{"id":"https://openalex.org/W2080172237","doi":"https://doi.org/10.1063/1.340980","title":"The fabrication of TiN films by reactive evaporation and rapid thermal annealing","display_name":"The fabrication of TiN films by reactive evaporation and rapid thermal annealing","publication_year":1988,"publication_date":"1988-04-15","ids":{"openalex":"https://openalex.org/W2080172237","doi":"https://doi.org/10.1063/1.340980","mag":"2080172237"},"language":"en","primary_location":{"id":"doi:10.1063/1.340980","doi":"https://doi.org/10.1063/1.340980","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.340980","pdf_url":null,"source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5070739839","display_name":"Morris Repeta","orcid":"https://orcid.org/0009-0005-3067-2320","observed_orcids":["https://orcid.org/0009-0005-3067-2320"]},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"M. Repeta","raw_affiliation_strings":["Groupe des Couches Minces, D\u00e9partement de G\u00e9nie Physique, Ecole Polytechnique de Montreal, C. P. 6079, Succ. \u2018\u2018A\u2019\u2019 Montr\u00e9al, Canada H3C 3A7"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Groupe des Couches Minces, D\u00e9partement de G\u00e9nie Physique, Ecole Polytechnique de Montreal, C. P. 6079, Succ. \u2018\u2018A\u2019\u2019 Montr\u00e9al, Canada H3C 3A7","institution_ids":["https://openalex.org/I45683168"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003054484","display_name":"Lisa Dignard-Bailey","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"L. Dignard-Bailey","raw_affiliation_strings":["Groupe des Couches Minces, D\u00e9partement de G\u00e9nie Physique, Ecole Polytechnique de Montreal, C. P. 6079, Succ. \u2018\u2018A\u2019\u2019 Montr\u00e9al, Canada H3C 3A7"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Groupe des Couches Minces, D\u00e9partement de G\u00e9nie Physique, Ecole Polytechnique de Montreal, C. P. 6079, Succ. \u2018\u2018A\u2019\u2019 Montr\u00e9al, Canada H3C 3A7","institution_ids":["https://openalex.org/I45683168"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051346270","display_name":"J. F. Currie","orcid":"https://orcid.org/0000-0001-8014-9128","observed_orcids":["https://orcid.org/0000-0001-8014-9128"]},"institutions":[{"id":"https://openalex.org/I45683168","display_name":"Polytechnique Montr\u00e9al","ror":"https://ror.org/05f8d4e86","country_code":"CA","type":"education","lineage":["https://openalex.org/I45683168"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"J. F. Currie","raw_affiliation_strings":["Groupe des Couches Minces, D\u00e9partement de G\u00e9nie Physique, Ecole Polytechnique de Montreal, C. P. 6079, Succ. \u2018\u2018A\u2019\u2019 Montr\u00e9al, Canada H3C 3A7"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Groupe des Couches Minces, D\u00e9partement de G\u00e9nie Physique, Ecole Polytechnique de Montreal, C. P. 6079, Succ. \u2018\u2018A\u2019\u2019 Montr\u00e9al, Canada H3C 3A7","institution_ids":["https://openalex.org/I45683168"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060618105","display_name":"John L. Brebner","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I70931966","display_name":"Universit\u00e9 de Montr\u00e9al","ror":"https://ror.org/0161xgx34","country_code":"CA","type":"education","lineage":["https://openalex.org/I70931966"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"J. L. Brebner","raw_affiliation_strings":["Groupe des Couches Minces, D\u00e9partement de Physique, Universit\u00e9 de Montr\u00e9al, C. P. 6128, Succ. A, Montr\u00e9al, Canada H3R 2B6"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Groupe des Couches Minces, D\u00e9partement de Physique, Universit\u00e9 de Montr\u00e9al, C. P. 6128, Succ. A, Montr\u00e9al, Canada H3R 2B6","institution_ids":["https://openalex.org/I70931966"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112786512","display_name":"Kumaraswamy Barla","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"K. Barla","raw_affiliation_strings":["CNET, Centre Norbert Segard, B. P. 98, 38243 Meylan, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CNET, Centre Norbert Segard, B. P. 98, 38243 Meylan, France","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3500,"currency":"USD","value_usd":3500},"apc_paid":null,"fwci":0.5175,"has_fulltext":false,"cited_by_count":18,"citation_normalized_percentile":{"value":0.62031232,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":"63","issue":"8","first_page":"2796","last_page":"2799"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.7529000043869019,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.7529000043869019,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.14470000565052032,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.0608999989926815,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/titanium-nitride-thin-films","display_name":"titanium nitride thin films","score":0.8529999852180481},{"id":"https://openalex.org/keywords/reactive-evaporation","display_name":"reactive evaporation","score":0.9409999847412109},{"id":"https://openalex.org/keywords/rapid-thermal-annealing","display_name":"rapid thermal