{"id":"https://openalex.org/W2138201532","doi":"https://doi.org/10.1016/j.ultramic.2004.11.015","title":"Dip Pen Nanolithography (DPN): process and instrument performance with NanoInk's Nscriptor system","display_name":"Dip Pen Nanolithography (DPN): process and instrument performance with NanoInk's Nscriptor system","publication_year":2004,"publication_date":"2004-12-29","ids":{"openalex":"https://openalex.org/W2138201532","doi":"https://doi.org/10.1016/j.ultramic.2004.11.015","mag":"2138201532","pmid":"https://pubmed.ncbi.nlm.nih.gov/15774273"},"language":"en","primary_location":{"id":"doi:10.1016/j.ultramic.2004.11.015","doi":"https://doi.org/10.1016/j.ultramic.2004.11.015","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.ultramic.2004.11.015","pdf_url":null,"source":{"id":"https://openalex.org/S27731274","display_name":"Ultramicroscopy","issn_l":"0304-3991","issn":["0304-3991","1879-2723"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-a","jufo-1","ki-jl-1","medline","norway-1","poland-140","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Ultramicroscopy","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","pubmed"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5008077391","display_name":"Jason R. Haaheim","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"Jason Haaheim","raw_affiliation_strings":["NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA. jhaaheim@nanoink.net","NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA. jhaaheim@nanoink.net","institution_ids":[]},{"raw_affiliation_string":"NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"Ray Eby","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Ray Eby","raw_affiliation_strings":["NanoInk, Inc., MEMS Fabrication, 215 East Hacienda Avenue, Campbell, CA 95008-6616, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., MEMS Fabrication, 215 East Hacienda Avenue, Campbell, CA 95008-6616, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004106297","display_name":"Mike Nelson","orcid":"https://orcid.org/0000-0003-0029-3678","observed_orcids":["https://orcid.org/0000-0003-0029-3678"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mike Nelson","raw_affiliation_strings":["NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007643821","display_name":"Joe Fragala","orcid":"https://orcid.org/0000-0002-8802-6672","observed_orcids":["https://orcid.org/0000-0002-8802-6672"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Joe Fragala","raw_affiliation_strings":["NanoInk, Inc., MEMS Fabrication, 215 East Hacienda Avenue, Campbell, CA 95008-6616, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., MEMS Fabrication, 215 East Hacienda Avenue, Campbell, CA 95008-6616, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112510292","display_name":"Bjoern Rosner","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Bjoern Rosner","raw_affiliation_strings":["NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100408669","display_name":"Hua Zhang","orcid":"https://orcid.org/0000-0001-9518-740X","observed_orcids":["https://orcid.org/0000-0001-9518-740X","https://orcid.org/0000-0001-5349-505X","https://orcid.org/0009-0006-0636-4499","https://orcid.org/0000-0001-5853-8928","https://orcid.org/0000-0001-9112-7397"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hua Zhang","raw_affiliation_strings":["NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5080981668","display_name":"Greg Athas","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Greg Athas","raw_affiliation_strings":["NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Corporate Office, 1335 W. Randolph Street, Chicago, IL 60607-1523, USA","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":["https://openalex.org/A5008077391"],"corresponding_institution_ids":[],"apc_list":{"value":3760,"currency":"USD","value_usd":3760},"apc_paid":null,"fwci":2.3855,"has_fulltext":false,"cited_by_count":91,"citation_normalized_percentile":{"value":0.8810195,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":99},"biblio":{"volume":"103","issue":"2","first_page":"117","last_page":"132"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.0008999999845400453,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10923","display_name":"Force Microscopy Techniques and Applications","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/dip-pen-nanolithography","display_name":"dip-pen nanolithography","score":0.9990000128746033},{"id":"https://openalex.org/keywords/tip-radius","display_name":"tip radius","score":0.6970000267028809},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.9419999718666077},{"id":"https://openalex.org/keywords/line-edge-roughness","display_name":"line edge roughness","score":0.9980000257492065},{"id":"https://openalex.org/keywords/direct-write-patterning","display_name":"direct-write patterning","score":0.7250000238418579},{"id":"https://openalex.org/keywords/feature-size-control","display_name":"feature size control","score":0.5839999914169312},{"id":"https://openalex.org/keywords/photomask-repair","display_name":"photomask repair","score":0.6819999814033508},{"id":"https://openalex.org/keywords/nanodevice-fabrication","display_name":"nanodevice