{"id":"https://openalex.org/W2086671998","doi":"https://doi.org/10.1016/j.matlet.2014.12.131","title":"Dynamic scaling of swift heavy ion induced surface restructuring of BaF2 thin film","display_name":"Dynamic scaling of swift heavy ion induced surface restructuring of BaF2 thin film","publication_year":2015,"publication_date":"2015-01-06","ids":{"openalex":"https://openalex.org/W2086671998","doi":"https://doi.org/10.1016/j.matlet.2014.12.131","mag":"2086671998"},"language":"en","primary_location":{"id":"doi:10.1016/j.matlet.2014.12.131","doi":"https://doi.org/10.1016/j.matlet.2014.12.131","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.matlet.2014.12.131","pdf_url":null,"source":{"id":"https://openalex.org/S55626769","display_name":"Materials Letters","issn_l":"0167-577X","issn":["0167-577X","1873-4979"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Letters","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101664756","display_name":"Ratnesh K. Pandey","orcid":"https://orcid.org/0000-0003-2460-2631","observed_orcids":["https://orcid.org/0000-0003-2460-2631"]},"institutions":[{"id":"https://openalex.org/I168893459","display_name":"University of Allahabad","ror":"https://ror.org/03vrx7m55","country_code":"IN","type":"education","lineage":["https://openalex.org/I168893459"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Ratnesh K. Pandey","raw_affiliation_strings":["Nanotechnology Application Centre, University of Allahabad, Allahabad 211002, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nanotechnology Application Centre, University of Allahabad, Allahabad 211002, India","institution_ids":["https://openalex.org/I168893459"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034832852","display_name":"Manvendra Kumar","orcid":"https://orcid.org/0000-0001-6745-7425","observed_orcids":["https://orcid.org/0000-0001-6745-7425"]},"institutions":[{"id":"https://openalex.org/I168893459","display_name":"University of Allahabad","ror":"https://ror.org/03vrx7m55","country_code":"IN","type":"education","lineage":["https://openalex.org/I168893459"]}],"countries":["IN"],"is_corresponding":true,"raw_author_name":"Manvendra Kumar","raw_affiliation_strings":["Nanotechnology Application Centre, University of Allahabad, Allahabad 211002, India"],"raw_orcid":"https://orcid.org/0000-0001-6745-7425","affiliations":[{"raw_affiliation_string":"Nanotechnology Application Centre, University of Allahabad, Allahabad 211002, India","institution_ids":["https://openalex.org/I168893459"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050337337","display_name":"Tanuj Kumar","orcid":"https://orcid.org/0000-0001-9168-8581","observed_orcids":["https://orcid.org/0000-0001-9168-8581"]},"institutions":[{"id":"https://openalex.org/I4210089002","display_name":"Inter-University Accelerator Centre","ror":"https://ror.org/0066qbn28","country_code":"IN","type":"facility","lineage":["https://openalex.org/I4210089002"]},{"id":"https://openalex.org/I4210133503","display_name":"Central University of Haryana","ror":"https://ror.org/03mtwkv54","country_code":"IN","type":"education","lineage":["https://openalex.org/I4210133503"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Tanuj Kumar","raw_affiliation_strings":["Central University of Haryana, Jant-Pali, Mahendergarh 123029, India","Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central University of Haryana, Jant-Pali, Mahendergarh 123029, India","institution_ids":["https://openalex.org/I4210133503"]},{"raw_affiliation_string":"Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India","institution_ids":["https://openalex.org/I4210089002"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060145643","display_name":"Avinash Yadav","orcid":"https://orcid.org/0000-0001-9298-3056","observed_orcids":["https://orcid.org/0000-0001-9298-3056"]},"institutions":[{"id":"https://openalex.org/I168893459","display_name":"University of Allahabad","ror":"https://ror.org/03vrx7m55","country_code":"IN","type":"education","lineage":["https://openalex.org/I168893459"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Avinash C. Yadav","raw_affiliation_strings":["Nanotechnology Application Centre, University of Allahabad, Allahabad 211002, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nanotechnology Application Centre, University of Allahabad, Allahabad 211002, India","institution_ids":["https://openalex.org/I168893459"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059453910","display_name":"Udai Bhan Singh","orcid":"https://orcid.org/0000-0002-2393-1655","observed_orcids":["https://orcid.org/0000-0002-2393-1655"]},"institutions":[{"id":"https://openalex.org/I4210089002","display_name":"Inter-University Accelerator Centre","ror":"https://ror.org/0066qbn28","country_code":"IN","type":"facility","lineage":["https://openalex.org/I4210089002"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Udai B. Singh","raw_affiliation_strings":["Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India","institution_ids":["https://openalex.org/I4210089002"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103954763","display_name":"Saif Ahmed Khan","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210089002","display_name":"Inter-University Accelerator Centre","ror":"https://ror.org/0066qbn28","country_code":"IN","type":"facility","lineage":["https://openalex.org/I4210089002"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Saif A. Khan","raw_affiliation_strings":["Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India","institution_ids":["https://openalex.org/I4210089002"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017941747","display_name":"Ambuj Tripathi","orcid":"https://orcid.org/0000-0002-1240-5836","observed_orcids":["https://orcid.org/0000-0002-1240-5836"]},"institutions":[{"id":"https://openalex.org/I4210089002","display_name":"Inter-University Accelerator Centre","ror":"https://ror.org/0066qbn28","country_code":"IN","type":"facility","lineage":["https://openalex.org/I4210089002"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Ambuj Tripathi","raw_affiliation_strings":["Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India","institution_ids":["https://openalex.org/I4210089002"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030107435","display_name":"D.K. Avasthi","orcid":"https://orcid.org/0000-0002-8558-1494","observed_orcids":["https://orcid.org/0000-0002-8558-1494"]},"institutions":[{"id":"https://openalex.org/I4210089002","display_name":"Inter-University