{"id":"https://openalex.org/W2079680751","doi":"https://doi.org/10.1117/12.360214","title":"Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems","display_name":"Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems","publication_year":1999,"publication_date":"1999-08-25","ids":{"openalex":"https://openalex.org/W2079680751","doi":"https://doi.org/10.1117/12.360214","mag":"2079680751"},"language":"en","primary_location":{"id":"doi:10.1117/12.360214","doi":"https://doi.org/10.1117/12.360214","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.360214","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101404638","display_name":"Yong\u2010Hoon Kim","orcid":"https://orcid.org/0000-0003-0057-1893","observed_orcids":["https://orcid.org/0000-0003-0057-1893"]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Yong-Hoon Kim","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070221801","display_name":"JoHyun Park","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"JoHyun Park","raw_affiliation_strings":["Samsung Electronics (South Korea)","Samsung Electronics Co., Ltd. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics (South Korea)","institution_ids":["https://openalex.org/I4405259277"]},{"raw_affiliation_string":"Samsung Electronics Co., Ltd. (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100734350","display_name":"Jin\u2010hong Park","orcid":"https://orcid.org/0000-0002-1088-0174","observed_orcids":["https://orcid.org/0000-0002-1088-0174"]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jin-Hong Park","raw_affiliation_strings":["Samsung Electronics (South Korea)","Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics (South Korea)","institution_ids":["https://openalex.org/I4405259277"]},{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109940599","display_name":"Kyung H. Lee","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kyung H. Lee","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111527003","display_name":"Seong-Woon Choi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seong-Woon Choi","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103068967","display_name":"Hee-Sun Yoon","orcid":"https://orcid.org/0000-0001-5662-8997","observed_orcids":["https://orcid.org/0000-0001-5662-8997"]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hee-Sun Yoon","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110047673","display_name":"Jung-Min Sohn","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jung-Min Sohn","raw_affiliation_strings":["Samsung Electronics, Co. LTD (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electronics, Co. LTD (South Korea)","institution_ids":["https://openalex.org/I4405259277"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4405259277"],"apc_list":null,"apc_paid":null,"fwci":0.985,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.66412753,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"3748","issue":null,"first_page":"332","last_page":"332"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/attenuated-phase-shifting-mask","display_name":"attenuated phase shift mask","score":0.9959999918937683},{"id":"https://openalex.org/keywords/resolution-enhancement-techniques","display_name":"resolution enhancement techniques","score":0.8399999737739563},{"id":"https://openalex.org/keywords/krf-lithography","display_name":"KrF lithography","score":0.9200000166893005},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.7739999890327454}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.8700928092002869},{"id":"https://openalex.org/C150493377","wikidata":"https://www.wikidata.org/wiki/Q1427863","display_name":"Transmittance","level":2,"score":0.7825850248336792},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7080339789390564},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.5509695410728455},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5420961380004883},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.512194812297821},{"id":"https://openalex.org/C138268822","wikidata":"https://www.wikidata.org/wiki/Q1051925","display_name":"Resolution (logic)","level":2,"score":0.5116022229194641},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.4950694143772125},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.4744202494621277},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.41764628887176514},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.4156419634819031},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.38461053371429443},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.27385973930358887},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.22457635402679443},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1084805428981781},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.360214","doi":"https://doi.org/10.1117/12.360214","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.360214","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1977654860","https://openalex.org/W4233929157","https://openalex.org/W2016977677","https://openalex.org/W1977025457","https://openalex.org/W2070199195","https://openalex.org/W2080066171","https://openalex.org/W2053910750","https://openalex.org/W1984596591","https://openalex.org/W2094493936","https://openalex.org/W2020397093"],"abstract_inverted_index":{"Phase":[0],"shift":[1],"mask":[2],"(PSM)":[3],"with":[4,36,90,116,136],"optical":[5],"proximity":[6],"effect":[7],"correction":[8],"(OPC)":[9],"is":[10,22],"the":[11,15,26,33,53,56,61,64,67,84,91,94,97,100,103,117,127,131,137,144],"efficient":[12],"tool":[13],"of":[14,48,55,63,76,99,113,133],"resolution":[16,73,112,132],"enhancement":[17],"technology":[18],"(RET).":[19],"Particularly,":[20],"it":[21],"commonly":[23],"known":[24],"that":[25],"attenuated":[27],"PSM(att.PSM)":[28],"has":[29],"some":[30],"merits":[31],"in":[32],"memory":[34],"device":[35],"a":[37,45],"repeated":[38],"cell":[39],"patterns.":[40],"But":[41],"there":[42],"are":[43],"only":[44],"few":[46],"results":[47],"what":[49],"illumination":[50,86],"systems":[51,87],"affect":[52],"performance":[54,69,105],"attPSM":[57,65,101],"and":[58,74,93,102,109],"how":[59],"much":[60],"transmittance":[62,98],"affects":[66],"lithography":[68,104,115,135],"--":[70],"such":[71],"as":[72],"depth":[75],"focus.":[77],"In":[78],"this":[79],"paper,":[80],"we":[81],"will":[82],"present":[83],"optimized":[85],"for":[88],"patterning":[89],"attPSM,":[92],"relationship":[95],"between":[96],"by":[106],"using":[107],"simulations":[108],"experiments.":[110],"The":[111],"KrF":[114,134],"Hi-T":[118,138],"att.PSM":[119,139],"can":[120],"be":[121],"extended":[122],"to":[123,140],"130":[124],"nm":[125,142],"through":[126,143],"simulation.":[128],"We":[129],"extend":[130],"150":[141],"experiment.":[145]},"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}