{"id":"https://openalex.org/W2087213985","doi":"https://doi.org/10.1016/0040-6090(96)08650-6","title":"Ion implantation in predoped CVD diamond","display_name":"Ion implantation in predoped CVD diamond","publication_year":1996,"publication_date":"1996-08-01","ids":{"openalex":"https://openalex.org/W2087213985","doi":"https://doi.org/10.1016/0040-6090(96)08650-6","mag":"2087213985"},"language":"en","primary_location":{"id":"doi:10.1016/0040-6090(96)08650-6","doi":"https://doi.org/10.1016/0040-6090(96)08650-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0040-6090(96)08650-6","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113420731","display_name":"H. Yagyu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"H. Yagyu","raw_affiliation_strings":["Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":null,"display_name":"M. Deguchi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Deguchi","raw_affiliation_strings":["Central Research Laboratories, Matsushita Electric Industrial Co. Ltd., Souraku-gun, Kyoto 619-02, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Laboratories, Matsushita Electric Industrial Co. Ltd., Souraku-gun, Kyoto 619-02, Japan","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015586043","display_name":"Yusuke Mori","orcid":"https://orcid.org/0000-0003-2952-7458","observed_orcids":["https://orcid.org/0000-0003-2952-7458"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Mori","raw_affiliation_strings":["Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062815167","display_name":"Akimitsu Hatta","orcid":"https://orcid.org/0000-0003-0231-2190","observed_orcids":["https://orcid.org/0000-0003-0231-2190"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"A. Hatta","raw_affiliation_strings":["Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5013749664","display_name":"Tomoko Ito","orcid":"https://orcid.org/0000-0002-3482-4046","observed_orcids":["https://orcid.org/0000-0002-3482-4046"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Ito","raw_affiliation_strings":["Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108747337","display_name":"Makoto Kitabatake","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Kitabatake","raw_affiliation_strings":["Central Research Laboratories, Matsushita Electric Industrial Co. Ltd., Souraku-gun, Kyoto 619-02, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Laboratories, Matsushita Electric Industrial Co. Ltd., Souraku-gun, Kyoto 619-02, Japan","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111436824","display_name":"Hirosi Sakakima","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283155146","display_name":"Panasonic (Japan)","ror":"https://ror.org/011tm7n37","country_code":"JP","type":"company","lineage":["https://openalex.org/I1283155146"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Sakakima","raw_affiliation_strings":["Central Research Laboratories, Matsushita Electric Industrial Co. Ltd., Souraku-gun, Kyoto 619-02, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Laboratories, Matsushita Electric Industrial Co. Ltd., Souraku-gun, Kyoto 619-02, Japan","institution_ids":["https://openalex.org/I1283155146"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111927379","display_name":"Takashi Hirao","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"T. Hirao","raw_affiliation_strings":["Matsushita Technoresearch, Inc., Moriguchi, Osaka 570, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Matsushita Technoresearch, Inc., Moriguchi, Osaka 570, Japan","institution_ids":[]}]},{"author_position":"last","author":{"id":null,"display_name":"A. Hiraki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"A. Hiraki","raw_affiliation_strings":["Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan","institution_ids":["https://openalex.org/I98285908"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5113420731"],"corresponding_institution_ids":["https://openalex.org/I98285908"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.2294854,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"281-282","issue":null,"first_page":"271","last_page":"274"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ion-implantation","display_name":"ion implantation","score":0.8650000095367432},{"id":"https://openalex.org/keywords/boron-doped-diamond","display_name":"boron-doped diamond","score":0.8930000066757202},{"id":"https://openalex.org/keywords/cvd-diamond","display_name":"CVD diamond","score":0.9129999876022339},{"id":"https://openalex.org/keywords/hydrogen-plasma-treatment","display_name":"hydrogen plasma treatment","score":0.9169999957084656},{"id":"https://openalex.org/keywords/implantation-induced-defects","display_name":"implantation-induced defects","score":0.777999997138977},{"id":"https://openalex.org/keywords/interstitial-carbon","display_name":"interstitial carbon","score":0.6669999957084656},{"id":"https://openalex.org/keywords/vacancies","display_name":"vacancies","score":0.9490000009536743},{"id":"https://openalex.org/keywords/point-defects","display_name":"point defects","score":0.5870000123977661}],"concepts":[{"id":"https://openalex.org/C139861200","wikidata":"https://www.wikidata.org/wiki/Q369794","display_name":"Cathodoluminescence","level":3,"score":0.8405537009239197},{"id":"https://openalex.org/C2776921476","wikidata":"https://www.wikidata.org/wiki/Q5283","display_name":"Diamond","level":2,"score":0.8343545794487},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.7519291639328003},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.7252597808837891},{"id":"https://openalex.org/C40003534","wikidata":"https://www.wikidata.org/wiki/Q862228","display_name":"Raman spectroscopy","level":2,"score":0.6573607921600342},{"id":"https://openalex.org/C501308230","wikidata":"https://www.wikidata.org/wiki/Q618","display_name":"Boron","level":2,"score":0.648558497428894},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6281657218933105},{"id":"https://openalex.org/C164675345","wikidata":"https://www.wikidata.org/wiki/Q898226","display_name":"Crystallographic defect","level":2,"score":0.5042301416397095},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.49791550636291504},{"id":"https://openalex.org/C512968161","wikidata":"https://www.wikidata.org/wiki/Q556","display_name":"Hydrogen","level":2,"score":0.4923313856124878},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4716046452522278},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.442666620016098},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2509664297103882},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.1973493993282318},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.18031489849090576},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17303478717803955},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.12342327833175659},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.06942927837371826},{"id":"https://openalex.org/C148869448","wikidata":"https://www.wikidata.org/wiki/Q184240","display_name":"Luminescence","level":2,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0040-6090(96)08650-6","doi":"https://doi.org/10.1016/0040-6090(96)08650-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0040-6090(96)08650-6","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":18,"referenced_works":["https://openalex.org/W1970805655","https://openalex.org/W1971187946","https://openalex.org/W2004347989","https://openalex.org/W2004450533","https://openalex.org/W2009691758","https://openalex.org/W2021397788","https://openalex.org/W2022778275","https://openalex.org/W2029499202","https://openalex.org/W2043722368","https://openalex.org/W2046045842","https://openalex.org/W2048792782","https://openalex.org/W2053150602","https://openalex.org/W2061657824","https://openalex.org/W2076169340","https://openalex.org/W2085729447","https://openalex.org/W2085789852","https://openalex.org/W2086418341","https://openalex.org/W2088062000"],"related_works":["https://openalex.org/W2046045842","https://openalex.org/W1983998313","https://openalex.org/W2053150602","https://openalex.org/W1979866960","https://openalex.org/W2086194558","https://openalex.org/W2590804932","https://openalex.org/W75955790","https://openalex.org/W226843691","https://openalex.org/W2038041546","https://openalex.org/W2053213539"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}