{"id":"https://openalex.org/W2105004022","doi":"https://doi.org/10.1109/memsys.2008.4443657","title":"Low-voltage large-value tunable capacitors using selfaligned HARPSS","display_name":"Low-voltage large-value tunable capacitors using selfaligned HARPSS","publication_year":2008,"publication_date":"2008-01-01","ids":{"openalex":"https://openalex.org/W2105004022","doi":"https://doi.org/10.1109/memsys.2008.4443657","mag":"2105004022"},"language":"en","primary_location":{"id":"doi:10.1109/memsys.2008.4443657","doi":"https://doi.org/10.1109/memsys.2008.4443657","is_oa":false,"landing_page_url":"https://doi.org/10.1109/memsys.2008.4443657","pdf_url":null,"source":{"id":"https://openalex.org/S4210233918","display_name":"IEEE International Conference on Micro Electro Mechanical Systems (MEMS)","issn_l":"1084-6999","issn":["1084-6999"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5066289928","display_name":"Mina Rais\u2010Zadeh","orcid":"https://orcid.org/0000-0003-2286-4363","observed_orcids":["https://orcid.org/0000-0003-2286-4363"]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Rais-Zadeh","raw_affiliation_strings":["Georgia Institute of Technology, Atlanta, GA, USA","Georgia Institute of Technology , Atlanta#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology, Atlanta, GA, USA","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology , Atlanta#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5087476317","display_name":"Ashwin K. Samarao","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. K. Samarao","raw_affiliation_strings":["Georgia Institute of Technology, Atlanta, GA, USA","Georgia Institute of Technology , Atlanta#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology, Atlanta, GA, USA","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology , Atlanta#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010786141","display_name":"Pejman Monajemi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"P. Monajemi","raw_affiliation_strings":["Georgia Institute of Technology, Atlanta, GA, USA","Georgia Institute of Technology , Atlanta#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology, Atlanta, GA, USA","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology , Atlanta#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5081523432","display_name":"Farrokh Ayazi","orcid":"https://orcid.org/0000-0002-4539-7393","observed_orcids":["https://orcid.org/0000-0002-4539-7393"]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"F. Ayazi","raw_affiliation_strings":["Georgia Institute of Technology, Atlanta, GA, USA","Georgia Institute of Technology , Atlanta#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology, Atlanta, GA, USA","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology , Atlanta#TAB#","institution_ids":["https://openalex.org/I130701444"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I130701444"],"apc_list":null,"apc_paid":null,"fwci":0.474,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.56099648,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"319","last_page":"322"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11608","display_name":"Dielectric materials and actuators","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/tunable-capacitors","display_name":"tunable capacitors","score":0.9959999918937683},{"id":"https://openalex.org/keywords/self-aligned-fabrication","display_name":"self-aligned fabrication","score":0.6970000267028809},{"id":"https://openalex.org/keywords/silicon-micromachining","display_name":"silicon micromachining","score":0.7889999747276306},{"id":"https://openalex.org/keywords/mems-capacitors","display_name":"MEMS capacitors","score":0.652999997138977}],"concepts":[{"id":"https://openalex.org/C52192207","wikidata":"https://www.wikidata.org/wiki/Q5322","display_name":"Capacitor","level":3,"score":0.9282862544059753},{"id":"https://openalex.org/C527607","wikidata":"https://www.wikidata.org/wiki/Q175538","display_name":"Microfabrication","level":4,"score":0.7599785923957825},{"id":"https://openalex.org/C32802771","wikidata":"https://www.wikidata.org/wiki/Q2443617","display_name":"Port (circuit theory)","level":2,"score":0.704098105430603},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.6450949907302856},{"id":"https://openalex.org/C2781089630","wikidata":"https://www.wikidata.org/wiki/Q21856745","display_name":"Realization (probability)","level":2,"score":0.5455843210220337},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5029603838920593},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.487037718296051},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.43510860204696655},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3550213873386383},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.32616350054740906},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.21953579783439636},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.10500159859657288},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.059192508459091187},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/memsys.2008.4443657","doi":"https://doi.org/10.1109/memsys.2008.4443657","is_oa":false,"landing_page_url":"https://doi.org/10.1109/memsys.2008.4443657","pdf_url":null,"source":{"id":"https://openalex.org/S4210233918","display_name":"IEEE International Conference on Micro Electro Mechanical Systems (MEMS)","issn_l":"1084-6999","issn":["1084-6999"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2008 IEEE 21st International Conference on Micro Electro Mechanical Systems","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1603040963","https://openalex.org/W2079289673","https://openalex.org/W2101214719","https://openalex.org/W2161279473","https://openalex.org/W2171254142"],"related_works":["https://openalex.org/W2095105429","https://openalex.org/W2534958853","https://openalex.org/W2053677804","https://openalex.org/W2144668538","https://openalex.org/W2098006478","https://openalex.org/W7011336677","https://openalex.org/W6983482840","https://openalex.org/W2104301740","https://openalex.org/W1982890108","https://openalex.org/W2138639801"],"abstract_inverted_index":{"This":[0],"paper":[1],"presents":[2],"a":[3,37,49,60,88],"silicon":[4],"microfabrication":[5],"technique":[6],"for":[7,59],"the":[8,42,66],"implementation":[9],"of":[10,33,44,55,68,79,91],"large-value":[11],"one-port":[12,74],"and":[13],"two-port":[14,63],"tunable":[15,46],"capacitors":[16,47],"with":[17,65,87],"very":[18,26],"small":[19,50],"tuning":[20,54,89],"voltages.":[21],"The":[22],"proposed":[23],"process":[24],"offers":[25],"high":[27],"aspect-":[28],"ratio":[29],"narrow":[30],"vertical":[31],"gaps":[32],"different":[34],"sizes":[35],"in":[36,48],"self-":[38],"aligned":[39],"manner,":[40],"allowing":[41],"realization":[43],"in-plane":[45],"area.":[51],"A":[52,71],"continuous":[53],"240%":[56],"is":[57,82],"achieved":[58],"15":[61],"pF":[62,73,86],"capacitor":[64,75],"application":[67],"3.5":[69],"V.":[70,93],"106":[72],"occupies":[76],"an":[77],"area":[78],"8":[80],"mm2and":[81],"tuned":[83],"to":[84],"130":[85],"voltage":[90],"0.9":[92]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-26T11:51:55.731654","created_date":"2016-06-24T00:00:00"}