{"id":"https://openalex.org/W2094979504","doi":"https://doi.org/10.1016/s0168-583x(01)00559-6","title":"Strain relaxation of pseudomorphic /(100) heterostructures after hydrogen or helium ion implantation for virtual substrate fabrication","display_name":"Strain relaxation of pseudomorphic /(100) heterostructures after hydrogen or helium ion implantation for virtual substrate fabrication","publication_year":2001,"publication_date":"2001-04-01","ids":{"openalex":"https://openalex.org/W2094979504","doi":"https://doi.org/10.1016/s0168-583x(01)00559-6","mag":"2094979504"},"language":"en","primary_location":{"id":"doi:10.1016/s0168-583x(01)00559-6","doi":"https://doi.org/10.1016/s0168-583x(01)00559-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0168-583x(01)00559-6","pdf_url":null,"source":{"id":"https://openalex.org/S113542562","display_name":"Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms","issn_l":"0168-583X","issn":["0168-583X","1872-9584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5058626906","display_name":"B. Holl\u00e4nder","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I171892758","display_name":"Forschungszentrum J\u00fclich","ror":"https://ror.org/02nv7yv05","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I171892758"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"B. Holl\u00e4nder","raw_affiliation_strings":["Institut f\u00fcr Schicht-und Ionentechnik, Forschungszentrum J\u00fclich GmbH, Postfach 1913, D-52425 J\u00fclich, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Schicht-und Ionentechnik, Forschungszentrum J\u00fclich GmbH, Postfach 1913, D-52425 J\u00fclich, Germany","institution_ids":["https://openalex.org/I171892758"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110067583","display_name":"St. Lenk","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I171892758","display_name":"Forschungszentrum J\u00fclich","ror":"https://ror.org/02nv7yv05","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I171892758"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"St. Lenk","raw_affiliation_strings":["Institut f\u00fcr Schicht-und Ionentechnik, Forschungszentrum J\u00fclich GmbH, Postfach 1913, D-52425 J\u00fclich, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Schicht-und Ionentechnik, Forschungszentrum J\u00fclich GmbH, Postfach 1913, D-52425 J\u00fclich, Germany","institution_ids":["https://openalex.org/I171892758"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019891361","display_name":"S. Mantl","orcid":"https://orcid.org/0000-0002-4266-0619","observed_orcids":["https://orcid.org/0000-0002-4266-0619"]},"institutions":[{"id":"https://openalex.org/I171892758","display_name":"Forschungszentrum J\u00fclich","ror":"https://ror.org/02nv7yv05","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I171892758"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"S. Mantl","raw_affiliation_strings":["Institut f\u00fcr Schicht-und Ionentechnik, Forschungszentrum J\u00fclich GmbH, Postfach 1913, D-52425 J\u00fclich, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Schicht-und Ionentechnik, Forschungszentrum J\u00fclich GmbH, Postfach 1913, D-52425 J\u00fclich, Germany","institution_ids":["https://openalex.org/I171892758"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069021845","display_name":"Helmut Trinkaus","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I171892758","display_name":"Forschungszentrum J\u00fclich","ror":"https://ror.org/02nv7yv05","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I171892758"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"H. Trinkaus","raw_affiliation_strings":["Institut f\u00fcr Festk\u00f6rperforschung, Forschungszentrum J\u00fclich GmbH, D-52425 J\u00fclich, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Festk\u00f6rperforschung, Forschungszentrum J\u00fclich GmbH, D-52425 J\u00fclich, Germany","institution_ids":["https://openalex.org/I171892758"]}]},{"author_position":"middle","author":{"id":null,"display_name":"D. Kirch","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I171892758","display_name":"Forschungszentrum J\u00fclich","ror":"https://ror.org/02nv7yv05","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I171892758"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"D. Kirch","raw_affiliation_strings":["Institut f\u00fcr Festk\u00f6rperforschung, Forschungszentrum J\u00fclich GmbH, D-52425 J\u00fclich, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Festk\u00f6rperforschung, Forschungszentrum J\u00fclich GmbH, D-52425 J\u00fclich, Germany","institution_ids":["https://openalex.org/I171892758"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066493011","display_name":"M. Luysberg","orcid":"https://orcid.org/0000-0002-5613-7570","observed_orcids":["https://orcid.org/0000-0002-5613-7570"]},"institutions":[{"id":"https://openalex.org/I171892758","display_name":"Forschungszentrum J\u00fclich","ror":"https://ror.org/02nv7yv05","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I171892758"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"M. Luysberg","raw_affiliation_strings":["Institut f\u00fcr Festk\u00f6rperforschung, Forschungszentrum J\u00fclich GmbH, D-52425 J\u00fclich, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Festk\u00f6rperforschung, Forschungszentrum J\u00fclich GmbH, D-52425 J\u00fclich, Germany","institution_ids":["https://openalex.org/I171892758"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108353411","display_name":"Thomas Hackbarth","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I891521709","display_name":"Daimler (Germany)","ror":"https://ror.org/00m0j3d84","country_code":"DE","type":"company","lineage":["https://openalex.org/I891521709"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"T. Hackbarth","raw_affiliation_strings":["DaimlerChrysler AG, Research and Technology, D-89081 Ulm, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"DaimlerChrysler AG, Research and Technology, D-89081 Ulm, Germany","institution_ids":["https://openalex.org/I891521709"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111533025","display_name":"H.-J. Herzog","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I891521709","display_name":"Daimler (Germany)","ror":"https://ror.org/00m0j3d84","country_code":"DE","type":"company","lineage":["https://openalex.org/I891521709"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"H.