{"id":"https://openalex.org/W2093802420","doi":"https://doi.org/10.1116/1.581466","title":"Nanoindentation hardness, abrasive wear, and microstructure of TiN/NbN polycrystalline nanostructured multilayer films grown by reactive magnetron sputtering","display_name":"Nanoindentation hardness, abrasive wear, and microstructure of TiN/NbN polycrystalline nanostructured multilayer films grown by reactive magnetron sputtering","publication_year":1998,"publication_date":"1998-09-01","ids":{"openalex":"https://openalex.org/W2093802420","doi":"https://doi.org/10.1116/1.581466","mag":"2093802420"},"language":"en","primary_location":{"id":"doi:10.1116/1.581466","doi":"https://doi.org/10.1116/1.581466","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.581466","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science &amp; Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5036137125","display_name":"Henrik Ljungcrantz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"H. Ljungcrantz","raw_affiliation_strings":["Thin Film Division, Department of Physics, Link\u00f6ping University, S-581\u200983\u2009Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Division, Department of Physics, Link\u00f6ping University, S-581\u200983\u2009Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]},{"author_position":"middle","author":{"id":null,"display_name":"C. Engstr\u00f6m","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"C. Engstr\u00f6m","raw_affiliation_strings":["Thin Film Division, Department of Physics, Link\u00f6ping University, S-581\u200983\u2009Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Division, Department of Physics, Link\u00f6ping University, S-581\u200983\u2009Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086073947","display_name":"Lars Hultman","orcid":"https://orcid.org/0000-0002-2837-3656","observed_orcids":["https://orcid.org/0000-0002-2837-3656"]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"L. Hultman","raw_affiliation_strings":["Thin Film Division, Department of Physics, Link\u00f6ping University, S-581\u200983\u2009Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Division, Department of Physics, Link\u00f6ping University, S-581\u200983\u2009Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5035511917","display_name":"Maryam K. Olsson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I123387679","display_name":"Uppsala University","ror":"https://ror.org/048a87296","country_code":"SE","type":"education","lineage":["https://openalex.org/I123387679"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"M. Olsson","raw_affiliation_strings":["Division of Materials Science, Department of Technology, Uppsala University, Box 534, S-751\u200921\u2009Uppsala, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Division of Materials Science, Department of Technology, Uppsala University, Box 534, S-751\u200921\u2009Uppsala, Sweden","institution_ids":["https://openalex.org/I123387679"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102028168","display_name":"Xiaoyu Chu","orcid":"https://orcid.org/0000-0002-1890-9138","observed_orcids":["https://orcid.org/0000-0002-1890-9138"]},"institutions":[{"id":"https://openalex.org/I111979921","display_name":"Northwestern University","ror":"https://ror.org/000e0be47","country_code":"US","type":"education","lineage":["https://openalex.org/I111979921"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"X. Chu","raw_affiliation_strings":["BIRL, Northwestern University, Evanston, Illinois\u200960201"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"BIRL, Northwestern University, Evanston, Illinois\u200960201","institution_ids":["https://openalex.org/I111979921"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065184968","display_name":"Ming\u2010Show Wong","orcid":"https://orcid.org/0000-0003-0449-1241","observed_orcids":["https://orcid.org/0000-0003-0449-1241"]},"institutions":[{"id":"https://openalex.org/I111979921","display_name":"Northwestern University","ror":"https://ror.org/000e0be47","country_code":"US","type":"education","lineage":["https://openalex.org/I111979921"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. S. Wong","raw_affiliation_strings":["BIRL, Northwestern University, Evanston, Illinois\u200960201"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"BIRL, Northwestern