{"id":"https://openalex.org/W2104017208","doi":"https://doi.org/10.1117/12.814289","title":"Advances and challenges in dual-tone development process optimization","display_name":"Advances and challenges in dual-tone development process optimization","publication_year":2009,"publication_date":"2009-03-04","ids":{"openalex":"https://openalex.org/W2104017208","doi":"https://doi.org/10.1117/12.814289","mag":"2104017208"},"language":"en","primary_location":{"id":"doi:10.1117/12.814289","doi":"https://doi.org/10.1117/12.814289","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.814289","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111592656","display_name":"Carlos Fonseca","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114132059","display_name":"Tokyo Electron (Japan)","ror":"https://ror.org/05gd76j39","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Carlos Fonseca","raw_affiliation_strings":["Tokyo Electron America, Inc. (United States)","Tokyo Electron America, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron America, Inc. (United States)","institution_ids":["https://openalex.org/I114132059"]},{"raw_affiliation_string":"Tokyo Electron America, Inc. (USA)","institution_ids":["https://openalex.org/I114132059"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5022461176","display_name":"Mark H. Somervell","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114132059","display_name":"Tokyo Electron (Japan)","ror":"https://ror.org/05gd76j39","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Mark Somervell","raw_affiliation_strings":["Tokyo Electron America, Inc. (United States)","Tokyo Electron America, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron America, Inc. (United States)","institution_ids":["https://openalex.org/I114132059"]},{"raw_affiliation_string":"Tokyo Electron America, Inc. (USA)","institution_ids":["https://openalex.org/I114132059"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088266276","display_name":"Steven A. Scheer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114132059","display_name":"Tokyo Electron (Japan)","ror":"https://ror.org/05gd76j39","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Steven Scheer","raw_affiliation_strings":["Tokyo Electron America, Inc. (United States)","Tokyo Electron America, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron America, Inc. (United States)","institution_ids":["https://openalex.org/I114132059"]},{"raw_affiliation_string":"Tokyo Electron America, Inc. (USA)","institution_ids":["https://openalex.org/I114132059"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064580929","display_name":"Wallace P. Printz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114132059","display_name":"Tokyo Electron (Japan)","ror":"https://ror.org/05gd76j39","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Wallace Printz","raw_affiliation_strings":["Tokyo Electron America, Inc. (United States)","Tokyo Electron America, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron America, Inc. (United States)","institution_ids":["https://openalex.org/I114132059"]},{"raw_affiliation_string":"Tokyo Electron America, Inc. (USA)","institution_ids":["https://openalex.org/I114132059"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039538018","display_name":"Kathleen Nafus","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kathleen Nafus","raw_affiliation_strings":["Tokyo Electron Kyushu, Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu, Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082298487","display_name":"Shinichi Hatakeyama","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shinichi Hatakeyama","raw_affiliation_strings":["Tokyo Electron Kyushu, Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu, Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5012392064","display_name":"Yuhei Kuwahara","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yuhei Kuwahara","raw_affiliation_strings":["Tokyo Electron Kyushu, Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu, Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051450172","display_name":"Takafumi Niwa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takafumi Niwa","raw_affiliation_strings":["Tokyo Electron Kyushu, Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu, Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Sophie Bernard","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Sophie Bernard","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5051148994","display_name":"Roel Gronheid","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Roel Gronheid","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":3.7478,"has_fulltext":false,"cited_by_count":22,"citation_normalized_percentile":{"value":0.93832116,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"7274","issue":null,"first_page":"72740I","last_page":"72740I"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/double-patterning","display_name":"double patterning","score":0.9789999723434448},{"id":"https://openalex.org/keywords/immersion-lithography","display_name":"immersion lithography","score":0.9010000228881836},{"id":"https://openalex.org/keywords/arf-excimer-laser","display_name":"ArF excimer laser","score":0.699999988079071},{"id":"https://openalex.org/keywords/32-nm-technology-node","display_name":"32 nm technology node","score":0.7360000014305115},{"id":"https://openalex.org/keywords/k1-factor","display_name":"k1 factor","score":0.7089999914169312},{"id":"https://openalex.org/keywords/lighting-optimization","display_name":"lighting optimization","score":0.5109999775886536},{"id":"https://openalex.org/keywords/mask-optimization","display_name":"mask optimization","score":0.6629999876022339},{"id":"https://openalex.org/keywords/process-optimization","display_name":"process