{"id":"https://openalex.org/W2142911348","doi":"https://doi.org/10.1557/proc-591-207","title":"Characterization of nitrided silicon-silicon dioxide interfaces","display_name":"Characterization of nitrided silicon-silicon dioxide interfaces","publication_year":1999,"publication_date":"1999-01-01","ids":{"openalex":"https://openalex.org/W2142911348","doi":"https://doi.org/10.1557/proc-591-207","mag":"2142911348"},"language":"en","primary_location":{"id":"doi:10.1557/proc-591-207","doi":"https://doi.org/10.1557/proc-591-207","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-591-207","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5029398783","display_name":"Maria Luisa Polignano","orcid":"https://orcid.org/0000-0001-5441-1022","observed_orcids":["https://orcid.org/0000-0001-5441-1022"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"M. L. Polignano","raw_affiliation_strings":["20041 Agrate Brianza, MI, Italy","MI, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"20041 Agrate Brianza, MI, Italy","institution_ids":[]},{"raw_affiliation_string":"MI, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"M. Alessandri","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"M. Alessandri","raw_affiliation_strings":["20041 Agrate Brianza, MI, Italy","MI, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"20041 Agrate Brianza, MI, Italy","institution_ids":[]},{"raw_affiliation_string":"MI, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010788293","display_name":"Daniela Brazzelli","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"D. Brazzelli","raw_affiliation_strings":["20041 Agrate Brianza, MI, Italy","MI, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"20041 Agrate Brianza, MI, Italy","institution_ids":[]},{"raw_affiliation_string":"MI, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5035368314","display_name":"Barbara Crivelli","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"B. Crivelli","raw_affiliation_strings":["20041 Agrate Brianza, MI, Italy","MI, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"20041 Agrate Brianza, MI, Italy","institution_ids":[]},{"raw_affiliation_string":"MI, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5035694704","display_name":"Gabriella Ghidini","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"G. Ghidini","raw_affiliation_strings":["20041 Agrate Brianza, MI, Italy","MI, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"20041 Agrate Brianza, MI, Italy","institution_ids":[]},{"raw_affiliation_string":"MI, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083225583","display_name":"Romina Zonca","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"R. Zonca","raw_affiliation_strings":["20041 Agrate Brianza, MI, Italy","MI, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"20041 Agrate Brianza, MI, Italy","institution_ids":[]},{"raw_affiliation_string":"MI, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030550644","display_name":"A. P. Caricato","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A. P. Caricato","raw_affiliation_strings":["INFM-MDM, 20041 Agrate Brianza, MI, Italy","INFM-MDM, MI, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"INFM-MDM, 20041 Agrate Brianza, MI, Italy","institution_ids":[]},{"raw_affiliation_string":"INFM-MDM, MI, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079814380","display_name":"Massimo Bersani","orcid":"https://orcid.org/0000-0003-4062-5286","observed_orcids":["https://orcid.org/0000-0003-4062-5286"]},"institutions":[{"id":"https://openalex.org/I4405278068","display_name":"Istituto per la Ricerca Scientifica e Tecnologica","ror":"https://ror.org/04vrpj005","country_code":"IT","type":"facility","lineage":["https://openalex.org/I4405278068"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"M. Bersani","raw_affiliation_strings":["ITC-irst, 38050 Povo, Trento, Italy","ITC-irst, Trento, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ITC-irst, 38050 Povo, Trento, Italy","institution_ids":["https://openalex.org/I4405278068"]},{"raw_affiliation_string":"ITC-irst, Trento, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039616036","display_name":"M. Sbetti","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405278068","display_name":"Istituto per la Ricerca Scientifica e Tecnologica","ror":"https://ror.org/04vrpj005","country_code":"IT","type":"facility","lineage":["https://openalex.org/I4405278068"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"M. Sbetti","raw_affiliation_strings":["ITC-irst, 38050 Povo, Trento, Italy","ITC-irst, Trento, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ITC-irst, 38050 Povo, Trento, Italy","institution_ids":["https://openalex.org/I4405278068"]},{"raw_affiliation_string":"ITC-irst, Trento, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028147318","display_name":"L. Vanzetti","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405278068","display_name":"Istituto per la Ricerca Scientifica e Tecnologica","ror":"https://ror.org/04vrpj005","country_code":"IT","type":"facility","lineage":["https://openalex.org/I4405278068"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"L. Vanzetti","raw_affiliation_strings":["ITC-irst, 38050 Povo, Trento, Italy","ITC-irst, Trento, Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ITC-irst, 38050 Povo, Trento, Italy","institution_ids":["https://openalex.org/I4405278068"]},{"raw_affiliation_string":"ITC-irst, Trento, Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059738921","display_name":"G. C. Xing","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"G. C. Xing","raw_affiliation_strings":["Applied Materials, Santa Clara, Ca, USA","[Applied Materials, Santa Clara, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials, Santa