{"id":"https://openalex.org/W2103714747","doi":"https://doi.org/10.1016/0168-583x(93)95030-9","title":"Interfacial reactions of titanium thin films on ion implanted (001) Si","display_name":"Interfacial reactions of titanium thin films on ion implanted (001) Si","publication_year":1993,"publication_date":"1993-04-01","ids":{"openalex":"https://openalex.org/W2103714747","doi":"https://doi.org/10.1016/0168-583x(93)95030-9","mag":"2103714747"},"language":"en","primary_location":{"id":"doi:10.1016/0168-583x(93)95030-9","doi":"https://doi.org/10.1016/0168-583x(93)95030-9","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0168-583x(93)95030-9","pdf_url":null,"source":{"id":"https://openalex.org/S113542562","display_name":"Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms","issn_l":"0168-583X","issn":["0168-583X","1872-9584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5070859908","display_name":"H. R. Liauh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"H.R. Liauh","raw_affiliation_strings":["Department of Electronics Engineering, National Chiao Twig University, Hsinchu, Taiwan, ROC"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronics Engineering, National Chiao Twig University, Hsinchu, Taiwan, ROC","institution_ids":["https://openalex.org/I148366613"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055493021","display_name":"M.C. Chen","orcid":"https://orcid.org/0000-0003-2349-4165","observed_orcids":["https://orcid.org/0000-0003-2349-4165"]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]},{"id":"https://openalex.org/I25846049","display_name":"National Tsing Hua University","ror":"https://ror.org/00zdnkx70","country_code":"TW","type":"education","lineage":["https://openalex.org/I25846049"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"M.C. Chen","raw_affiliation_strings":["Department of Electronics Engineering, National Chiao Twig University, Hsinchu, Taiwan, ROC","Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, ROC"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronics Engineering, National Chiao Twig University, Hsinchu, Taiwan, ROC","institution_ids":["https://openalex.org/I148366613"]},{"raw_affiliation_string":"Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, ROC","institution_ids":["https://openalex.org/I25846049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5078501403","display_name":"J.F. Chen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I25846049","display_name":"National Tsing Hua University","ror":"https://ror.org/00zdnkx70","country_code":"TW","type":"education","lineage":["https://openalex.org/I25846049"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"J.F. Chen","raw_affiliation_strings":["Department of Materials Science and Engineering, National Tsing, Hua University, Hsinchu, Taiwan, ROC"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, National Tsing, Hua University, Hsinchu, Taiwan, ROC","institution_ids":["https://openalex.org/I25846049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111024281","display_name":"L.J. Chen","orcid":"https://orcid.org/0009-0009-7208-1341","observed_orcids":["https://orcid.org/0009-0009-7208-1341"]},"institutions":[{"id":"https://openalex.org/I25846049","display_name":"National Tsing Hua University","ror":"https://ror.org/00zdnkx70","country_code":"TW","type":"education","lineage":["https://openalex.org/I25846049"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"L.J. Chen","raw_affiliation_strings":["Department of Materials Science and Engineering, National Tsing, Hua University, Hsinchu, Taiwan, ROC"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, National Tsing, Hua University, Hsinchu, Taiwan, ROC","institution_ids":["https://openalex.org/I25846049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083533568","display_name":"Water Lur","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210161555","display_name":"United Microelectronics (Taiwan)","ror":"https://ror.org/0580qje17","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210161555"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"W. Lur","raw_affiliation_strings":["United Microelectronics Corporation, Science-Based Park, Hsinchu, Taiwan, ROC"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"United Microelectronics Corporation, Science-Based Park, Hsinchu, Taiwan, ROC","institution_ids":["https://openalex.org/I4210161555"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5003753441","display_name":"C. H. Chu","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"C.H. Chu","raw_affiliation_strings":["National Nano Devices Laboratory, Hsinchu, Taiwan, ROC"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Nano Devices Laboratory, Hsinchu, Taiwan, ROC","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2810,"currency":"USD","value_usd":2810},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.25439596,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"74","issue":"1-2","first_page":"134","last_page":"137"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.001500000013038516,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.0007999999797903001,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/titanium-silicide","display_name":"titanium