{"id":"https://openalex.org/W2153169574","doi":"https://doi.org/10.1002/sia.740110806","title":"Effect of analytical method on thickness measurements of thin oxide films","display_name":"Effect of analytical method on thickness measurements of thin oxide films","publication_year":1988,"publication_date":"1988-05-01","ids":{"openalex":"https://openalex.org/W2153169574","doi":"https://doi.org/10.1002/sia.740110806","mag":"2153169574"},"language":"en","primary_location":{"id":"doi:10.1002/sia.740110806","doi":"https://doi.org/10.1002/sia.740110806","is_oa":false,"landing_page_url":"https://doi.org/10.1002/sia.740110806","pdf_url":null,"source":{"id":"https://openalex.org/S114406758","display_name":"Surface and Interface Analysis","issn_l":"0142-2421","issn":["0142-2421","1096-9918"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Interface Analysis","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5050392090","display_name":"R.L. Tapping","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"R. L. Tapping","raw_affiliation_strings":["System Chemistry & Materials Branch, Chalk River Nuclear Laboratories, Chalk River, Ontario, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"System Chemistry & Materials Branch, Chalk River Nuclear Laboratories, Chalk River, Ontario, Canada","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113776078","display_name":"R. D. Davidson","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"R. D. Davidson","raw_affiliation_strings":["System Chemistry & Materials Branch, Chalk River Nuclear Laboratories, Chalk River, Ontario, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"System Chemistry & Materials Branch, Chalk River Nuclear Laboratories, Chalk River, Ontario, Canada","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111626223","display_name":"T. E. Jackman","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210159778","display_name":"National Research Council Canada","ror":"https://ror.org/04mte1k06","country_code":"CA","type":"government","lineage":["https://openalex.org/I4210159778"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"T. E. Jackman","raw_affiliation_strings":["Microstructural Sciences Laboratory, National Research Council of Canada, Ottawa, Ontario, Canada","Solid State Science Branch, Chalk River Nuclear Laboratories, Chalk River, Ontario, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Microstructural Sciences Laboratory, National Research Council of Canada, Ottawa, Ontario, Canada","institution_ids":["https://openalex.org/I4210159778"]},{"raw_affiliation_string":"Solid State Science Branch, Chalk River Nuclear Laboratories, Chalk River, Ontario, Canada","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5011172022","display_name":"John A. Davies","orcid":"https://orcid.org/0000-0002-3902-3387","observed_orcids":["https://orcid.org/0000-0002-3902-3387"]},"institutions":[{"id":"https://openalex.org/I98251732","display_name":"McMaster University","ror":"https://ror.org/02fa3aq29","country_code":"CA","type":"education","lineage":["https://openalex.org/I98251732"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"J. A. Davies","raw_affiliation_strings":["Department of Engineering Physics, McMaster University, Hamilton, Ontario, Canada","Solid State Science Branch, Chalk River Nuclear Laboratories, Chalk River, Ontario, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Engineering Physics, McMaster University, Hamilton, Ontario, Canada","institution_ids":["https://openalex.org/I98251732"]},{"raw_affiliation_string":"Solid State Science Branch, Chalk River Nuclear Laboratories, Chalk River, Ontario, Canada","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3580,"currency":"USD","value_usd":3580},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.23430864,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":96},"biblio":{"volume":"11","issue":"8","first_page":"441","last_page":"446"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.8583999872207642,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.8583999872207642,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.13590000569820404,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11733","display_name":"X-ray Spectroscopy and Fluorescence Analysis","score":0.0017000000225380063,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/oxide-thickness","display_name":"oxide thickness","score":0.828000009059906},{"id":"https://openalex.org/keywords/oxide-thin-films","display_name":"oxide thin films","score":0.7860000133514404},{"id":"https://openalex.org/keywords/natural-oxide-film","display_name":"natural oxide film","score":0.6549999713897705},{"id":"https://openalex.org/keywords/ion-beam-sputtering","display_name":"ion beam sputtering","score":0.7760000228881836},{"id":"https://openalex.org/keywords/ion-beam-effects","display_name":"ion beam effects","score":0.7680000066757202},{"id":"https://openalex.org/keywords/auger-electron-spectroscopy","display_name":"Auger electron spectroscopy","score":0.9639999866485596},{"id":"https://openalex.org/keywords/nuclear-reaction-analysis","display_name":"nuclear reaction analysis","score":0.9980000257492065},{"id":"https://openalex.org/keywords/angle-resolved-x-ray-photoelectron-spectroscopy","display_name":"angle-resolved X-ray photoelectron