Clara, Ca, USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"[Applied Materials, Santa Clara, USA]","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030711581","display_name":"Gary Miner","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"G.E. Miner","raw_affiliation_strings":["Applied Materials, Santa Clara, Ca, USA","[Applied Materials, Santa Clara, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials, Santa Clara, Ca, USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"[Applied Materials, Santa Clara, USA]","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002057231","display_name":"N. Astici","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"N. Astici","raw_affiliation_strings":["Applied Materials, Santa Clara, Ca, USA","[Applied Materials, Santa Clara, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials, Santa Clara, Ca, USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"[Applied Materials, Santa Clara, USA]","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5040767022","display_name":"Satheesh Kuppurao","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Kuppurao","raw_affiliation_strings":["Applied Materials, Santa Clara, Ca, USA","[Applied Materials, Santa Clara, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials, Santa Clara, Ca, USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"[Applied Materials, Santa Clara, USA]","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5109095289","display_name":"D. Lopes","orcid":"https://orcid.org/0009-0000-8964-9954","observed_orcids":["https://orcid.org/0009-0000-8964-9954"]},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. Lopes","raw_affiliation_strings":["Applied Materials, Santa Clara, Ca, USA","[Applied Materials, Santa Clara, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Applied Materials, Santa Clara, Ca, USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"[Applied Materials, Santa Clara, USA]","institution_ids":["https://openalex.org/I193427800"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.8551,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.75879476,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"591","issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.000699999975040555,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/si-sio2-interface","display_name":"Si/SiO2 interface","score":0.8109999895095825},{"id":"https://openalex.org/keywords/surface-recombination-velocity","display_name":"surface recombination velocity","score":0.9079999923706055},{"id":"https://openalex.org/keywords/surface-state-density","display_name":"surface state density","score":0.9020000100135803},{"id":"https://openalex.org/keywords/n2o-nitridation","display_name":"N2O nitridation","score":0.996999979019165},{"id":"https://openalex.org/keywords/n2-annealing","display_name":"N2 annealing","score":0.8659999966621399},{"id":"https://openalex.org/keywords/hydrogen-passivation","display_name":"hydrogen passivation","score":0.7910000085830688},{"id":"https://openalex.org/keywords/electrical-stress","display_name":"electrical stress","score":0.7870000004768372},{"id":"https://openalex.org/keywords/secondary-ion-mass-spectrometry","display_name":"secondary ion mass spectrometry","score":0.7620000243186951}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8294769525527954},{"id":"https://openalex.org/C13862629","wikidata":"https://www.wikidata.org/wiki/Q720899","display_name":"Nitriding","level":3,"score":0.7402721047401428},{"id":"https://openalex.org/C33574316","wikidata":"https://www.wikidata.org/wiki/Q917260","display_name":"Passivation","level":3,"score":0.6909123063087463},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6816051006317139},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.6793283224105835},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.5581421256065369},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5304614305496216},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.49015483260154724},{"id":"https://openalex.org/C537208039","wikidata":"https://www.wikidata.org/wiki/Q627","display_name":"Nitrogen","level":2,"score":0.4760546386241913},{"id":"https://openalex.org/C77671233","wikidata":"https://www.wikidata.org/wiki/Q556046","display_name":"Secondary ion mass spectrometry","level":3,"score":0.45387449860572815},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.272605836391449},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.24120214581489563},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.23753467202186584},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.23620638251304626},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.213614821434021},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.18961811065673828},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.07339814305305481},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1557/proc-591-207","doi":"https://doi.org/10.1557/proc-591-207","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-591-207","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W125753325","https://openalex.org/W1488501388","https://openalex.org/W1977190716","https://openalex.org/W2026854929","https://openalex.org/W2038482556","https://openalex.org/W2052328608","https://openalex.org/W2070999600"],"related_works":["https://openalex.org/W2010515804","https://openalex.org/W2262062489","https://openalex.org/W7217216729","https://openalex.org/W2061420139","https://openalex.org/W2138386551","https://openalex.org/W1972901390","https://openalex.org/W7160853240","https://openalex.org/W2002310569","https://openalex.org/W1993798671","https://openalex.org/W1978940787"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-14T16:39:01.820549","created_date":"2016-06-24T00:00:00"}