{"id":"https://openalex.org/W2130180337","doi":"https://doi.org/10.1557/proc-181-389","title":"Interfacial Microstructure and Carrier Conduction Process in Pt/Ti Ohmic Contact to P-In0.53Ga0.47As Formed by Rapid Thermal Processing","display_name":"Interfacial Microstructure and Carrier Conduction Process in Pt/Ti Ohmic Contact to P-In0.53Ga0.47As Formed by Rapid Thermal Processing","publication_year":1990,"publication_date":"1990-01-01","ids":{"openalex":"https://openalex.org/W2130180337","doi":"https://doi.org/10.1557/proc-181-389","mag":"2130180337"},"language":"en","primary_location":{"id":"doi:10.1557/proc-181-389","doi":"https://doi.org/10.1557/proc-181-389","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-181-389","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113306138","display_name":"S. N. G. Chu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S.N.G. Chu","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey, 07974"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey, 07974","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068212478","display_name":"Avishay Katz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. Katz","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey, 07974"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey, 07974","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113626316","display_name":"T. Boone","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"T. Boone","raw_affiliation_strings":["AT&T Bell Laboratories Murray Hill, New Jersey 07974"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories Murray Hill, New Jersey 07974","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"middle","author":{"id":null,"display_name":"P.M. Thomas","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"P.M. Thomas","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey, 07974"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey, 07974","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065229123","display_name":"V. G. Riggs","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"V.G. Riggs","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey, 07974"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey, 07974","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018085591","display_name":"William C. Dautremont-Smith","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"W.C. Dautremont-Smith","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey, 07974"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey, 07974","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"last","author":{"id":null,"display_name":"W.D. Johnson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"W.D. Johnson","raw_affiliation_strings":["AT&T Bell Laboratories Murray Hill, New Jersey 07974"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories Murray Hill, New Jersey 07974","institution_ids":["https://openalex.org/I1283103587"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I1283103587"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.2281054,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"181","issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12371","display_name":"Electrical Contact Performance and Analysis","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ingaas","display_name":"InGaAs","score":0.8349999785423279},{"id":"https://openalex.org/keywords/rapid-thermal-processing","display_name":"rapid thermal processing","score":0.8889999985694885},{"id":"https://openalex.org/keywords/interfacial-microstructure","display_name":"interfacial microstructure","score":0.8600000143051147},{"id":"https://openalex.org/keywords/specific-contact-resistivity","display_name":"specific contact resistance","score":0.9139999747276306},{"id":"https://openalex.org/keywords/interdiffusion","display_name":"interdiffusion","score":0.7490000128746033},{"id":"https://openalex.org/keywords/solid-state-synthesis","display_name":"solid-state synthesis","score":0.6769999861717224},{"id":"https://openalex.org/keywords/thermionic-emission","display_name":"thermionic emission","score":0.8989999890327454},{"id":"https://openalex.org/keywords/field-emission","display_name":"field emission","score":0.9599999785423279},{"id":"https://openalex.org/keywords/tunneling-conduction","display_name":"tunneling conduction","score":0.8270000219345093},{"id":"https://openalex.org/keywords/barrier-height","display_name":"barrier height","score":0.3529999852180481}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.9081836938858032},{"id":"https://openalex.org/C138230450","wikidata":"https://www.wikidata.org/wiki/Q2016597","display_name":"Ohmic contact","level":3,"score":0.784886360168457},{"id":"https://openalex.org/C123671423","wikidata":"https://www.wikidata.org/wiki/Q332329","display_name":"Contact resistance","level":3,"score":0.7722283601760864},{"id":"https://openalex.org/C143979616","wikidata":"https://www.wikidata.org/wiki/Q215259","display_name":"Thermionic emission","level":3,"score":0.7307278513908386},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.7293686270713806},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.5182823538780212},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.49298569560050964},{"id":"https://openalex.org/C6556556","wikidata":"https://www.wikidata.org/wiki/Q899239","display_name":"Contact angle","level":2,"score":0.43717387318611145},{"id":"https://openalex.org/C172100665","wikidata":"https://www.wikidata.org/wiki/Q7465774","display_name":"Thermal conduction","level":2,"score":0.4261315166950226},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.31189826130867004},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.21096912026405334},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.1561327576637268},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1557/proc-181-389","doi":"https://doi.org/10.1557/proc-181-389","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-181-389","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W1491885026","https://openalex.org/W1965899739","https://openalex.org/W1969642972","https://openalex.org/W2012793415","https://openalex.org/W2019288175","https://openalex.org/W2022215170","https://openalex.org/W2023263526","https://openalex.org/W2042795714","https://openalex.org/W2046860538","https://openalex.org/W2060939198","https://openalex.org/W2070982010","https://openalex.org/W2072310177","https://openalex.org/W2072381639","https://openalex.org/W2076180599","https://openalex.org/W2079050304","https://openalex.org/W2090622301","https://openalex.org/W2132843769","https://openalex.org/W2136400943","https://openalex.org/W2146218849","https://openalex.org/W2243194799"],"related_works":["https://openalex.org/W1981009513","https://openalex.org/W2057446135","https://openalex.org/W2042795714","https://openalex.org/W2094574050","https://openalex.org/W2057826025","https://openalex.org/W2030611610","https://openalex.org/W2012793415","https://openalex.org/W4416800820","https://openalex.org/W2148612027","https://openalex.org/W1980994771"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}