{"id":"https://openalex.org/W2139374688","doi":"https://doi.org/10.1109/20.333947","title":"Thick and stress-free Sendust films on silicon for recording head cores","display_name":"Thick and stress-free Sendust films on silicon for recording head cores","publication_year":1994,"publication_date":"1994-01-01","ids":{"openalex":"https://openalex.org/W2139374688","doi":"https://doi.org/10.1109/20.333947","mag":"2139374688"},"language":"en","primary_location":{"id":"doi:10.1109/20.333947","doi":"https://doi.org/10.1109/20.333947","is_oa":false,"landing_page_url":"https://doi.org/10.1109/20.333947","pdf_url":null,"source":{"id":"https://openalex.org/S50523690","display_name":"IEEE Transactions on Magnetics","issn_l":"0018-9464","issn":["0018-9464","1941-0069"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320755","host_organization_name":"IEEE Magnetics Society","host_organization_lineage":["https://openalex.org/P4310320755","https://openalex.org/P4310319808"],"host_organization_lineage_names":["IEEE Magnetics Society","Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Magnetics","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5110103084","display_name":"J. Daval","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. Daval","raw_affiliation_strings":["LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","LETI, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I3020098449","https://openalex.org/I4210150049"]},{"raw_affiliation_string":"LETI, Grenoble, France","institution_ids":["https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034118797","display_name":"Bernard B\u00e9chevet","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"B. Bechevet","raw_affiliation_strings":["LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","LETI, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I3020098449","https://openalex.org/I4210150049"]},{"raw_affiliation_string":"LETI, Grenoble, France","institution_ids":["https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":null,"display_name":"J. Arroyo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. Arroyo","raw_affiliation_strings":["LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","LETI, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I3020098449","https://openalex.org/I4210150049"]},{"raw_affiliation_string":"LETI, Grenoble, France","institution_ids":["https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076515633","display_name":"B. Valon","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"B. Valon","raw_affiliation_strings":["LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","LETI, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I3020098449","https://openalex.org/I4210150049"]},{"raw_affiliation_string":"LETI, Grenoble, France","institution_ids":["https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111924221","display_name":"M. Armand","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"M.F. Armand","raw_affiliation_strings":["LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","LETI, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I3020098449","https://openalex.org/I4210150049"]},{"raw_affiliation_string":"LETI, Grenoble, France","institution_ids":["https://openalex.org/I4210150049"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5065459052","display_name":"H\u00e9l\u00e8ne Joisten","orcid":"https://orcid.org/0000-0001-8346-8749","observed_orcids":["https://orcid.org/0000-0001-8346-8749"]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I3020098449","display_name":"CEA Grenoble","ror":"https://ror.org/02mg6n827","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"H. Joisten","raw_affiliation_strings":["LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","LETI, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LETI, CEA-Technologies Avancees, DMEL-CENG, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I3020098449","https://openalex.org/I4210150049"]},{"raw_affiliation_string":"LETI, Grenoble, France","institution_ids":["https://openalex.org/I4210150049"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2645,"currency":"USD","value_usd":2645},"apc_paid":null,"fwci":0.4895,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.61994119,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"30","issue":"6","first_page":"3930","last_page":"3932"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10049","display_name":"Magnetic properties of thin films","score":0.46560001373291016,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10049","display_name":"Magnetic properties of thin films","score":0.46560001373291016,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11222","display_name":"Magnetic Properties and Applications","score":0.24040000140666962,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.22579999268054962,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-substrate","display_name":"silicon