{"id":"https://openalex.org/W2087516191","doi":"https://doi.org/10.1016/s0022-0248(98)00255-3","title":"Structural investigation of sapphire surface after nitridation","display_name":"Structural investigation of sapphire surface after nitridation","publication_year":1998,"publication_date":"1998-06-01","ids":{"openalex":"https://openalex.org/W2087516191","doi":"https://doi.org/10.1016/s0022-0248(98)00255-3","mag":"2087516191"},"language":"en","primary_location":{"id":"doi:10.1016/s0022-0248(98)00255-3","doi":"https://doi.org/10.1016/s0022-0248(98)00255-3","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0022-0248(98)00255-3","pdf_url":null,"source":{"id":"https://openalex.org/S10719676","display_name":"Journal of Crystal Growth","issn_l":"0022-0248","issn":["0022-0248","1873-5002"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Crystal Growth","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5000620889","display_name":"Tadao Hashimoto","orcid":"https://orcid.org/0009-0004-0085-8768","observed_orcids":["https://orcid.org/0009-0004-0085-8768"]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Tadao Hashimoto","raw_affiliation_strings":["Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072918491","display_name":"Yoshitami Terakoshi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshitami Terakoshi","raw_affiliation_strings":["Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565, Japan","Dept of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]},{"raw_affiliation_string":"Dept of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109203606","display_name":"Masahiro Ishida","orcid":"https://orcid.org/0009-0000-7712-4966","observed_orcids":["https://orcid.org/0009-0000-7712-4966"]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masahiro Ishida","raw_affiliation_strings":["Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111702876","display_name":"Masaaki Yuri","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masaaki Yuri","raw_affiliation_strings":["Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113593635","display_name":"O. Imafuji","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Osamu Imafuji","raw_affiliation_strings":["Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062822226","display_name":"Takashi Sugino","orcid":"https://orcid.org/0000-0002-0205-0525","observed_orcids":["https://orcid.org/0000-0002-0205-0525"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takashi Sugino","raw_affiliation_strings":["Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565, Japan","Dept of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]},{"raw_affiliation_string":"Dept of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111702877","display_name":"A. Yoshikawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Akio Yoshikawa","raw_affiliation_strings":["Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110888323","display_name":"Kunio Itoh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kunio Itoh","raw_affiliation_strings":["Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronics Research Laboratory, Matsushita Electronics Corporation, Saiwai-cho, Takatsuki, Osaka 569-11, Japan","institution_ids":["https://openalex.org/I1283155146"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5000620889"],"corresponding_institution_ids":["https://openalex.org/I1283155146"],"apc_list":{"value":3110,"currency":"USD","value_usd":3110},"apc_paid":null,"fwci":0.8748,"has_fulltext":false,"cited_by_count":40,"citation_normalized_percentile":{"value":0.73317058,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"189-190","issue":null,"first_page":"254","last_page":"258"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.8086000084877014,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.8086000084877014,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.04340000078082085,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.03819999843835831,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sapphire","display_name":"sapphire","score":0.8650000095367432},{"id":"https://openalex.org/keywords/nitridation","display_name":"nitridation","score":0.9229999780654907},{"id":"https://openalex.org/keywords/al2o3-surface","display_name":"Al2O3 surface","score":0.7919999957084656},{"id":"https://openalex.org/keywords/nitridation-mechanism","display_name":"nitridation mechanism","score":0.8640000224113464},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.9089999794960022},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.6430000066757202},{"id":"https://openalex.org/keywords/nitrogen-incorporation","display_name":"nitrogen incorporation","score":0.4390000104904175}],"concepts":[{"id":"https://openalex.org/C2780064504","wikidata":"https://www.wikidata.org/wiki/Q127583","display_name":"Sapphire","level":3,"score":0.8994438648223877},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.8674502372741699},{"id":"https://openalex.org/C200096950","wikidata":"https://www.wikidata.org/wiki/Q455003","display_name":"Reflection high-energy electron diffraction","level":4,"score":0.7278507947921753},{"id":"https://openalex.org/C77557913","wikidata":"https://www.wikidata.org/wiki/Q864822","display_name":"Electron diffraction","level":3,"score":0.6454569101333618},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5704182386398315},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.5304381847381592},{"id":"https://openalex.org/C102951782","wikidata":"https://www.wikidata.org/wiki/Q49295","display_name":"Atomic force microscopy","level":2,"score":0.48229551315307617},{"id":"https://openalex.org/C537208039","wikidata":"https://www.wikidata.org/wiki/Q627","display_name":"Nitrogen","level":2,"score":0.45367974042892456},{"id":"https://openalex.org/C65682993","wikidata":"https://www.wikidata.org/wiki/Q1056451","display_name":"Reflection (computer programming)","level":2,"score":0.434880793094635},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.4336652457714081},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.32002031803131104},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2657211422920227},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.23341667652130127},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.2316654920578003},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.16809648275375366},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0022-0248(98)00255-3","doi":"https://doi.org/10.1016/s0022-0248(98)00255-3","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0022-0248(98)00255-3","pdf_url":null,"source":{"id":"https://openalex.org/S10719676","display_name":"Journal of Crystal Growth","issn_l":"0022-0248","issn":["0022-0248","1873-5002"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Crystal Growth","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W2007930532","https://openalex.org/W2012682516","https://openalex.org/W2033964684","https://openalex.org/W2035091627","https://openalex.org/W2042916342","https://openalex.org/W2051564649","https://openalex.org/W2091654480","https://openalex.org/W2093175427","https://openalex.org/W2097913467"],"related_works":["https://openalex.org/W2314898297","https://openalex.org/W2463880471","https://openalex.org/W1608457091","https://openalex.org/W4318538490","https://openalex.org/W2140666032","https://openalex.org/W2022697388","https://openalex.org/W3046555194","https://openalex.org/W2341497588","https://openalex.org/W1996545555","https://openalex.org/W2014904554"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":4}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}