{"id":"https://openalex.org/W2091589937","doi":"https://doi.org/10.1016/0022-0248(92)90371-o","title":"Measurement and control of reagent concentrations in MOCVD reactor using ultrasonics","display_name":"Measurement and control of reagent concentrations in MOCVD reactor using ultrasonics","publication_year":1992,"publication_date":"1992-05-01","ids":{"openalex":"https://openalex.org/W2091589937","doi":"https://doi.org/10.1016/0022-0248(92)90371-o","mag":"2091589937"},"language":"en","primary_location":{"id":"doi:10.1016/0022-0248(92)90371-o","doi":"https://doi.org/10.1016/0022-0248(92)90371-o","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0022-0248(92)90371-o","pdf_url":null,"source":{"id":"https://openalex.org/S10719676","display_name":"Journal of Crystal Growth","issn_l":"0022-0248","issn":["0022-0248","1873-5002"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Crystal Growth","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5032310939","display_name":"J. P. Stagg","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"J.P. Stagg","raw_affiliation_strings":["BNR Europe Limited, London Road, Harlow, Essex CM17 9NA, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"BNR Europe Limited, London Road, Harlow, Essex CM17 9NA, UK","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048849692","display_name":"J. Christer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210157757","display_name":"Thomas Swan (United Kingdom)","ror":"https://ror.org/05c27eq92","country_code":"GB","type":"company","lineage":["https://openalex.org/I4210157757"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"J. Christer","raw_affiliation_strings":["Thomas Swan and Co. Ltd., Semiconductor Division, Unit 1C, Button End, Harston, Cambridge CB2 5NX, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thomas Swan and Co. Ltd., Semiconductor Division, Unit 1C, Button End, Harston, Cambridge CB2 5NX, UK","institution_ids":["https://openalex.org/I4210157757"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000288516","display_name":"Edward J. Thrush","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"E.J. Thrush","raw_affiliation_strings":["BNR Europe Limited, London Road, Harlow, Essex CM17 9NA, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"BNR Europe Limited, London Road, Harlow, Essex CM17 9NA, UK","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5084301526","display_name":"J. A. Crawley","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210157757","display_name":"Thomas Swan (United Kingdom)","ror":"https://ror.org/05c27eq92","country_code":"GB","type":"company","lineage":["https://openalex.org/I4210157757"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"J. Crawley","raw_affiliation_strings":["Thomas Swan and Co. Ltd., Semiconductor Division, Unit 1C, Button End, Harston, Cambridge CB2 5NX, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thomas Swan and Co. Ltd., Semiconductor Division, Unit 1C, Button End, Harston, Cambridge CB2 5NX, UK","institution_ids":["https://openalex.org/I4210157757"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3110,"currency":"USD","value_usd":3110},"apc_paid":null,"fwci":4.172,"has_fulltext":false,"cited_by_count":44,"citation_normalized_percentile":{"value":0.93996161,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":95},"biblio":{"volume":"120","issue":"1-4","first_page":"98","last_page":"102"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.885699987411499,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.885699987411499,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.04659999907016754,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.016200000420212746,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/mocvd-reactor","display_name":"MOCVD reactor","score":0.753000020980835},{"id":"https://openalex.org/keywords/feedback-control","display_name":"feedback control","score":0.9259999990463257},{"id":"https://openalex.org/keywords/rocking-curves","display_name":"rocking curves","score":0.7089999914169312},{"id":"https://openalex.org/keywords/gas-mixture-analysis","display_name":"gas mixture analysis","score":0.5540000200271606}],"concepts":[{"id":"https://openalex.org/C175665537","wikidata":"https://www.wikidata.org/wiki/Q1924991","display_name":"Metalorganic vapour phase epitaxy","level":4,"score":0.709222137928009},{"id":"https://openalex.org/C108649604","wikidata":"https://www.wikidata.org/wiki/Q1065170","display_name":"Full width at half maximum","level":2,"score":0.6672821044921875},{"id":"https://openalex.org/C36591836","wikidata":"https://www.wikidata.org/wiki/Q125264","display_name":"Mole fraction","level":2,"score":0.6169777512550354},{"id":"https://openalex.org/C40875361","wikidata":"https://www.wikidata.org/wiki/Q2356542","display_name":"Reagent","level":2,"score":0.5434011816978455},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.533573567867279},{"id":"https://openalex.org/C83415579","wikidata":"https://www.wikidata.org/wiki/Q161973","display_name":"Arc (geometry)","level":2,"score":0.5282313823699951},{"id":"https://openalex.org/C4606981","wikidata":"https://www.wikidata.org/wiki/Q841282","display_name":"Arc lamp","level":2,"score":0.4284972846508026},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.4089711308479309},{"id":"https://openalex.org/C116915560","wikidata":"https://www.wikidata.org/wiki/Q83504","display_name":"Nuclear engineering","level":1,"score":0.3874603509902954},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.364851176738739},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.30710187554359436},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.22604051232337952},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1798955202102661},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.16644123196601868},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.14063486456871033},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.126267671585083},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.119985431432724},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.09420886635780334},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0022-0248(92)90371-o","doi":"https://doi.org/10.1016/0022-0248(92)90371-o","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0022-0248(92)90371-o","pdf_url":null,"source":{"id":"https://openalex.org/S10719676","display_name":"Journal of Crystal Growth","issn_l":"0022-0248","issn":["0022-0248","1873-5002"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Crystal Growth","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2029341063","https://openalex.org/W2038359860","https://openalex.org/W2083383654"],"related_works":["https://openalex.org/W2105226781","https://openalex.org/W1905976258","https://openalex.org/W2038359860","https://openalex.org/W2082832634","https://openalex.org/W2322747149","https://openalex.org/W2059797632","https://openalex.org/W2065776135","https://openalex.org/W1969882561","https://openalex.org/W2788037375","https://openalex.org/W2015162786"],"abstract_inverted_index":null,"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2017,"cited_by_count":1},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":1}],"updated_date":"2026-10-14T16:39:01.820549","created_date":"2016-06-24T00:00:00"}