Accelerator Centre","ror":"https://ror.org/0066qbn28","country_code":"IN","type":"facility","lineage":["https://openalex.org/I4210089002"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"D.K. Avasthi","raw_affiliation_strings":["Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067, India","institution_ids":["https://openalex.org/I4210089002"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5047365612","display_name":"Avinash Chandra Pandey","orcid":"https://orcid.org/0000-0003-0700-3856","observed_orcids":["https://orcid.org/0000-0003-0700-3856"]},"institutions":[{"id":"https://openalex.org/I168893459","display_name":"University of Allahabad","ror":"https://ror.org/03vrx7m55","country_code":"IN","type":"education","lineage":["https://openalex.org/I168893459"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Avinash C. Pandey","raw_affiliation_strings":["Nanotechnology Application Centre, University of Allahabad, Allahabad 211002, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nanotechnology Application Centre, University of Allahabad, Allahabad 211002, India","institution_ids":["https://openalex.org/I168893459"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5034832852"],"corresponding_institution_ids":["https://openalex.org/I168893459"],"apc_list":{"value":2870,"currency":"USD","value_usd":2870},"apc_paid":null,"fwci":0.8579,"has_fulltext":false,"cited_by_count":16,"citation_normalized_percentile":{"value":0.69569018,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":97},"biblio":{"volume":"143","issue":null,"first_page":"309","last_page":"311"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.9961000084877014,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.9961000084877014,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12506","display_name":"Nuclear materials and radiation effects","score":0.000699999975040555,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.0005000000237487257,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/swift-heavy-ions","display_name":"swift heavy ions","score":0.8510000109672546},{"id":"https://openalex.org/keywords/dynamic-scaling","display_name":"dynamic scaling","score":0.7210000157356262},{"id":"https://openalex.org/keywords/growth-exponent","display_name":"growth exponent","score":0.7440000176429749},{"id":"https://openalex.org/keywords/cracking","display_name":"crack formation","score":0.699999988079071},{"id":"https://openalex.org/keywords/ion-fluence-dependence","display_name":"ion fluence dependence","score":0.9549999833106995},{"id":"https://openalex.org/keywords/tensile-stress","display_name":"tensile stress","score":0.8040000200271606},{"id":"https://openalex.org/keywords/gold-ion-irradiation","display_name":"gold ion irradiation","score":0.6710000038146973},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.7059999704360962}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8648356199264526},{"id":"https://openalex.org/C22078206","wikidata":"https://www.wikidata.org/wiki/Q1418023","display_name":"Fluence","level":3,"score":0.8265949487686157},{"id":"https://openalex.org/C2780981118","wikidata":"https://www.wikidata.org/wiki/Q7656092","display_name":"Swift heavy ion","level":4,"score":0.7976870536804199},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.7220034003257751},{"id":"https://openalex.org/C112950240","wikidata":"https://www.wikidata.org/wiki/Q76005","display_name":"Ultimate tensile strength","level":2,"score":0.5740242600440979},{"id":"https://openalex.org/C111337013","wikidata":"https://www.wikidata.org/wiki/Q2737837","display_name":"Irradiation","level":2,"score":0.5559713840484619},{"id":"https://openalex.org/C99844830","wikidata":"https://www.wikidata.org/wiki/Q102441924","display_name":"Scaling","level":2,"score":0.5445116758346558},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.49981069564819336},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.4528917670249939},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.44162291288375854},{"id":"https://openalex.org/C204323151","wikidata":"https://www.wikidata.org/wiki/Q905424","display_name":"Range (aeronautics)","level":2,"score":0.43071433901786804},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.34404343366622925},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1691029667854309},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.06705963611602783},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.05289521813392639},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.matlet.2014.12.131","doi":"https://doi.org/10.1016/j.matlet.2014.12.131","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.matlet.2014.12.131","pdf_url":null,"source":{"id":"https://openalex.org/S55626769","display_name":"Materials Letters","issn_l":"0167-577X","issn":["0167-577X","1873-4979"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Letters","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320719","display_name":"Department of Science and Technology, Ministry of Science and Technology, India","ror":"https://ror.org/0101xrq71"},{"id":"https://openalex.org/F4320336062","display_name":"Inter-University Accelerator Centre","ror":"https://ror.org/0066qbn28"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1626099979","https://openalex.org/W1993548322","https://openalex.org/W1996543548","https://openalex.org/W2015276402","https://openalex.org/W2025942818","https://openalex.org/W2032270253","https://openalex.org/W2039076733","https://openalex.org/W2056587855","https://openalex.org/W2063496224","https://openalex.org/W2078448943","https://openalex.org/W2087496472","https://openalex.org/W2090700038","https://openalex.org/W2126199460"],"related_works":["https://openalex.org/W4308272143","https://openalex.org/W4323352012","https://openalex.org/W1664869331","https://openalex.org/W2026329569","https://openalex.org/W2015475856","https://openalex.org/W2050650577","https://openalex.org/W2939583210","https://openalex.org/W2081964800","https://openalex.org/W2072569195","https://openalex.org/W3023597517"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":3},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}