{"id":"https://openalex.org/W2097532550","doi":"https://doi.org/10.1109/68.841252","title":"Highly uniform vertical-cavity surface-emitting lasers integrated with microlens arrays","display_name":"Highly uniform vertical-cavity surface-emitting lasers integrated with microlens arrays","publication_year":2000,"publication_date":"2000-05-01","ids":{"openalex":"https://openalex.org/W2097532550","doi":"https://doi.org/10.1109/68.841252","mag":"2097532550"},"language":"en","primary_location":{"id":"doi:10.1109/68.841252","doi":"https://doi.org/10.1109/68.841252","is_oa":false,"landing_page_url":"https://doi.org/10.1109/68.841252","pdf_url":null,"source":{"id":"https://openalex.org/S27723657","display_name":"IEEE Photonics Technology Letters","issn_l":"1041-1135","issn":["1041-1135","1941-0174"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-2","norway-2","poland-100","russia-white-list-1"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Photonics Technology Letters","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5060733726","display_name":"Sven Eitel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135218257","display_name":"Swiss Center for Electronics and Microtechnology (Switzerland)","ror":"https://ror.org/05nrrsx06","country_code":"CH","type":"company","lineage":["https://openalex.org/I135218257"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"S. Eitel","raw_affiliation_strings":["Centre Suisse d'Electronique et de Microtechnique, Zurich, Switzerland"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre Suisse d'Electronique et de Microtechnique, Zurich, Switzerland","institution_ids":["https://openalex.org/I135218257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111702800","display_name":"Stuart J. Fancey","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I32062511","display_name":"Heriot-Watt University","ror":"https://ror.org/04mghma93","country_code":"GB","type":"education","lineage":["https://openalex.org/I32062511"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"S.J. Fancey","raw_affiliation_strings":["Department of Physics, Heriot-Watt University, Edinburgh, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Heriot-Watt University, Edinburgh, UK","institution_ids":["https://openalex.org/I32062511"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109100736","display_name":"H.-P. Gauggel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135218257","display_name":"Swiss Center for Electronics and Microtechnology (Switzerland)","ror":"https://ror.org/05nrrsx06","country_code":"CH","type":"company","lineage":["https://openalex.org/I135218257"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"H.-P. Gauggel","raw_affiliation_strings":["Centre Suisse d'Electronique et de Microtechnique, Zurich, Switzerland"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre Suisse d'Electronique et de Microtechnique, Zurich, Switzerland","institution_ids":["https://openalex.org/I135218257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113696768","display_name":"K. Gulden","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135218257","display_name":"Swiss Center for Electronics and Microtechnology (Switzerland)","ror":"https://ror.org/05nrrsx06","country_code":"CH","type":"company","lineage":["https://openalex.org/I135218257"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"K.-H. Gulden","raw_affiliation_strings":["Centre Suisse d'Electronique et de Microtechnique, Zurich, Switzerland"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre Suisse d'Electronique et de Microtechnique, Zurich, Switzerland","institution_ids":["https://openalex.org/I135218257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113698259","display_name":"Werner B\u00e4chtold","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I35440088","display_name":"ETH Zurich","ror":"https://ror.org/05a28rw58","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I35440088"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"W. Bachtold","raw_affiliation_strings":["Electrical Engineering Department, Swiss Federal Institute of Technology, Zurich, Switzerland"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electrical Engineering Department, Swiss Federal Institute of Technology, Zurich, Switzerland","institution_ids":["https://openalex.org/I35440088"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103256858","display_name":"Mohammad Reza Taghizadeh","orcid":"https://orcid.org/0000-0002-9018-2703","observed_orcids":["https://orcid.org/0000-0002-9018-2703"]},"institutions":[{"id":"https://openalex.org/I32062511","display_name":"Heriot-Watt University","ror":"https://ror.org/04mghma93","country_code":"GB","type":"education","lineage":["https://openalex.org/I32062511"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"M.R. Taghizadeh","raw_affiliation_strings":["Department of Physics, Heriot-Watt University, Edinburgh, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Heriot-Watt University, Edinburgh, UK","institution_ids":["https://openalex.org/I32062511"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2645,"currency":"USD","value_usd":2645},"apc_paid":null,"fwci":5.4939,"has_fulltext":false,"cited_by_count":50,"citation_normalized_percentile":{"value":0.9591984,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"12","issue":"5","first_page":"459","last_page":"461"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11429","display_name":"Semiconductor Lasers and Optical Devices","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11429","display_name":"Semiconductor Lasers and Optical