annealing","score":0.9990000128746033},{"id":"https://openalex.org/keywords/gaas-substrate","display_name":"GaAs substrate","score":0.7289999723434448},{"id":"https://openalex.org/keywords/low-temperature-deposition","display_name":"low-temperature deposition","score":0.640999972820282},{"id":"https://openalex.org/keywords/oxygen-concentration","display_name":"oxygen concentration","score":0.6290000081062317},{"id":"https://openalex.org/keywords/sheet-resistance","display_name":"sheet resistance","score":0.8360000252723694},{"id":"https://openalex.org/keywords/thermal-degradation","display_name":"thermal degradation","score":0.6830000281333923},{"id":"https://openalex.org/keywords/quartz-halogen-lamps","display_name":"quartz halogen lamps","score":0.7799999713897705},{"id":"https://openalex.org/keywords/forming-gas-annealing","display_name":"forming gas annealing","score":0.9049999713897705}],"concepts":[{"id":"https://openalex.org/C525849907","wikidata":"https://www.wikidata.org/wiki/Q1096","display_name":"Tin","level":2,"score":0.9178464412689209},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.7938479781150818},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7798714637756348},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7241076827049255},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6698313355445862},{"id":"https://openalex.org/C61441594","wikidata":"https://www.wikidata.org/wiki/Q132814","display_name":"Evaporation","level":2,"score":0.45228007435798645},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.43494850397109985},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4142211377620697},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.4139990210533142},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3490309715270996},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2351107895374298},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.16786348819732666},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.05407017469406128},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1063/1.340980","doi":"https://doi.org/10.1063/1.340980","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.340980","pdf_url":null,"source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"},{"id":"pmh:oai:publications.polymtl.ca:70720","doi":null,"is_oa":false,"landing_page_url":"https://publications.polymtl.ca/70720/","pdf_url":null,"source":{"id":"https://openalex.org/S4306401013","display_name":"PolyPublie (\u00c9cole Polytechnique de Montr\u00e9al)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I45683168","host_organization_name":"Polytechnique Montr\u00e9al","host_organization_lineage":["https://openalex.org/I45683168"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Repeta, M., Dignard-Bailey, L., Currie, J. F., Brebner, J. L., & Barla, K. (1988). The fabrication of TiN films by reactive evaporation and rapid thermal annealing. Journal of Applied Physics, 63(8), 2796-2799.","raw_type":"http://purl.org/coar/resource_type/c_6501"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":11,"referenced_works":["https://openalex.org/W631417582","https://openalex.org/W656923709","https://openalex.org/W1986006707","https://openalex.org/W2002651922","https://openalex.org/W2009461728","https://openalex.org/W2022184333","https://openalex.org/W2024030291","https://openalex.org/W2029058106","https://openalex.org/W2077505244","https://openalex.org/W2089140538","https://openalex.org/W2158035414"],"related_works":["https://openalex.org/W1972310071","https://openalex.org/W2335446429","https://openalex.org/W2328866446","https://openalex.org/W2317385784","https://openalex.org/W2090313736","https://openalex.org/W2078020146","https://openalex.org/W7163587573","https://openalex.org/W2803570285","https://openalex.org/W1967910593","https://openalex.org/W2009010594"],"abstract_inverted_index":{"A":[0],"process":[1,16,101],"for":[2,41,81],"the":[3,18,52,60,64,68,72],"fabrication":[4],"of":[5,21,43,63,71,91],"TiN":[6,22,65,77,88],"films":[7,23],"compatible":[8],"with":[9,24,37,99],"GaAs":[10,74],"processing":[11],"has":[12],"been":[13],"developed.":[14],"The":[15,95],"involves":[17],"reactive":[19],"evaporation":[20],"a":[25,32],"substrate":[26],"temperature":[27],"below":[28],"100":[29],"\u00b0C,":[30],"and":[31,67],"subsequent":[33],"rapid":[34],"thermal":[35,69],"anneal":[36],"quartz":[38],"halogen":[39],"lamps":[40],"periods":[42],"10\u201330":[44],"s":[45,83],"at":[46,78,106],"300\u20131100":[47],"\u00b0C.":[48,108],"This":[49],"method":[50],"minimizes":[51,58],"oxygen":[53],"content":[54],"(4%\u20138%),":[55],"and,":[56],"therefore,":[57],"both":[59],"electrical":[61],"resistivity":[62,90,97],"films,":[66],"degradation":[70],"underlying":[73],"substrate.":[75],"Annealing":[76],"600":[79],"\u00b0C":[80],"10":[82],"in":[84],"forming":[85],"gas":[86],"yields":[87],"sheet":[89],"190":[92],"\u03bc\u03a9":[93,104],"cm.":[94],"lowest":[96],"obtained":[98],"this":[100],"is":[102],"40":[103],"cm":[105],"1100":[107]},"counts_by_year":[{"year":2024,"cited_by_count":2},{"year":2020,"cited_by_count":1},{"year":2017,"cited_by_count":1}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}