{"id":"https://openalex.org/W2125889367","doi":"https://doi.org/10.1557/proc-795-u5.31","title":"In Situ, Real-Time Curvature Imaging During Chemical Vapor Deposition","display_name":"In Situ, Real-Time Curvature Imaging During Chemical Vapor Deposition","publication_year":2003,"publication_date":"2003-01-01","ids":{"openalex":"https://openalex.org/W2125889367","doi":"https://doi.org/10.1557/proc-795-u5.31","mag":"2125889367"},"language":"en","primary_location":{"id":"doi:10.1557/proc-795-u5.31","doi":"https://doi.org/10.1557/proc-795-u5.31","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-795-u5.31","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101962478","display_name":"David A. Boyd","orcid":"https://orcid.org/0000-0002-0427-5840","observed_orcids":["https://orcid.org/0000-0002-0427-5840"]},"institutions":[{"id":"https://openalex.org/I122411786","display_name":"California Institute of Technology","ror":"https://ror.org/05dxps055","country_code":"US","type":"education","lineage":["https://openalex.org/I122411786"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"David A. Boyd","raw_affiliation_strings":["Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA","Division of Engineering and Applied Science California Institute of Technology Pasadena, CA 91125"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA","institution_ids":["https://openalex.org/I122411786"]},{"raw_affiliation_string":"Division of Engineering and Applied Science California Institute of Technology Pasadena, CA 91125","institution_ids":["https://openalex.org/I122411786"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046459253","display_name":"Ashok Burton Tripathi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I122411786","display_name":"California Institute of Technology","ror":"https://ror.org/05dxps055","country_code":"US","type":"education","lineage":["https://openalex.org/I122411786"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ashok B. Tripathi","raw_affiliation_strings":["Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA","Division of Engineering and Applied Science California Institute of Technology Pasadena, CA 91125"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA","institution_ids":["https://openalex.org/I122411786"]},{"raw_affiliation_string":"Division of Engineering and Applied Science California Institute of Technology Pasadena, CA 91125","institution_ids":["https://openalex.org/I122411786"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5036669660","display_name":"Mohamed Y. El\u2010Naggar","orcid":"https://orcid.org/0000-0001-5599-6309","observed_orcids":["https://orcid.org/0000-0001-5599-6309"]},"institutions":[{"id":"https://openalex.org/I122411786","display_name":"California Institute of Technology","ror":"https://ror.org/05dxps055","country_code":"US","type":"education","lineage":["https://openalex.org/I122411786"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Mohamed El-Naggar","raw_affiliation_strings":["Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA","Division of Engineering and Applied Science California Institute of Technology Pasadena, CA 91125"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA","institution_ids":["https://openalex.org/I122411786"]},{"raw_affiliation_string":"Division of Engineering and Applied Science California Institute of Technology Pasadena, CA 91125","institution_ids":["https://openalex.org/I122411786"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5075132801","display_name":"David G. Goodwin","orcid":"https://orcid.org/0000-0002-5979-3581","observed_orcids":["https://orcid.org/0000-0002-5979-3581"]},"institutions":[{"id":"https://openalex.org/I122411786","display_name":"California Institute of Technology","ror":"https://ror.org/05dxps055","country_code":"US","type":"education","lineage":["https://openalex.org/I122411786"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"David G. Goodwin","raw_affiliation_strings":["Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA","Division of Engineering and Applied Science California Institute of Technology Pasadena, CA 91125"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA","institution_ids":["https://openalex.org/I122411786"]},{"raw_affiliation_string":"Division of Engineering and Applied Science California Institute of Technology Pasadena, CA 91125","institution_ids":["https://openalex.org/I122411786"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I122411786"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"795","issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.4771000146865845,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.4771000146865845,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.33959999680519104,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10107","display_name":"Ferroelectric and Piezoelectric Materials","score":0.010400000028312206,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/coherent-gradient-sensing","display_name":"coherent gradient sensing","score":0.902999997138977},{"id":"https://openalex.org/keywords/thin-film-stress","display_name":"film stress","score":0.5920000076293945},{"id":"https://openalex.org/keywords/stoney-s-equation","display_name":"Stoney's equation","score":0.7839999794960022},{"id":"https://openalex.org/keywords/chemical-vapor-deposition","display_name":"chemical vapor deposition","score":0.7649999856948853},{"id":"https://openalex.org/keywords/in-situ-diagnostics","display_name":"in situ diagnostics","score":0.7390000224113464},{"id":"https://openalex.org/keywords/thin-films","display_name":"thin films","score":0.6539999842643738},{"id":"https://openalex.org/keywords/oxygen-diffusion","display_name":"oxygen diffusion","score":0.800000011920929},{"id":"https://openalex.org/keywords/yba2cu3o7-delta","display_name":"YBa2Cu3O7-\u03b4","score":0.9580000042915344},{"id":"https://openalex.org/keywords/lead-zirconate-titanate","display_name":"lead zirconate titanate","score":0.6589999794960022}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8318527936935425},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.7939969301223755},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6909278035163879},{"id":"https://openalex.org/C183866003","wikidata":"https://www.wikidata.org/wiki/Q515503","display_name":"Combustion chemical vapor deposition","level":4,"score":0.6770443916320801},{"id":"https://openalex.org/C2777822432","wikidata":"https://www.wikidata.org/wiki/Q216681","display_name":"In situ","level":2,"score":0.6178191304206848},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.5948059558868408},{"id":"https://openalex.org/C195065555","wikidata":"https://www.wikidata.org/wiki/Q214881","display_name":"Curvature","level":2,"score":0.5132998824119568},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.501284122467041},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.48929187655448914},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.4215278923511505},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.36411577463150024},{"id":"https://openalex.org/C75937256","wikidata":"https://www.wikidata.org/wiki/Q1440781","display_name":"Carbon film","level":3,"score":0.3623262345790863},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3367948532104492},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.33344578742980957},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3211804926395416},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.10588952898979187},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.06802365183830261},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.061624616384506226},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1557/proc-795-u5.31","doi":"https://doi.org/10.1557/proc-795-u5.31","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-795-u5.31","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320306076","display_name":"National Science Foundation","ror":"https://ror.org/021nxhr62"},{"id":"https://openalex.org/F4320332180","display_name":"Defense Advanced Research Projects Agency","ror":"https://ror.org/02caytj08"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":10,"referenced_works":["https://openalex.org/W1485468957","https://openalex.org/W1969834273","https://openalex.org/W1990428638","https://openalex.org/W1995990002","https://openalex.org/W2043364368","https://openalex.org/W2066874036","https://openalex.org/W2073775762","https://openalex.org/W2240291377","https://openalex.org/W2335003959","https://openalex.org/W2990165439"],"related_works":["https://openalex.org/W2117374916","https://openalex.org/W2334596902","https://openalex.org/W2011341620","https://openalex.org/W4253888343","https://openalex.org/W2095601783","https://openalex.org/W7096497356","https://openalex.org/W2044750148","https://openalex.org/W2610560152","https://openalex.org/W2083846215","https://openalex.org/W2092593195"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}