fabrication","score":0.8370000123977661}],"concepts":[{"id":"https://openalex.org/C162117346","wikidata":"https://www.wikidata.org/wiki/Q1106386","display_name":"Nanolithography","level":4,"score":0.8511388301849365},{"id":"https://openalex.org/C45206210","wikidata":"https://www.wikidata.org/wiki/Q2415817","display_name":"Nanoscopic scale","level":2,"score":0.749902069568634},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.6590701341629028},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6458413600921631},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.6300371885299683},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.5883108377456665},{"id":"https://openalex.org/C2909374376","wikidata":"https://www.wikidata.org/wiki/Q2726733","display_name":"Nanodevice","level":2,"score":0.5395699143409729},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5385231971740723},{"id":"https://openalex.org/C14737013","wikidata":"https://www.wikidata.org/wiki/Q1319657","display_name":"Photomask","level":4,"score":0.5350161194801331},{"id":"https://openalex.org/C148402106","wikidata":"https://www.wikidata.org/wiki/Q1549529","display_name":"Nanometrology","level":3,"score":0.532254159450531},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.48784756660461426},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.46656954288482666},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.44739025831222534},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.4221421480178833},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4100074768066406},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3346985876560211},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.20954501628875732},{"id":"https://openalex.org/C102951782","wikidata":"https://www.wikidata.org/wiki/Q49295","display_name":"Atomic force microscopy","level":2,"score":0.18203866481781006},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.08167937397956848},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.06929701566696167},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1016/j.ultramic.2004.11.015","doi":"https://doi.org/10.1016/j.ultramic.2004.11.015","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.ultramic.2004.11.015","pdf_url":null,"source":{"id":"https://openalex.org/S27731274","display_name":"Ultramicroscopy","issn_l":"0304-3991","issn":["0304-3991","1879-2723"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-a","jufo-1","ki-jl-1","medline","norway-1","poland-140","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Ultramicroscopy","raw_type":"journal-article"},{"id":"pmid:15774273","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/15774273","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Ultramicroscopy","raw_type":"Journal Article"},{"id":"pmh:oai:dr.ntu.edu.sg:10356/97256","doi":null,"is_oa":false,"landing_page_url":"http://hdl.handle.net/10220/10515","pdf_url":null,"source":{"id":"https://openalex.org/S4306402609","display_name":"DR-NTU (Nanyang Technological University)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I172675005","host_organization_name":"Nanyang Technological University","host_organization_lineage":["https://openalex.org/I172675005"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"Journal Article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":33,"referenced_works":["https://openalex.org/W241973020","https://openalex.org/W1942155421","https://openalex.org/W1964373062","https://openalex.org/W1971603790","https://openalex.org/W1972613500","https://openalex.org/W1979069790","https://openalex.org/W1983684958","https://openalex.org/W1986501756","https://openalex.org/W1992679299","https://openalex.org/W1994583662","https://openalex.org/W1997268642","https://openalex.org/W2004485937","https://openalex.org/W2005098437","https://openalex.org/W2014075865","https://openalex.org/W2015498249","https://openalex.org/W2018399372","https://openalex.org/W2021826257","https://openalex.org/W2032429811","https://openalex.org/W2033339276","https://openalex.org/W2041510947","https://openalex.org/W2051170838","https://openalex.org/W2052453596","https://openalex.org/W2058013701","https://openalex.org/W2062070676","https://openalex.org/W2067787859","https://openalex.org/W2069005915","https://openalex.org/W2069601286","https://openalex.org/W2103184742","https://openalex.org/W2105569600","https://openalex.org/W2139246110","https://openalex.org/W2152966127","https://openalex.org/W2313330516","https://openalex.org/W3150248096"],"related_works":["https://openalex.org/W2021826257","https://openalex.org/W2327237961","https://openalex.org/W2804408297","https://openalex.org/W2070822989","https://openalex.org/W2262582895","https://openalex.org/W1965872039","https://openalex.org/W4252160879","https://openalex.org/W2042050393","https://openalex.org/W1984377271","https://openalex.org/W2359469362"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":2},{"year":2023,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":6},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":9}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}