{"id":"https://openalex.org/W2156865010","doi":"https://doi.org/10.1557/proc-235-285","title":"Dependence of Buried CoSi2 Resistivity on ION Implantation and Annealing Conditions1","display_name":"Dependence of Buried CoSi2 Resistivity on ION Implantation and Annealing Conditions1","publication_year":1991,"publication_date":"1991-01-01","ids":{"openalex":"https://openalex.org/W2156865010","doi":"https://doi.org/10.1557/proc-235-285","mag":"2156865010"},"language":"en","primary_location":{"id":"doi:10.1557/proc-235-285","doi":"https://doi.org/10.1557/proc-235-285","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-235-285","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5039524036","display_name":"Fereydoon Namavar","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210163472","display_name":"Spire Corporation (United States)","ror":"https://ror.org/02yyv4c82","country_code":"US","type":"company","lineage":["https://openalex.org/I4210163472"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Fereydoon Namavar","raw_affiliation_strings":["Spire Corporation, Bedford, MA, 01730-2396, USA","Spire Corporation, Bedford, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Spire Corporation, Bedford, MA, 01730-2396, USA","institution_ids":["https://openalex.org/I4210163472"]},{"raw_affiliation_string":"Spire Corporation, Bedford, USA","institution_ids":["https://openalex.org/I4210163472"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045783899","display_name":"Nader M. Kalkhoran","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210163472","display_name":"Spire Corporation (United States)","ror":"https://ror.org/02yyv4c82","country_code":"US","type":"company","lineage":["https://openalex.org/I4210163472"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"N. M. Kalkhoran","raw_affiliation_strings":["Spire Corporation, Bedford, MA, 01730-2396, USA","Spire Corporation, Bedford, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Spire Corporation, Bedford, MA, 01730-2396, USA","institution_ids":["https://openalex.org/I4210163472"]},{"raw_affiliation_string":"Spire Corporation, Bedford, USA","institution_ids":["https://openalex.org/I4210163472"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046039189","display_name":"J. M. Manke","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210163472","display_name":"Spire Corporation (United States)","ror":"https://ror.org/02yyv4c82","country_code":"US","type":"company","lineage":["https://openalex.org/I4210163472"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. M. Manke","raw_affiliation_strings":["Spire Corporation, Bedford, MA, 01730-2396, USA","Spire Corporation, Bedford, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Spire Corporation, Bedford, MA, 01730-2396, USA","institution_ids":["https://openalex.org/I4210163472"]},{"raw_affiliation_string":"Spire Corporation, Bedford, USA","institution_ids":["https://openalex.org/I4210163472"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072422893","display_name":"Li Luo","orcid":"https://orcid.org/0000-0001-7975-0012","observed_orcids":["https://orcid.org/0000-0001-7975-0012","https://orcid.org/0000-0003-3402-5073"]},"institutions":[{"id":"https://openalex.org/I1343871089","display_name":"Los Alamos National Laboratory","ror":"https://ror.org/01e41cf67","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I1343871089","https://openalex.org/I198811213","https://openalex.org/I4210120050"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"L. Luo","raw_affiliation_strings":["Los Alamos National Laboratory, Los Alamos, NM, USA","Los Alamos National Laboratory, Los Alamos, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Los Alamos National Laboratory, Los Alamos, NM, USA","institution_ids":["https://openalex.org/I1343871089"]},{"raw_affiliation_string":"Los Alamos National Laboratory, Los Alamos, USA","institution_ids":["https://openalex.org/I1343871089"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5109114392","display_name":"Joseph T. McGinn","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I20089843","display_name":"Princeton University","ror":"https://ror.org/00hx57361","country_code":"US","type":"education","lineage":["https://openalex.org/I20089843"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. T. McGinn","raw_affiliation_strings":["David Sarnoff Research Center, Princeton, NJ","David Sarnoff Research Center, Princeton"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"David Sarnoff Research Center, Princeton, NJ","institution_ids":[]},{"raw_affiliation_string":"David Sarnoff Research Center, Princeton","institution_ids":["https://openalex.org/I20089843"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.9159,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.72869349,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"235","issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cosi2","display_name":"CoSi2","score":0.9010000228881836},{"id":"https://openalex.org/keywords/buried-layers","display_name":"buried layers","score":0.796999990940094},{"id":"https://openalex.org/keywords/ion-implantation","display_name":"ion implantation","score":0.9729999899864197},{"id":"https://openalex.org/keywords/annealing-temperature","display_name":"annealing temperature","score":0.8450000286102295},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.9800000190734863},{"id":"https://openalex.org/keywords/crystalline-quality","display_name":"crystal quality","score":0.9079999923706055},{"id":"https://openalex.org/keywords/implantation-temperature","display_name":"implantation temperature","score":0.6399999856948853},{"id":"https://openalex.org/keywords/x-ray-diffraction-linewidth","display_name":"X-ray diffraction linewidth","score":0.45899999141693115}],"concepts":[{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.8961321711540222},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8721024990081787},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.8092172145843506},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.5875898003578186},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.450580358505249},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4354105591773987},{"id":"https://openalex.org/C515602321","wikidata":"https://www.wikidata.org/wiki/Q740","display_name":"Cobalt","level":2,"score":0.4264664351940155},{"id":"https://openalex.org/C199289684","wikidata":"https://www.wikidata.org/wiki/Q83353","display_name":"Mineralogy","level":1,"score":0.3402751684188843},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.30503928661346436},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.05347946286201477},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.04733079671859741},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1557/proc-235-285","doi":"https://doi.org/10.1557/proc-235-285","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-235-285","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W2029229335","https://openalex.org/W2067218693","https://openalex.org/W2069190418","https://openalex.org/W2088410198","https://openalex.org/W2324024228","https://openalex.org/W2324658540","https://openalex.org/W2328649080","https://openalex.org/W2334127492","https://openalex.org/W3027537804"],"related_works":["https://openalex.org/W2916927051","https://openalex.org/W2018806170","https://openalex.org/W2002948543","https://openalex.org/W1988912089","https://openalex.org/W2020247321","https://openalex.org/W1973586642","https://openalex.org/W2080748503","https://openalex.org/W2325540439","https://openalex.org/W2026178554","https://openalex.org/W2029126070"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-09-25T08:18:29.962427","created_date":"2016-06-24T00:00:00"}