-J. Herzog","raw_affiliation_strings":["DaimlerChrysler AG, Research and Technology, D-89081 Ulm, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"DaimlerChrysler AG, Research and Technology, D-89081 Ulm, Germany","institution_ids":["https://openalex.org/I891521709"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5011885495","display_name":"P.F.P. Fichtner","orcid":"https://orcid.org/0000-0003-4574-2262","observed_orcids":["https://orcid.org/0000-0003-4574-2262"]},"institutions":[{"id":"https://openalex.org/I130442723","display_name":"Universidade Federal do Rio Grande do Sul","ror":"https://ror.org/041yk2d64","country_code":"BR","type":"education","lineage":["https://openalex.org/I130442723"]}],"countries":["BR"],"is_corresponding":false,"raw_author_name":"P.F.P. Fichtner","raw_affiliation_strings":["Dept. de Metalurgia, Univ. Fed. Do Rio Grande do Sul, 91501-970 Porto Alegre, Brazil"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Dept. de Metalurgia, Univ. Fed. Do Rio Grande do Sul, 91501-970 Porto Alegre, Brazil","institution_ids":["https://openalex.org/I130442723"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5058626906"],"corresponding_institution_ids":["https://openalex.org/I171892758"],"apc_list":{"value":2810,"currency":"USD","value_usd":2810},"apc_paid":null,"fwci":5.5931,"has_fulltext":false,"cited_by_count":72,"citation_normalized_percentile":{"value":0.97360742,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"175-177","issue":null,"first_page":"357","last_page":"367"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.7304999828338623,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.7304999828338623,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.1599999964237213,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.030300000682473183,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/strain-relaxation","display_name":"strain relaxation","score":0.9860000014305115},{"id":"https://openalex.org/keywords/virtual-substrates","display_name":"virtual substrates","score":0.8600000143051147},{"id":"https://openalex.org/keywords/hydrogen-implantation","display_name":"hydrogen implantation","score":0.9800000190734863},{"id":"https://openalex.org/keywords/helium-implantation","display_name":"helium implantation","score":1.0},{"id":"https://openalex.org/keywords/misfit-dislocations","display_name":"misfit dislocations","score":0.9100000262260437},{"id":"https://openalex.org/keywords/threading-dislocations","display_name":"threading dislocations","score":0.8629999756813049},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.6589999794960022},{"id":"https://openalex.org/keywords/dislocation-glide","display_name":"dislocation slip","score":0.6890000104904175},{"id":"https://openalex.org/keywords/si-sige-quantum-wells","display_name":"Si/SiGe quantum wells","score":0.746999979019165},{"id":"https://openalex.org/keywords/molecular-beam-epitaxy","display_name":"molecular beam epitaxy","score":0.6330000162124634}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7617765665054321},{"id":"https://openalex.org/C79794668","wikidata":"https://www.wikidata.org/wiki/Q1616270","display_name":"Heterojunction","level":2,"score":0.7554157376289368},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.6162427663803101},{"id":"https://openalex.org/C3792809","wikidata":"https://www.wikidata.org/wiki/Q898542","display_name":"Molecular beam epitaxy","level":4,"score":0.5696027278900146},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.5359199047088623},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.5313506722450256},{"id":"https://openalex.org/C202974441","wikidata":"https://www.wikidata.org/wiki/Q2576844","display_name":"Stress relaxation","level":3,"score":0.5158314108848572},{"id":"https://openalex.org/C2780547777","wikidata":"https://www.wikidata.org/wiki/Q368967","display_name":"Rutherford backscattering spectrometry","level":3,"score":0.5099519491195679},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.41535454988479614},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.36417803168296814},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3639640808105469},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.347713828086853},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.33112525939941406},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.32760781049728394},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.3218145966529846},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.21320530772209167},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.19316864013671875},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.14198237657546997},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.1094115674495697},{"id":"https://openalex.org/C149912024","wikidata":"https://www.wikidata.org/wiki/Q462188","display_name":"Creep","level":2,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0168-583x(01)00559-6","doi":"https://doi.org/10.1016/s0168-583x(01)00559-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0168-583x(01)00559-6","pdf_url":null,"source":{"id":"https://openalex.org/S113542562","display_name":"Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms","issn_l":"0168-583X","issn":["0168-583X","1872-9584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":24,"referenced_works":["https://openalex.org/W1572130436","https://openalex.org/W1644048013","https://openalex.org/W1976960400","https://openalex.org/W1994356262","https://openalex.org/W2019597120","https://openalex.org/W2029476940","https://openalex.org/W2033129221","https://openalex.org/W2038530219","https://openalex.org/W2038658940","https://openalex.org/W2041492467","https://openalex.org/W2047174501","https://openalex.org/W2051413367","https://openalex.org/W2057875422","https://openalex.org/W2060853360","https://openalex.org/W2064198412","https://openalex.org/W2066700961","https://openalex.org/W2067557795","https://openalex.org/W2072201588","https://openalex.org/W2077983184","https://openalex.org/W2082605522","https://openalex.org/W2090412352","https://openalex.org/W2092474521","https://openalex.org/W2162774949","https://openalex.org/W6831482158"],"related_works":["https://openalex.org/W2318361966","https://openalex.org/W1672866106","https://openalex.org/W7086627833","https://openalex.org/W4240034804","https://openalex.org/W2061816686","https://openalex.org/W1644048013","https://openalex.org/W2907087786","https://openalex.org/W1655063812","https://openalex.org/W2125645949","https://openalex.org/W7006065996"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2018,"cited_by_count":3},{"year":2017,"cited_by_count":3},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}