{"id":"https://openalex.org/W2089028707","doi":"https://doi.org/10.1143/jjap.45.l291","title":"TiO2-Coated Transparent Conductive Oxide (SnO2:F) Films Prepared by Atmospheric Pressure Chemical Vapor Deposition with High Durability against Atomic Hydrogen","display_name":"TiO2-Coated Transparent Conductive Oxide (SnO2:F) Films Prepared by Atmospheric Pressure Chemical Vapor Deposition with High Durability against Atomic Hydrogen","publication_year":2006,"publication_date":"2006-03-01","ids":{"openalex":"https://openalex.org/W2089028707","doi":"https://doi.org/10.1143/jjap.45.l291","mag":"2089028707"},"language":"en","primary_location":{"id":"doi:10.1143/jjap.45.l291","doi":"https://doi.org/10.1143/jjap.45.l291","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.45.l291","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.45.L291/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://iopscience.iop.org/article/10.1143/JJAP.45.L291/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5045166362","display_name":"Mika Kambe","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210127379","display_name":"Asahi Glass (Japan)","ror":"https://ror.org/02nnhbq91","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210127379"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Mika Kambe","raw_affiliation_strings":["Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan","Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan","institution_ids":["https://openalex.org/I114531698"]},{"raw_affiliation_string":"Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan","institution_ids":["https://openalex.org/I4210127379"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5105356564","display_name":"Kazuo Sato","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127379","display_name":"Asahi Glass (Japan)","ror":"https://ror.org/02nnhbq91","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210127379"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kazuo Sato","raw_affiliation_strings":["Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan","institution_ids":["https://openalex.org/I4210127379"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Daisuke Kobayashi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127379","display_name":"Asahi Glass (Japan)","ror":"https://ror.org/02nnhbq91","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210127379"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Daisuke Kobayashi","raw_affiliation_strings":["Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan","institution_ids":["https://openalex.org/I4210127379"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5067576927","display_name":"Yasuyoshi Kurokawa","orcid":"https://orcid.org/0000-0002-5319-3622","observed_orcids":["https://orcid.org/0000-0002-5319-3622"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yasuyoshi Kurokawa","raw_affiliation_strings":["Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046068356","display_name":"Shinsuke Miyajima","orcid":"https://orcid.org/0000-0002-0184-3152","observed_orcids":["https://orcid.org/0000-0002-0184-3152"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shinsuke Miyajima","raw_affiliation_strings":["Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086043530","display_name":"Makoto Fukawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127379","display_name":"Asahi Glass (Japan)","ror":"https://ror.org/02nnhbq91","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210127379"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Makoto Fukawa","raw_affiliation_strings":["Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan","institution_ids":["https://openalex.org/I4210127379"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020338042","display_name":"Naoki Taneda","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127379","display_name":"Asahi Glass (Japan)","ror":"https://ror.org/02nnhbq91","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210127379"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Naoki Taneda","raw_affiliation_strings":["Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan","institution_ids":["https://openalex.org/I4210127379"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056448365","display_name":"Akira Yamada","orcid":"https://orcid.org/0000-0002-7047-8291","observed_orcids":["https://orcid.org/0000-0002-7047-8291"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Akira Yamada","raw_affiliation_strings":["Quantum Nanoelectronics Research Center, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Quantum Nanoelectronics Research Center, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5022647498","display_name":"Makoto Konagai","orcid":"https://orcid.org/0000-0002-3115-0058","observed_orcids":["https://orcid.org/0000-0002-3115-0058"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Makoto Konagai","raw_affiliation_strings":["Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan","institution_ids":["https://openalex.org/I114531698"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2210,"currency":"USD","value_usd":2210},"apc_paid":null,"fwci":0.9843,"has_fulltext":true,"cited_by_count":19,"citation_normalized_percentile":{"value":0.78331047,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"45","issue":"3L","first_page":"L291","last_page":"L291"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.5493000149726868,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.5493000149726868,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.10130000114440918,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.06880000233650208,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/transparent-conducting-oxides","display_name":"transparent conducting