substrate","score":0.8190000057220459},{"id":"https://openalex.org/keywords/thermal-expansion-mismatch","display_name":"thermal expansion mismatch","score":0.800000011920929},{"id":"https://openalex.org/keywords/facing-target-sputtering","display_name":"facing targets sputtering","score":0.921999990940094},{"id":"https://openalex.org/keywords/nitrogen-atmosphere","display_name":"nitrogen atmosphere","score":0.6990000009536743},{"id":"https://openalex.org/keywords/film-microstructure","display_name":"film microstructure","score":0.8119999766349792},{"id":"https://openalex.org/keywords/rapid-thermal-annealing","display_name":"rapid thermal annealing","score":0.8399999737739563},{"id":"https://openalex.org/keywords/compressive-stress","display_name":"compressive stress","score":0.7870000004768372},{"id":"https://openalex.org/keywords/thin-film-adhesion","display_name":"film adhesion","score":0.75}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7143206596374512},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.6443177461624146},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.6430471539497375},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.5799922347068787},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5758207440376282},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.565171480178833},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.4722316265106201},{"id":"https://openalex.org/C2780312720","wikidata":"https://www.wikidata.org/wiki/Q5689100","display_name":"Head (geology)","level":2,"score":0.42725878953933716},{"id":"https://openalex.org/C537208039","wikidata":"https://www.wikidata.org/wiki/Q627","display_name":"Nitrogen","level":2,"score":0.4100395441055298},{"id":"https://openalex.org/C46141821","wikidata":"https://www.wikidata.org/wiki/Q209402","display_name":"Nuclear magnetic resonance","level":1,"score":0.3559211492538452},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.34305238723754883},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.25104188919067383},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.19028282165527344},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.10689318180084229},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09519428014755249},{"id":"https://openalex.org/C114793014","wikidata":"https://www.wikidata.org/wiki/Q52109","display_name":"Geomorphology","level":1,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/20.333947","doi":"https://doi.org/10.1109/20.333947","is_oa":false,"landing_page_url":"https://doi.org/10.1109/20.333947","pdf_url":null,"source":{"id":"https://openalex.org/S50523690","display_name":"IEEE Transactions on Magnetics","issn_l":"0018-9464","issn":["0018-9464","1941-0069"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320755","host_organization_name":"IEEE Magnetics Society","host_organization_lineage":["https://openalex.org/P4310320755","https://openalex.org/P4310319808"],"host_organization_lineage_names":["IEEE Magnetics Society","Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Magnetics","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1976644628","https://openalex.org/W2055046817","https://openalex.org/W2066695683","https://openalex.org/W2066874036","https://openalex.org/W2114133201","https://openalex.org/W2165130110"],"related_works":["https://openalex.org/W2076011504","https://openalex.org/W1634523641","https://openalex.org/W2089838652","https://openalex.org/W2172451033","https://openalex.org/W2022123714","https://openalex.org/W2150671652","https://openalex.org/W2076117051","https://openalex.org/W2134512315","https://openalex.org/W1972917951","https://openalex.org/W1642613824"],"abstract_inverted_index":{"LETI's":[0],"recording":[1],"heads":[2],"technology":[3],"requires":[4],"the":[5],"deposition":[6],"of":[7,23],"thick":[8],"Sendust":[9],"films":[10],"on":[11,53],"silicon":[12],"substrates,":[13],"both":[14],"materials":[15],"having":[16],"very":[17],"different":[18],"thermal":[19,65],"expansion":[20],"coefficients.":[21],"Despite":[22],"this":[24],"unfavorable":[25],"condition,":[26],"adherent":[27],"and":[28],"stress-controlled":[29],"films,":[30],"up":[31],"to":[32],"10":[33],"/spl":[34],"mu/m":[35],"thick,":[36],"have":[37],"first":[38],"been":[39,60],"obtained":[40],"by":[41,62],"facing":[42],"target":[43],"sputtering":[44],"under":[45],"Ar+":[46],"nitrogen":[47],"atmosphere":[48],"whose":[49],"influence":[50],"is":[51],"great":[52],"films'":[54],"microstructure.":[55],"Stress-free":[56],"state":[57],"has":[58],"then":[59],"achieved":[61],"cumulative":[63],"rapid":[64],"annealing":[66],"when":[67],"starting":[68],"from":[69],"compressive":[70],"stress-induced":[71],"films.>":[72]},"counts_by_year":[],"updated_date":"2026-10-02T10:15:12.560889","created_date":"2016-06-24T00:00:00"}