University, Evanston, Illinois\u200960201","institution_ids":["https://openalex.org/I111979921"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112769365","display_name":"W.D. Sproul","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I111979921","display_name":"Northwestern University","ror":"https://ror.org/000e0be47","country_code":"US","type":"education","lineage":["https://openalex.org/I111979921"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"W. D. Sproul","raw_affiliation_strings":["BIRL, Northwestern University, Evanston, Illinois\u200960201"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"BIRL, Northwestern University, Evanston, Illinois\u200960201","institution_ids":["https://openalex.org/I111979921"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":12.6333,"has_fulltext":false,"cited_by_count":83,"citation_normalized_percentile":{"value":0.99455221,"is_in_top_1_percent":true,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":97},"biblio":{"volume":"16","issue":"5","first_page":"3104","last_page":"3113"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13470","display_name":"Surface Treatment and Coatings","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/reactive-magnetron-sputtering","display_name":"reactive magnetron sputtering","score":0.9120000004768372},{"id":"https://openalex.org/keywords/nanohardness","display_name":"nanohardness","score":0.9190000295639038},{"id":"https://openalex.org/keywords/abrasive-wear-resistance","display_name":"abrasive wear resistance","score":0.9769999980926514},{"id":"https://openalex.org/keywords/residual-stress","display_name":"residual stress","score":0.9160000085830688},{"id":"https://openalex.org/keywords/grain-size","display_name":"grain size","score":0.6930000185966492},{"id":"https://openalex.org/keywords/substrate-bias","display_name":"substrate bias","score":0.48100000619888306},{"id":"https://openalex.org/keywords/high-speed-steel-substrates","display_name":"high-speed steel substrates","score":0.7419999837875366}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8911653757095337},{"id":"https://openalex.org/C49326732","wikidata":"https://www.wikidata.org/wiki/Q1549892","display_name":"Nanoindentation","level":2,"score":0.8411904573440552},{"id":"https://openalex.org/C525849907","wikidata":"https://www.wikidata.org/wiki/Q1096","display_name":"Tin","level":2,"score":0.7817080616950989},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.7079805135726929},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.5483803749084473},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.5281367897987366},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.5275282859802246},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.46159741282463074},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.42581576108932495},{"id":"https://openalex.org/C192191005","wikidata":"https://www.wikidata.org/wiki/Q466491","display_name":"Grain size","level":2,"score":0.4250012934207916},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.42227500677108765},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.38058966398239136},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.13114091753959656},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.581466","doi":"https://doi.org/10.1116/1.581466","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.581466","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science &amp; Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320322581","display_name":"Vetenskapsr\u00e5det","ror":"https://ror.org/03zttf063"},{"id":"https://openalex.org/F4320337367","display_name":"Division of Materials Research","ror":"https://ror.org/01pc7k308"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":33,"referenced_works":["https://openalex.org/W1964753392","https://openalex.org/W1979753997","https://openalex.org/W1983329315","https://openalex.org/W1986754627","https://openalex.org/W1996750325","https://openalex.org/W1998430613","https://openalex.org/W1998815101","https://openalex.org/W2003478671","https://openalex.org/W2004318959","https://openalex.org/W2008415031","https://openalex.org/W2009341485","https://openalex.org/W2014413280","https://openalex.org/W2017738014","https://openalex.org/W2023022958","https://openalex.org/W2027489748","https://openalex.org/W2034183626","https://openalex.org/W2036991573","https://openalex.org/W2037521233","https://openalex.org/W2040122951","https://openalex.org/