cc-by-nc-nd","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Physics Procedia","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://doi.org/10.1016/j.phpro.2011.10.008","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5072224267","display_name":"R. Otmani","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I233209018","display_name":"University of Abou Bekr Belka\u00efd","ror":"https://ror.org/00jsjm362","country_code":"DZ","type":"education","lineage":["https://openalex.org/I233209018"]}],"countries":["DZ"],"is_corresponding":false,"raw_author_name":"R. Otmani","raw_affiliation_strings":["Abou Bakr Belka\u00efd University of Tlemcen, BP 119, Tlemcen 13000, Algeria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Abou Bakr Belka\u00efd University of Tlemcen, BP 119, Tlemcen 13000, Algeria","institution_ids":["https://openalex.org/I233209018"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5091593495","display_name":"N. Benmoussa","orcid":"https://orcid.org/0009-0001-5226-5903","observed_orcids":["https://orcid.org/0009-0001-5226-5903"]},"institutions":[{"id":"https://openalex.org/I233209018","display_name":"University of Abou Bekr Belka\u00efd","ror":"https://ror.org/00jsjm362","country_code":"DZ","type":"education","lineage":["https://openalex.org/I233209018"]}],"countries":["DZ"],"is_corresponding":false,"raw_author_name":"N. Benmoussa","raw_affiliation_strings":["Abou Bakr Belka\u00efd University of Tlemcen, BP 119, Tlemcen 13000, Algeria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Abou Bakr Belka\u00efd University of Tlemcen, BP 119, Tlemcen 13000, Algeria","institution_ids":["https://openalex.org/I233209018"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5013019973","display_name":"B. Benyoucef","orcid":"https://orcid.org/0000-0003-1238-3267","observed_orcids":["https://orcid.org/0000-0003-1238-3267"]},"institutions":[{"id":"https://openalex.org/I233209018","display_name":"University of Abou Bekr Belka\u00efd","ror":"https://ror.org/00jsjm362","country_code":"DZ","type":"education","lineage":["https://openalex.org/I233209018"]}],"countries":["DZ"],"is_corresponding":false,"raw_author_name":"B. Benyoucef","raw_affiliation_strings":["Abou Bakr Belka\u00efd University of Tlemcen, BP 119, Tlemcen 13000, Algeria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Abou Bakr Belka\u00efd University of Tlemcen, BP 119, Tlemcen 13000, Algeria","institution_ids":["https://openalex.org/I233209018"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I233209018"],"apc_list":null,"apc_paid":null,"fwci":0.6495,"has_fulltext":false,"cited_by_count":43,"citation_normalized_percentile":{"value":0.71543586,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":98},"biblio":{"volume":"21","issue":null,"first_page":"47","last_page":"52"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10323","display_name":"Analog and Mixed-Signal Circuit Design","score":0.0013000000035390258,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12564","display_name":"Sensor Technology and Measurement Systems","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/piezoresistive-pressure-sensor","display_name":"piezoresistive pressure sensor","score":0.9359999895095825},{"id":"https://openalex.org/keywords/thermal-drift","display_name":"temperature drift","score":0.7900000214576721},{"id":"https://openalex.org/keywords/silicon-mems","display_name":"silicon MEMS","score":0.6880000233650208},{"id":"https://openalex.org/keywords/temperature-coefficient","display_name":"temperature coefficient","score":0.6420000195503235},{"id":"https://openalex.org/keywords/doping-concentration","display_name":"doping concentration","score":0.8679999709129333},{"id":"https://openalex.org/keywords/piezoresistive-gauges","display_name":"piezoresistive gauges","score":0.7319999933242798},{"id":"https://openalex.org/keywords/temperature-compensation","display_name":"temperature compensation","score":0.7089999914169312}],"concepts":[{"id":"https://openalex.org/C198490522","wikidata":"https://www.wikidata.org/wiki/Q1932915","display_name":"Piezoresistive effect","level":2,"score":0.7999156713485718},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7626751661300659},{"id":"https://openalex.org/C204530211","wikidata":"https://www.wikidata.org/wiki/Q752823","display_name":"Thermal","level":2,"score":0.6724224090576172},{"id":"https://openalex.org/C41325743","wikidata":"https://www.wikidata.org/wiki/Q1261040","display_name":"Pressure