silicide","score":0.9179999828338623},{"id":"https://openalex.org/keywords/titanium-thin-films","display_name":"titanium thin films","score":0.8600000143051147},{"id":"https://openalex.org/keywords/ion-implantation","display_name":"ion implantation","score":0.8450000286102295},{"id":"https://openalex.org/keywords/si-100-substrate","display_name":"Si(100) substrate","score":0.7799999713897705},{"id":"https://openalex.org/keywords/arsenic-doping","display_name":"arsenic doping","score":0.7429999709129333},{"id":"https://openalex.org/keywords/boron-fluoride-implantation","display_name":"boron fluoride implantation","score":0.8510000109672546},{"id":"https://openalex.org/keywords/interfacial-reaction","display_name":"interfacial reaction","score":0.7279999852180481},{"id":"https://openalex.org/keywords/thermal-stability","display_name":"thermal stability","score":0.8949999809265137},{"id":"https://openalex.org/keywords/grain-growth","display_name":"grain growth","score":0.5680000185966492},{"id":"https://openalex.org/keywords/grain-boundary-segregation","display_name":"grain boundary segregation","score":0.847000002861023},{"id":"https://openalex.org/keywords/island-formation","display_name":"island formation","score":0.625}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.758463442325592},{"id":"https://openalex.org/C506065880","wikidata":"https://www.wikidata.org/wiki/Q716","display_name":"Titanium","level":2,"score":0.7133892774581909},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.6884168386459351},{"id":"https://openalex.org/C2780901251","wikidata":"https://www.wikidata.org/wiki/Q426473","display_name":"Silicide","level":3,"score":0.6858310699462891},{"id":"https://openalex.org/C47908070","wikidata":"https://www.wikidata.org/wiki/Q900515","display_name":"Grain boundary","level":3,"score":0.6230335831642151},{"id":"https://openalex.org/C71987851","wikidata":"https://www.wikidata.org/wiki/Q7216430","display_name":"Impurity","level":2,"score":0.6128128170967102},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.5902257561683655},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.5450859069824219},{"id":"https://openalex.org/C59061564","wikidata":"https://www.wikidata.org/wiki/Q7783071","display_name":"Thermal stability","level":2,"score":0.4868030250072479},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.45153743028640747},{"id":"https://openalex.org/C2780565262","wikidata":"https://www.wikidata.org/wiki/Q737038","display_name":"Polycrystalline silicon","level":4,"score":0.43636634945869446},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.43282973766326904},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.4255497455596924},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.3815172612667084},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3284311890602112},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.32428932189941406},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.1903218924999237},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17117157578468323},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.15145343542099},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.1508333384990692},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.11841455101966858},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.07348698377609253},{"id":"https://openalex.org/C87359718","wikidata":"https://www.wikidata.org/wiki/Q1271916","display_name":"Thin-film transistor","level":3,"score":0.057530999183654785},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0168-583x(93)95030-9","doi":"https://doi.org/10.1016/0168-583x(93)95030-9","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0168-583x(93)95030-9","pdf_url":null,"source":{"id":"https://openalex.org/S113542562","display_name":"Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms","issn_l":"0168-583X","issn":["0168-583X","1872-9584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320321040","display_name":"National Science Council","ror":"https://ror.org/02kv4zf79"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1993239447","https://openalex.org/W2002892235","https://openalex.org/W2027811095","https://openalex.org/W2070356209","https://openalex.org/W2077071885","https://openalex.org/W2087146502","https://openalex.org/W2094242823"],"related_works":["https://openalex.org/W2002892235","https://openalex.org/W1988253350","https://openalex.org/W2088525277","https://openalex.org/W1967929447","https://openalex.org/W2332602483","https://openalex.org/W2111330522","https://openalex.org/W2090836351","https://openalex.org/W2008590695","https://openalex.org/W2031730583","https://openalex.org/W1975028113"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}