W2043205917","https://openalex.org/W2047796846","https://openalex.org/W2048407303","https://openalex.org/W2053667303","https://openalex.org/W2060564319","https://openalex.org/W2061860912","https://openalex.org/W2067985211","https://openalex.org/W2075710380","https://openalex.org/W2083590781","https://openalex.org/W2086529087","https://openalex.org/W2086933933","https://openalex.org/W2132343019","https://openalex.org/W2166382057","https://openalex.org/W2167816833"],"related_works":["https://openalex.org/W2021778314","https://openalex.org/W2046843079","https://openalex.org/W2004604396","https://openalex.org/W2359658338","https://openalex.org/W2032565259","https://openalex.org/W2035654765","https://openalex.org/W103104002","https://openalex.org/W4231894299","https://openalex.org/W2074066294","https://openalex.org/W2019754204"],"abstract_inverted_index":{"TiN,":[0,264],"NbN,":[1,265],"and":[2,21,65,85,100,117,124,135,145,166,199,266,314,322],"TiN/NbN":[3,163,200,214,315],"polycrystalline":[4,213],"nanostructured":[5,164,215],"multilayer":[6,216],"films":[7,141,168,183,279,303,313],"were":[8,29,73,111,317],"deposited":[9],"on":[10],"high-speed":[11],"steel":[12],"substrates":[13],"by":[14,58,78,104,129],"unbalanced":[15],"reactive":[16],"magnetron":[17],"sputtering":[18],"of":[19,35,48,95,108,155,172,188,208,258,278,291,304,310],"Ti":[20],"Nb":[22],"targets":[23],"in":[24,42,169,204,211],"Ar\u2013N2":[25],"discharges.":[26],"Two":[27],"techniques":[28],"used":[30],"for":[31,162,237,251,262],"obtaining":[32],"a":[33,49,79,143,256,284],"series":[34,116,158,282,294],"multilayers":[36,165,201,239,247,270,316],"with":[37,89,148,196,287],"compositional":[38],"modulation":[39],"period,":[40],"\u039b,":[41],"the":[43,63,69,76,109,114,120,156,170,176,185,193,212,228,238,241,292,301,305],"range":[44,171],"3.8\u2013100":[45],"nm;":[46],"rotation":[47],"cylindrical":[50],"substrate":[51,64,81,136],"holder":[52],"between":[53,113,280],"two":[54,70],"opposing":[55],"cathodes":[56,61],"or":[57],"positioning":[59],"inclined":[60],"above":[62],"using":[66],"shutters.":[67],"For":[68,175,231],"setups,":[71],"ions":[72],"accelerated":[74],"from":[75],"discharge":[77],"negative":[80,285],"bias":[82],"Vs=120\u2013150":[83],"V":[84],"Vs=100":[86],"V,":[87],"respectively,":[88],"an":[90],"ion-to-metal":[91],"arrival":[92],"rate":[93],"ratio":[94],"\u223c1.":[96],"The":[97,206,245,274],"nanoindentation":[98],"hardness":[99,161,187,195],"abrasive":[101,275],"wear":[102,276,297],"resistance":[103,277,298],"dimple":[105],"grinding":[106],"test":[107,154],"coatings":[110],"compared":[112,299],"sample":[115,281],"related":[118],"to":[119,219,222,300],"microstructure,":[121],"phase":[122],"composition,":[123],"residual":[125],"stress":[126],"\u03c3res":[127,234],"obtained":[128],"transmission":[130],"electron":[131],"microscopy,":[132],"x-ray":[133],"diffraction,":[134],"curvature":[137],"technique,":[138],"respectively.":[139,327],"All":[140],"exhibited":[142,184,248,295],"dense":[144],"columnar":[146],"microstructure":[147],"20\u201390":[149],"nm":[150],"grain":[151,225,288],"sizes.":[152],"Nanoindentation":[153],"high-Vs":[157,293,311],"showed":[159,283],"similar":[160],"homogeneous":[167,243,263],"32\u201334":[173],"GPa.":[174,273],"low-Vs":[177,246,306],"series,":[178,233],"mixed-phase":[179],"hexagonal":[180],"\u03b2-Nb2N/cubic":[181],"\u03b4-NbN":[182],"highest":[186],"39":[189],"GPa,":[190,198],"TiN":[191],"had":[192,202,271],"lowest":[194],"26":[197],"values":[203],"between.":[205],"absence":[207],"superlattice":[209],"hardening":[210],"is":[217],"suggested":[218],"be":[220],"due":[221],"microcracking":[223],"at":[224],"boundaries":[226],"under":[227],"indentor":[229],"tip.":[230],"both":[232],"was":[235],"lower":[236],"than":[240,255,261],"corresponding":[242,302],"films.":[244,268],"\u03c3res\u2a7d1.6":[249],"GPa":[250],"\u039b\u2a7d16.6":[252],"nm,":[253],"more":[254],"factor":[257],"2":[259],"smaller":[260],"TiNbN-alloy":[267],"High-Vs":[269],"\u03c3res\u223c4":[272],"correlation":[286],"size.":[289],"Films":[290],"higher":[296],"series.":[307],"Wear":[308],"constants":[309],"\u03b2-Nb2N":[312],"as":[318,320],"low":[319],"28":[321],"40":[323],"\u03bcm3":[324],"mm\u22121":[325],"N\u22121,":[326]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":3},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":4}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}