spectroscopy","score":0.9369999766349792},{"id":"https://openalex.org/keywords/silicon","display_name":"silicon","score":0.5220000147819519},{"id":"https://openalex.org/keywords/nickel","display_name":"nickel","score":0.9200000166893005},{"id":"https://openalex.org/keywords/aluminum","display_name":"aluminum","score":0.9980000257492065},{"id":"https://openalex.org/keywords/iron","display_name":"iron","score":0.9959999918937683},{"id":"https://openalex.org/keywords/tantalum","display_name":"tantalum","score":1.0},{"id":"https://openalex.org/keywords/zirconium","display_name":"zirconium","score":1.0}],"concepts":[{"id":"https://openalex.org/C25442681","wikidata":"https://www.wikidata.org/wiki/Q28087","display_name":"Auger electron spectroscopy","level":2,"score":0.8827222585678101},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.7835084199905396},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.7526822686195374},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6532187461853027},{"id":"https://openalex.org/C2780901251","wikidata":"https://www.wikidata.org/wiki/Q426473","display_name":"Silicide","level":3,"score":0.5940660834312439},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5798105597496033},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.557633101940155},{"id":"https://openalex.org/C50774322","wikidata":"https://www.wikidata.org/wiki/Q644248","display_name":"Ion beam","level":3,"score":0.5386552214622498},{"id":"https://openalex.org/C514619126","wikidata":"https://www.wikidata.org/wiki/Q1123","display_name":"Tantalum","level":2,"score":0.5242621898651123},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5158616900444031},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5082535147666931},{"id":"https://openalex.org/C2780839960","wikidata":"https://www.wikidata.org/wiki/Q2004543","display_name":"Nuclear reaction analysis","level":3,"score":0.48331117630004883},{"id":"https://openalex.org/C2780646311","wikidata":"https://www.wikidata.org/wiki/Q1142501","display_name":"Auger","level":2,"score":0.4768839180469513},{"id":"https://openalex.org/C534791751","wikidata":"https://www.wikidata.org/wiki/Q1038","display_name":"Zirconium","level":2,"score":0.4500293731689453},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.4018702805042267},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2780963182449341},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.14905592799186707},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.14465418457984924},{"id":"https://openalex.org/C46141821","wikidata":"https://www.wikidata.org/wiki/Q209402","display_name":"Nuclear magnetic resonance","level":1,"score":0.1331387460231781},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.07757186889648438},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/sia.740110806","doi":"https://doi.org/10.1002/sia.740110806","is_oa":false,"landing_page_url":"https://doi.org/10.1002/sia.740110806","pdf_url":null,"source":{"id":"https://openalex.org/S114406758","display_name":"Surface and Interface Analysis","issn_l":"0142-2421","issn":["0142-2421","1096-9918"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Interface Analysis","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":25,"referenced_works":["https://openalex.org/W139167184","https://openalex.org/W142785576","https://openalex.org/W1974595022","https://openalex.org/W1987990382","https://openalex.org/W1989545368","https://openalex.org/W2012014084","https://openalex.org/W2012022700","https://openalex.org/W2014447984","https://openalex.org/W2015773196","https://openalex.org/W2036892735","https://openalex.org/W2048253032","https://openalex.org/W2050579191","https://openalex.org/W2054881440","https://openalex.org/W2056045911","https://openalex.org/W2064067009","https://openalex.org/W2064740788","https://openalex.org/W2067023782","https://openalex.org/W2079540435","https://openalex.org/W2084953596","https://openalex.org/W2094967997","https://openalex.org/W2114112295","https://openalex.org/W2142103113","https://openalex.org/W2164216683","https://openalex.org/W2761063828","https://openalex.org/W4235536112"],"related_works":["https://openalex.org/W2012022700","https://openalex.org/W6983828123","https://openalex.org/W2054859303","https://openalex.org/W2000251960","https://openalex.org/W2078228197","https://openalex.org/W1970072817","https://openalex.org/W1902652627","https://openalex.org/W2316718571","https://openalex.org/W2071983948","https://openalex.org/W312113060"],"abstract_inverted_index":{"Abstract":[0],"The":[1],"thickness":[2],"of":[3,47],"thin":[4,55],"natural":[5],"oxide":[6,56],"films":[7],"formed":[8],"on":[9],"silicon,":[10],"nickel,":[11],"aluminium,":[12],"iron,":[13],"tantalum":[14],"and":[15,25,49],"zirconium":[16],"has":[17],"been":[18],"measured":[19],"using":[20],"nuclear":[21],"reaction":[22],"analysis":[23],"(NRA)":[24],"Auger":[26],"electron":[27],"spectroscopy":[28,68],"(AES)":[29],"in":[30,53],"combination":[31],"with":[32],"ion":[33,40,50],"beam":[34,41,51],"sputtering.":[35],"It":[36],"is":[37],"shown":[38],"that":[39],"effects":[42],"severely":[43],"limit":[44],"the":[45],"use":[46],"AES":[48],"sputtering":[52],"measuring":[54],"thicknesses.":[57],"Relatively":[58],"non\u2010destructive":[59],"techniques":[60],"such":[61],"as":[62],"NRA":[63],"or":[64],"angle\u2010resolved":[65],"x\u2010ray":[66],"photoelectron":[67],"(XPS)":[69],"provide":[70],"more":[71],"reliable":[72],"information.":[73]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2015,"cited_by_count":1}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}