optimization","score":0.5600000023841858}],"concepts":[{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.8815040588378906},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.8719391822814941},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.7978183031082153},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6713742017745972},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.627827525138855},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5489252209663391},{"id":"https://openalex.org/C2780583480","wikidata":"https://www.wikidata.org/wiki/Q1366327","display_name":"Tone (literature)","level":2,"score":0.5468645691871643},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.5327237844467163},{"id":"https://openalex.org/C8641274","wikidata":"https://www.wikidata.org/wiki/Q1030958","display_name":"Tone mapping","level":4,"score":0.5119489431381226},{"id":"https://openalex.org/C62611344","wikidata":"https://www.wikidata.org/wiki/Q1062658","display_name":"Node (physics)","level":2,"score":0.4994943141937256},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.4831249415874481},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4495132267475128},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.4456768035888672},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3812202513217926},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3595602512359619},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.21917685866355896},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.11406669020652771},{"id":"https://openalex.org/C24890656","wikidata":"https://www.wikidata.org/wiki/Q82811","display_name":"Acoustics","level":1,"score":0.10998961329460144},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10751122236251831},{"id":"https://openalex.org/C87133666","wikidata":"https://www.wikidata.org/wiki/Q1161699","display_name":"Dynamic range","level":2,"score":0.10423743724822998},{"id":"https://openalex.org/C2780056265","wikidata":"https://www.wikidata.org/wiki/Q106239881","display_name":"High dynamic range","level":3,"score":0.09629368782043457},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C124952713","wikidata":"https://www.wikidata.org/wiki/Q8242","display_name":"Literature","level":1,"score":0.0},{"id":"https://openalex.org/C142362112","wikidata":"https://www.wikidata.org/wiki/Q735","display_name":"Art","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.814289","doi":"https://doi.org/10.1117/12.814289","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.814289","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9","score":0.5378999710083008}],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W2030969034","https://openalex.org/W2075705727"],"related_works":["https://openalex.org/W2026425962","https://openalex.org/W2075705727","https://openalex.org/W2080279968","https://openalex.org/W2022529271","https://openalex.org/W2003186479","https://openalex.org/W2485905123","https://openalex.org/W2013111563","https://openalex.org/W1977714017","https://openalex.org/W2036754884","https://openalex.org/W2006010964"],"abstract_inverted_index":{"The":[0,116],"ever-shrinking":[1],"circuit":[2],"device":[3],"dimensions":[4,235],"challenge":[5],"lithographers":[6],"to":[7,31,55,170,184,208,228],"explore":[8],"viable":[9,73],"patterning":[10,48,51,67,101],"for":[11,59,154,165,213,236],"the":[12,44,88,111,152,163,222],"32":[13,39,60],"nm":[14,33,40,61,233],"halfpitch":[15],"node":[16,34,41,62],"and":[17,35,134,180,195,210,269],"beyond.":[18],"Significant":[19],"improvements":[20],"in":[21,110,128,182,202],"immersion":[22,57,258],"lithography":[23,29,58],"have":[24,69],"allowed":[25],"extension":[26],"of":[27,46,119,158,250,264],"optical":[28],"down":[30],"45":[32,232],"likely":[36,54],"into":[37],"early":[38,108],"development.":[42],"In":[43],"absence":[45],"single-exposure":[47],"solutions,":[49,75],"double":[50,66,100],"techniques":[52,68],"are":[53,173,206,272],"extend":[56],"manufacturing.":[63],"While":[64,162],"several":[65],"been":[70,94],"proposed":[71,95],"as":[72,96,107,109],"manufacturing":[74,188],"cost,":[76],"along":[77],"with":[78,198,204,255],"technical":[79],"capability,":[80],"will":[81],"dictate":[82],"which":[83],"candidate":[84],"is":[85,168,248],"adopted":[86],"by":[87,114],"industry.":[89],"Dual-tone":[90,103],"development":[91,104],"(DTD)":[92],"has":[93,142],"a":[97,187,237],"potential":[98],"cost-effective":[99],"technique.1":[102],"was":[105],"reported":[106],"late":[112],"1990's":[113],"Asano.2":[115],"basic":[117],"principle":[118],"dual-tone":[120],"imaging":[121],"involves":[122],"processing":[123,220],"exposed":[124],"resist":[125,160,239],"latent":[126],"images":[127],"both":[129],"positive":[130],"tone":[131,136],"(aqueous":[132],"base)":[133],"negative":[135],"(organic":[137],"solvent)":[138],"developers.":[139],"Conceptually,":[140],"DTD":[141,166,230,247],"attractive":[143],"cost":[144],"benefits":[145],"since":[146],"it":[147,186],"enables":[148],"pitch":[149],"doubling":[150],"without":[151],"need":[153],"multiple":[155],"etch":[156],"steps":[157],"patterned":[159],"layers.":[161],"concept":[164],"technique":[167],"simple":[169],"understand,":[171],"there":[172],"many":[174],"challenges":[175,196],"that":[176,218,246],"must":[177],"be":[178,226],"overcome":[179],"understood":[181],"order":[183],"make":[185],"solution.":[189],"This":[190],"work":[191],"presents":[192],"recent":[193],"advances":[194],"associated":[197],"DTD.":[199,214],"Experimental":[200,215],"results":[201,216,243,261],"conjunction":[203],"simulations":[205],"used":[207,227],"understand":[209],"advance":[211],"learning":[212],"suggest":[217],"clever":[219],"on":[221],"wafer":[223],"track":[224],"can":[225],"enable":[229],"beyond":[231],"half-pitch":[234],"given":[238],"process.":[240],"Recent":[241],"experimental":[242],"also":[244],"show":[245],"capable":[249],"printing":[251],"<0.25":[252],"k1-factor":[253],"features":[254],"an":[256],"ArF":[257],"scanner.":[259],"Simulation":[260],"showing":[262],"co-optimization":[263],"process":[265],"variables,":[266],"illumination":[267],"conditions,":[268],"mask":[270],"properties":[271],"presented.":[273]},"counts_by_year":[{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":4},{"year":2014,"cited_by_count":2},{"year":2012,"cited_by_count":2}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}