sensor","level":2,"score":0.6453894972801208},{"id":"https://openalex.org/C21200559","wikidata":"https://www.wikidata.org/wiki/Q7451068","display_name":"Sensitivity (control systems)","level":2,"score":0.5530748963356018},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.5342198014259338},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.44718632102012634},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.43856751918792725},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.1578461229801178},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.15413859486579895},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.12261304259300232},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1016/j.phpro.2011.10.008","doi":"https://doi.org/10.1016/j.phpro.2011.10.008","is_oa":true,"landing_page_url":"https://doi.org/10.1016/j.phpro.2011.10.008","pdf_url":null,"source":{"id":"https://openalex.org/S132457063","display_name":"Physics Procedia","issn_l":"1875-3892","issn":["1875-3892"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":"cc-by-nc-nd","license_id":"https://openalex.org/licenses/cc-by-nc-nd","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Physics Procedia","raw_type":"journal-article"},{"id":"pmh:oai:dspace.univ-tlemcen.dz:112/1916","doi":null,"is_oa":false,"landing_page_url":"https://dspace.univ-tlemcen.dz/handle/112/1916","pdf_url":null,"source":{"id":"https://openalex.org/S4406922607","display_name":"D\u00e9p\u00f4t Institutionnel de lUniversit\u00e9 de Tlemcen","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"Article"}],"best_oa_location":{"id":"doi:10.1016/j.phpro.2011.10.008","doi":"https://doi.org/10.1016/j.phpro.2011.10.008","is_oa":true,"landing_page_url":"https://doi.org/10.1016/j.phpro.2011.10.008","pdf_url":null,"source":{"id":"https://openalex.org/S132457063","display_name":"Physics Procedia","issn_l":"1875-3892","issn":["1875-3892"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":"cc-by-nc-nd","license_id":"https://openalex.org/licenses/cc-by-nc-nd","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Physics Procedia","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1503599968","https://openalex.org/W1971182532","https://openalex.org/W2075979955","https://openalex.org/W2120255193","https://openalex.org/W4232055785"],"related_works":["https://openalex.org/W2260712487","https://openalex.org/W2016239394","https://openalex.org/W4378879052","https://openalex.org/W2598878147","https://openalex.org/W1618072219","https://openalex.org/W4386576383","https://openalex.org/W6944999516","https://openalex.org/W4323251040","https://openalex.org/W1503599968","https://openalex.org/W4381165603"],"abstract_inverted_index":{"Piezoresistive":[0],"pressure":[1],"sensors":[2,26],"based":[3],"on":[4,85],"silicon":[5],"have":[6],"a":[7],"large":[8],"thermal":[9,22,62],"drift":[10],"because":[11],"of":[12,20,24,80,89],"their":[13],"high":[14],"sensitivity":[15],"to":[16,29,49,96,104],"temperature.":[17],"The":[18],"study":[19,93],"the":[21,31,35,52,55,61,78,86,90,98,110],"behavior":[23,100],"these":[25],"is":[27],"essential":[28],"define":[30],"parameters":[32],"that":[33],"cause":[34],"output":[36,87],"characteristics":[37,88],"drift.":[38],"In":[39],"this":[40,106],"study,":[41],"we":[42,69,76],"adopted":[43],"two":[44],"different":[45],"holes":[46],"mobility":[47,66],"models":[48,67],"determine":[50],"how":[51],"temperature":[53,81,102],"affect":[54],"sensor's":[56],"gauges":[57],"values.":[58],"We":[59],"calculated":[60,77],"coefficients":[63],"for":[64],"both":[65],"and":[68,82,103],"compared":[70],"them":[71],"with":[72],"experimental":[73],"results.":[74],"Finally,":[75],"effect":[79,107],"doping":[83,111],"concentration":[84],"sensor.":[91],"This":[92],"allows":[94],"us":[95],"predict":[97],"sensor":[99],"against":[101],"minimize":[105],"by":[108],"optimizing":[109],"concentration.":[112]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":3},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":3},{"year":2021,"cited_by_count":3},{"year":2020,"cited_by_count":6},{"year":2019,"cited_by_count":6},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":3}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2016-06-24T00:00:00"}