{"id":"https://openalex.org/W2081908127","doi":"https://doi.org/10.1117/12.478191","title":"Electrical breakdown and ESD phenomena for devices with nanometer-to-micron gaps","display_name":"Electrical breakdown and ESD phenomena for devices with nanometer-to-micron gaps","publication_year":2003,"publication_date":"2003-01-25","ids":{"openalex":"https://openalex.org/W2081908127","doi":"https://doi.org/10.1117/12.478191","mag":"2081908127"},"language":"en","primary_location":{"id":"doi:10.1117/12.478191","doi":"https://doi.org/10.1117/12.478191","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.478191","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5112529323","display_name":"Albert J. Wallash","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Albert J. Wallash","raw_affiliation_strings":["Maxtor Corp. (United States)","Maxtor Corporation (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Maxtor Corp. (United States)","institution_ids":[]},{"raw_affiliation_string":"Maxtor Corporation (United States)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5108712164","display_name":"Larry Levit","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Larry Levit","raw_affiliation_strings":["Ion Systems (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ion Systems (United States)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":8.2147,"has_fulltext":false,"cited_by_count":147,"citation_normalized_percentile":{"value":0.98255905,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":94,"max":99},"biblio":{"volume":"4980","issue":null,"first_page":"87","last_page":"87"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":0.9839000105857849,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","score":0.9839000105857849,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10511","display_name":"High voltage insulation and dielectric phenomena","score":0.0031999999191612005,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.00139999995008111,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electrical-breakdown","display_name":"electrical breakdown","score":0.9929999709129333},{"id":"https://openalex.org/keywords/electrostatic-discharge","display_name":"electrostatic discharge","score":0.9940000176429749},{"id":"https://openalex.org/keywords/paschen-curve","display_name":"Paschen curve","score":0.9390000104904175},{"id":"https://openalex.org/keywords/field-emission","display_name":"field emission","score":0.996999979019165},{"id":"https://openalex.org/keywords/breakdown-voltage","display_name":"breakdown voltage","score":0.8669999837875366},{"id":"https://openalex.org/keywords/diamond-like-carbon-films","display_name":"diamond-like carbon films","score":0.8949999809265137},{"id":"https://openalex.org/keywords/triboelectric-charging","display_name":"triboelectric charging","score":0.9419999718666077},{"id":"https://openalex.org/keywords/electrostatic-induction","display_name":"electrostatic induction","score":0.9990000128746033},{"id":"https://openalex.org/keywords/magnetic-recording-heads","display_name":"magnetic recording heads","score":0.9700000286102295},{"id":"https://openalex.org/keywords/mems","display_name":"MEMS","score":0.9890000224113464},{"id":"https://openalex.org/keywords/field-emission-displays","display_name":"field emission displays","score":0.9940000176429749}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7999866008758545},{"id":"https://openalex.org/C119321828","wikidata":"https://www.wikidata.org/wiki/Q1267190","display_name":"Breakdown voltage","level":3,"score":0.7026525735855103},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6344760656356812},{"id":"https://openalex.org/C205483674","wikidata":"https://www.wikidata.org/wiki/Q3574961","display_name":"Electrostatic discharge","level":3,"score":0.6046139001846313},{"id":"https://openalex.org/C212702","wikidata":"https://www.wikidata.org/wiki/Q178150","display_name":"Insulator (electricity)","level":2,"score":0.595245361328125},{"id":"https://openalex.org/C191695590","wikidata":"https://www.wikidata.org/wiki/Q422584","display_name":"Electrical breakdown","level":3,"score":0.5659117102622986},{"id":"https://openalex.org/C50587689","wikidata":"https://www.wikidata.org/wiki/Q4698328","display_name":"Air