{"id":"https://openalex.org/W2108072002","doi":"https://doi.org/10.1117/12.485383","title":"Layer-specific illumination optimization by Monte Carlo method","display_name":"Layer-specific illumination optimization by Monte Carlo method","publication_year":2003,"publication_date":"2003-06-25","ids":{"openalex":"https://openalex.org/W2108072002","doi":"https://doi.org/10.1117/12.485383","mag":"2108072002"},"language":"en","primary_location":{"id":"doi:10.1117/12.485383","doi":"https://doi.org/10.1117/12.485383","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.485383","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5077330974","display_name":"Hochul Kim","orcid":"https://orcid.org/0000-0002-6090-9537","observed_orcids":["https://orcid.org/0000-0002-6090-9537"]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Ho-Chul Kim","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069916118","display_name":"Dong-Seok Nam","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Dong-Seok Nam","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113554593","display_name":"Chan Hwang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Chan Hwang","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110192222","display_name":"Young Seog Kang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Young S. Kang","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113536050","display_name":"Sang-Gyun Woo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sang-Gyun Woo","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061761135","display_name":"Han-Ku Cho","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Han-Ku Cho","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5108715589","display_name":"Woo-Sung Han","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Woo-Sung Han","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4405259277"],"apc_list":null,"apc_paid":null,"fwci":2.2425,"has_fulltext":false,"cited_by_count":8,"citation_normalized_percentile":{"value":0.87999725,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"5040","issue":null,"first_page":"244","last_page":"244"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0013000000035390258,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/lighting-optimization","display_name":"lighting optimization","score":0.8090000152587891},{"id":"https://openalex.org/keywords/low-k1-lithography","display_name":"low-k1 lithography","score":0.8119999766349792},{"id":"https://openalex.org/keywords/depth-of-field","display_name":"depth of field","score":0.6610000133514404},{"id":"https://openalex.org/keywords/resolution-enhancement","display_name":"resolution enhancement","score":0.972000002861023},{"id":"https://openalex.org/keywords/annular-illumination","display_name":"annular illumination","score":0.8579999804496765},{"id":"https://openalex.org/keywords/monte-carlo-simulation","display_name":"Monte Carlo simulation","score":0.656000018119812},{"id":"https://openalex.org/keywords/exposure-simulation","display_name":"exposure simulation","score":0.5899999737739563}],"concepts":[{"id":"https://openalex.org/C19499675","wikidata":"https://www.wikidata.org/wiki/Q232207","display_name":"Monte Carlo method","level":2,"score":0.7183254957199097},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5928905606269836},{"id":"https://openalex.org/C138268822","wikidata":"https://www.wikidata.org/wiki/Q1051925","display_name":"Resolution (logic)","level":2,"score":0.5385243892669678},{"id":"https://openalex.org/C205372480","wikidata":"https://www.wikidata.org/wiki/Q210521","display_name":"Image resolution","level":2,"score":0.5299150943756104},{"id":"https://openalex.org/C2780586882","wikidata":"https://www.wikidata.org/wiki/Q7520643","display_name":"Simple (philosophy)","level":2,"score":0.4447140693664551},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.4318878948688507},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4236515164375305},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.4206105172634125},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.41478589177131653},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.41174226999282837},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.2748394012451172},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.2718159258365631},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2551741600036621},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.2340930700302124},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.15932849049568176},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C111472728","wikidata":"https://www.wikidata.org/wiki/Q9471","display_name":"Epistemology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.485383","doi":"https://doi.org/10.1117/12.485383","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.485383","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2065266309","https://openalex.org/W2017540184","https://openalex.org/W2016974590","https://openalex.org/W2064177635","https://openalex.org/W3106994311","https://openalex.org/W1964232789","https://openalex.org/W2009936663","https://openalex.org/W2016449846","https://openalex.org/W2071134870","https://openalex.org/W2366834031"],"abstract_inverted_index":{"Layer":[0],"specific":[1,21,40,92],"illumination":[2,22,37,67,90,104,117],"has":[3],"merits":[4],"of":[5,7,44,50,86,113,142],"enhancement":[6,112,141],"resolution,":[8],"widening":[9],"DOF":[10,110,139],"and":[11,47,78,111,140],"image":[12,43],"fitness.":[13],"For":[14,126],"dense":[15,74,79],"patterns":[16,72,93],"like":[17,73],"DRAM":[18],"cell,":[19],"layer":[20],"is":[23,68,94,105,132,144],"a":[24,39],"major":[25],"candidate":[26],"to":[27,54,107],"drive":[28],"low":[29],"k1":[30],"lithography.":[31],"To":[32],"find":[33],"out":[34],"the":[35,45,48,65,84,88,102,135],"best":[36,66,89,116],"for":[38,70,91],"pattern,":[41],"diffracted":[42,57],"pattern":[46],"ratio":[49],"captured":[51],"first":[52],"order":[53,56],"0th":[55],"beam":[58],"should":[59],"be":[60,120],"considered.":[61],"By":[62],"spectrum":[63],"analysis,":[64],"obtained":[69],"simple":[71,127],"lines,":[75],"brick":[76],"wall,":[77],"contacts.":[80],"In":[81],"this":[82],"paper,":[83],"procedure":[85],"obtaining":[87],"presented.":[95],"Comparing":[96],"general":[97],"illuminations":[98],"such":[99],"as":[100],"annular,":[101],"resultant":[103],"proved":[106],"have":[108],"wider":[109],"resolution.":[114],"The":[115],"can":[118],"also":[119],"found":[121],"by":[122],"Monte":[123],"Carlo":[124],"simulation.":[125],"one-dimensional":[128],"case,":[129],"its":[130],"validity":[131],"proved.":[133],"From":[134],"exposure":[136],"results,":[137],"wide":[138],"resolution":[143],"confirmed.":[145]},"counts_by_year":[{"year":2018,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}