Devices","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10022","display_name":"Semiconductor Quantum Structures and Devices","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/vertical-cavity-surface-emitting-lasers","display_name":"vertical-cavity surface-emitting lasers","score":0.9990000128746033},{"id":"https://openalex.org/keywords/vcsel-arrays","display_name":"VCSEL arrays","score":0.9599999785423279},{"id":"https://openalex.org/keywords/gaas-algaas-lasers","display_name":"GaAs/AlGaAs lasers","score":0.8820000290870667},{"id":"https://openalex.org/keywords/oxide-confinement","display_name":"oxide confinement","score":0.8690000176429749},{"id":"https://openalex.org/keywords/beam-shaping","display_name":"beam shaping","score":0.8949999809265137},{"id":"https://openalex.org/keywords/device-integration","display_name":"device integration","score":0.5239999890327454},{"id":"https://openalex.org/keywords/threshold-current","display_name":"threshold current","score":0.7419999837875366},{"id":"https://openalex.org/keywords/power-conversion-efficiency","display_name":"power conversion efficiency","score":0.8379999995231628},{"id":"https://openalex.org/keywords/wavelength-uniformity","display_name":"wavelength uniformity","score":0.6909999847412109}],"concepts":[{"id":"https://openalex.org/C192560794","wikidata":"https://www.wikidata.org/wiki/Q500199","display_name":"Microlens","level":3,"score":0.8588335514068604},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7999811172485352},{"id":"https://openalex.org/C106246969","wikidata":"https://www.wikidata.org/wiki/Q2009618","display_name":"Vertical-cavity surface-emitting laser","level":3,"score":0.7763410806655884},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.7353123426437378},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.6622828245162964},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6593492031097412},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.614549458026886},{"id":"https://openalex.org/C6260449","wikidata":"https://www.wikidata.org/wiki/Q41364","display_name":"Wavelength","level":2,"score":0.47678542137145996},{"id":"https://openalex.org/C121477167","wikidata":"https://www.wikidata.org/wiki/Q17154002","display_name":"Semiconductor laser theory","level":3,"score":0.4448028802871704},{"id":"https://openalex.org/C191161701","wikidata":"https://www.wikidata.org/wiki/Q559265","display_name":"Optical power","level":3,"score":0.43347084522247314},{"id":"https://openalex.org/C15336307","wikidata":"https://www.wikidata.org/wiki/Q1766051","display_name":"Lens (geology)","level":2,"score":0.1957261562347412},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.1192634105682373},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1170983612537384},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1109/68.841252","doi":"https://doi.org/10.1109/68.841252","is_oa":false,"landing_page_url":"https://doi.org/10.1109/68.841252","pdf_url":null,"source":{"id":"https://openalex.org/S27723657","display_name":"IEEE Photonics Technology Letters","issn_l":"1041-1135","issn":["1041-1135","1941-0174"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-2","norway-2","poland-100","russia-white-list-1"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Photonics Technology Letters","raw_type":"journal-article"},{"id":"pmh:oai:CiteSeerX.psu:10.1.1.17.2094","doi":null,"is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.17.2094","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"http://www.ifh.ee.ethz.ch/~erni/PDF_Paper/EITEL_PTL.pdf","raw_type":"text"},{"id":"pmh:oai:CiteSeerX.psu:10.1.1.834.3698","doi":null,"is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.834.3698","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"http://oic.eps.hw.ac.uk/Projects/SPOEC/PTL2000/PTL2000.pdf","raw_type":"text"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1858194632","https://openalex.org/W1976758957","https://openalex.org/W2043168675","https://openalex.org/W2155638734","https://openalex.org/W2159392737"],"related_works":["https://openalex.org/W1508542935","https://openalex.org/W2157206083","https://openalex.org/W2008524557","https://openalex.org/W2153036933","https://openalex.org/W3006834600","https://openalex.org/W2488635879","https://openalex.org/W2157268167","https://openalex.org/W2151842369","https://openalex.org/W2783746610","https://openalex.org/W2088750355"],"abstract_inverted_index":{"In":[0,64],"this":[1],"paper,":[2],"work":[3],"is":[4,54],"described":[5],"on":[6],"the":[7,62,68],"fabrication":[8],"of":[9,15,29,37,50,72,78],"highly":[10],"uniform":[11],"8/spl":[12],"times/8":[13],"arrays":[14,23,75,77],"GaAs-AlGaAs":[16],"vertical-cavity":[17],"surface-emitting":[18],"lasers":[19],"(VCSEL's).":[20],"Oxide-confined":[21],"VCSEL":[22],"show":[24],"an":[25,33,45],"average":[26,34,46],"threshold":[27],"current":[28],"0.74/spl":[30],"plusmn/0.02":[31],"mA,":[32],"output":[35],"power":[36,47],"2.05/spl":[38],"plusmn/0.03":[39],"mW":[40],"at":[41],"8":[42],"mA":[43],"and":[44,70],"conversion":[48],"efficiency":[49],"14.3%.":[51],"Their":[52],"wavelength":[53],"measured":[55],"to":[56,81],"be":[57],"967/spl":[58],"plusmn/0.35":[59],"nm":[60],"over":[61],"array.":[63],"addition,":[65],"we":[66],"describe":[67],"alignment":[69],"integration":[71],"these":[73],"device":[74],"with":[76],"refractive":[79],"microlenses":[80],"allow":[82],"beam":[83],"shaping":[84],"typically":[85],"required":[86],"in":[87],"system":[88],"applications.":[89]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":3},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":6},{"year":2012,"cited_by_count":2}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}