oxides","score":0.8930000066757202},{"id":"https://openalex.org/keywords/fluorine-doped-tin-oxide","display_name":"fluorine-doped tin oxide","score":0.9700000286102295},{"id":"https://openalex.org/keywords/tio2-coating","display_name":"TiO2 coating","score":0.890999972820282},{"id":"https://openalex.org/keywords/atmospheric-pressure-chemical-vapor-deposition","display_name":"atmospheric pressure chemical vapor deposition","score":0.8820000290870667},{"id":"https://openalex.org/keywords/optical-transmittance","display_name":"optical transmittance","score":0.9399999976158142},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.8709999918937683}],"concepts":[{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.8083783388137817},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6519421935081482},{"id":"https://openalex.org/C17470697","wikidata":"https://www.wikidata.org/wiki/Q2449552","display_name":"Transparent conducting film","level":3,"score":0.6032434105873108},{"id":"https://openalex.org/C69544855","wikidata":"https://www.wikidata.org/wiki/Q757625","display_name":"Atomic layer deposition","level":3,"score":0.5954180955886841},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5783782005310059},{"id":"https://openalex.org/C512968161","wikidata":"https://www.wikidata.org/wiki/Q556","display_name":"Hydrogen","level":2,"score":0.5775158405303955},{"id":"https://openalex.org/C2780924660","wikidata":"https://www.wikidata.org/wiki/Q205123","display_name":"Tin oxide","level":3,"score":0.5716084837913513},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.5621300339698792},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5089883804321289},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.48267844319343567},{"id":"https://openalex.org/C200239111","wikidata":"https://www.wikidata.org/wiki/Q81809","display_name":"Atmospheric pressure","level":2,"score":0.4450666606426239},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.4381338357925415},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.4369197487831116},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.23720043897628784},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.23418301343917847},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.22793924808502197},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16539856791496277},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.09336608648300171},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1143/jjap.45.l291","doi":"https://doi.org/10.1143/jjap.45.l291","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.45.l291","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.45.L291/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},{"id":"pmh:oai:irdb.nii.ac.jp:00897:0003990572","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100600167","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Jpn. J. Appl. Phys.","raw_type":"journal article"},{"id":"pmh:oai:t2r2.star.titech.ac.jp:50098936","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100600167","pdf_url":null,"source":{"id":"https://openalex.org/S4377196385","display_name":"Tokyo Tech Research Repository (Tokyo Institute of Technology)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I114531698","host_organization_name":"Tokyo Institute of Technology","host_organization_lineage":["https://openalex.org/I114531698"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Journal Article"}],"best_oa_location":{"id":"doi:10.1143/jjap.45.l291","doi":"https://doi.org/10.1143/jjap.45.l291","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.45.l291","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.45.L291/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2089028707.pdf","grobid_xml":"https://content.openalex.org/works/W2089028707.grobid-xml"},"referenced_works_count":6,"referenced_works":["https://openalex.org/W1997832956","https://openalex.org/W2036952295","https://openalex.org/W2052022942","https://openalex.org/W2061407168","https://openalex.org/W2075542385","https://openalex.org/W2094014964"],"related_works":["https://openalex.org/W1987195014","https://openalex.org/W6997093897","https://openalex.org/W2107584190","https://openalex.org/W7146198716","https://openalex.org/W2036952295","https://openalex.org/W7161583966","https://openalex.org/W2034778942","https://openalex.org/W595034453","https://openalex.org/W3090305696","https://openalex.org/W817332460"],"abstract_inverted_index":{"The":[0],"durability":[1],"of":[2,20],"textured":[3,27],"transparent":[4],"conductive":[5],"oxide":[6,30],"(TCO)":[7],"thin":[8],"films":[9,44,73,93],"against":[10],"atomic":[11,62,113],"hydrogen":[12,63],"was":[13,24],"investigated.":[14],"An":[15],"ultrathin":[16],"TiO":[17,47,76],"2":[18,21,32,48,77],"layer":[19,49,78],"nm":[22],"thickness":[23],"deposited":[25],"on":[26],"fluorine-doped":[28],"tin":[29],"(SnO":[31],":F)":[33],"films,":[34],"successively":[35],"by":[36,65,96],"atmospheric":[37],"pressure":[38],"chemical":[39],"vapor":[40],"deposition":[41],"(AP-CVD).":[42],"TCO":[43,72,92],"with":[45],"a":[46,51,56,75,80,85],"showed":[50,79],"higher":[52,86],"optical":[53,82],"transmittance":[54,83],"and":[55,84,101,108],"lower":[57,81],"resistivity":[58,87],"after":[59,88,109],"exposure":[60,111],"to":[61,112],"excited":[64],"very":[66],"high":[67],"frequency":[68],"(VHF)":[69],"plasma,":[70],"while":[71],"without":[74],"the":[89,110],"exposure.":[90],"These":[91],"were":[94],"characterized":[95],"X-ray":[97],"photoelectron":[98],"spectroscopy":[99,105],"(XPS)":[100],"secondary":[102],"ion":[103],"mass":[104],"(SIMS)":[106],"before":[107],"hydrogen.":[114]},"counts_by_year":[{"year":2024,"cited_by_count":2},{"year":2022,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":3}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}