gap (plumbing)","level":2,"score":0.5564553737640381},{"id":"https://openalex.org/C202374169","wikidata":"https://www.wikidata.org/wiki/Q124291","display_name":"Electrical conductor","level":2,"score":0.4770999550819397},{"id":"https://openalex.org/C60799052","wikidata":"https://www.wikidata.org/wiki/Q46221","display_name":"Electric field","level":2,"score":0.4692535102367401},{"id":"https://openalex.org/C121029787","wikidata":"https://www.wikidata.org/wiki/Q902877","display_name":"Field electron emission","level":3,"score":0.46048790216445923},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.40832608938217163},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2605472505092621},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.14947035908699036},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.1335197389125824},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.478191","doi":"https://doi.org/10.1117/12.478191","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.478191","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2035088635","https://openalex.org/W2067463597","https://openalex.org/W2089271716"],"related_works":["https://openalex.org/W2019595865","https://openalex.org/W2154011597","https://openalex.org/W2011524720","https://openalex.org/W2125128176","https://openalex.org/W2894539318","https://openalex.org/W3134255932","https://openalex.org/W2350445160","https://openalex.org/W2460565857","https://openalex.org/W1969689306","https://openalex.org/W2048899305"],"abstract_inverted_index":{"The":[0,19,30,74],"current":[1],"vs.":[2,54],"voltage":[3,55,76,124],"and":[4,12,60,98,129,139,157,189,200],"electrical":[5,184],"breakdown":[6,44,75,96,123,135,151,185],"behavior":[7,45,101],"for":[8,46,77,163],"devices":[9,47,165,173,192],"with":[10,48,63,110,115,166,174],"micron":[11],"sub-micron":[13,49,167,175],"gaps":[14,62,64,109,176],"between":[15],"conductors":[16],"is":[17,51,137,152,170],"studied.":[18],"limitations":[20],"of":[21,81,118,125,146],"the":[22,92,105,134,141,147],"well-known":[23],"but":[24],"often-misinterpreted":[25],"Paschen":[26,33,93],"curve":[27,94],"are":[28,72,161],"discussed.":[29],"little-known":[31],"modified":[32],"curve,":[34],"that":[35,133,172],"includes":[36],"field":[37,99,201],"emission":[38,100,202],"effects":[39],"so":[40],"important":[41],"in":[42],"understanding":[43],"gaps,":[50],"described.":[52],"Current":[53],"measurements":[56],"across":[57],"metal-air-metal,":[58],"metal-insulator-metal":[59],"metal-insulator-air-insulator-metal":[61],"ranging":[65],"from":[66],"4":[67,70,119],"nm":[68,120],"to":[69,86,183],"\u03bcm":[71,83],"reported.":[73],"an":[78],"air":[79],"gap":[80],"0.9":[82],"was":[84,102],"found":[85],"be":[87],"150":[88],"V,":[89],"far":[90],"below":[91],"minimum":[95],"limit,":[97],"confirmed":[103],"via":[104],"Fowler-Nordheim":[106],"plot.":[107],"Metal-insulator-metal":[108],"a":[111,116,122,179],"diamond-like":[112],"carbon":[113,142],"thin-film":[114],"thickness":[117],"had":[121],"only":[126],"1V.":[127],"SEM":[128],"AFM":[130],"analysis":[131],"show":[132],"damage":[136,148],"crater-like":[138],"through":[140],"layer.":[143],"Other":[144],"characterization":[145],"caused":[149],"by":[150],"presented.":[153],"Tribocharging,":[154],"electrostatic":[155],"induction,":[156],"other":[158],"ESD-related":[159],"phenomena,":[160],"discussed":[162],"several":[164],"gaps.":[168],"It":[169],"concluded":[171],"can":[177],"face":[178],"serious":[180],"challenge":[181],"due":[182],"during":[186],"manufacturing,":[187],"handling":[188],"operation.":[190],"These":[191],"include":[193],"photolithographic":[194],"reticles,":[195],"magnetic":[196],"recording":[197],"heads,":[198],"MEMS":[199],"displays.":[203]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":6},{"year":2022,"cited_by_count":3},{"year":2021,"cited_by_count":3},{"year":2020,"cited_by_count":5},{"year":2019,"cited_by_count":8},{"year":2018,"cited_by_count":8},{"year":2017,"cited_by_count":6},{"year":2016,"cited_by_count":6},{"year":2015,"cited_by_count":5},{"year":2014,"cited_by_count":5},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":7}],"updated_date":"2026-10-15T10:00:46.086208","created_date":"2025-10-10T00:00:00"}