{"id":"https://openalex.org/W2076162011","doi":"https://doi.org/10.1117/12.2060954","title":"Shaping intensity behind amplitude masks for proximity correction lithography: design, measurement, and realization","display_name":"Shaping intensity behind amplitude masks for proximity correction lithography: design, measurement, and realization","publication_year":2014,"publication_date":"2014-08-18","ids":{"openalex":"https://openalex.org/W2076162011","doi":"https://doi.org/10.1117/12.2060954","mag":"2076162011"},"language":"en","primary_location":{"id":"doi:10.1117/12.2060954","doi":"https://doi.org/10.1117/12.2060954","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2060954","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"http://infoscience.epfl.ch/record/208728","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5007561365","display_name":"Krishnaparvathy Puthankovilakam","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Krishnaparvathy Puthankovilakam","raw_affiliation_strings":["Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","Ecole Polytechnique Federale de Lausanne  (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","institution_ids":["https://openalex.org/I5124864"]},{"raw_affiliation_string":"Ecole Polytechnique Federale de Lausanne  (Switzerland)","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5040673211","display_name":"Toralf Scharf","orcid":"https://orcid.org/0000-0003-1050-327X","observed_orcids":["https://orcid.org/0000-0003-1050-327X"]},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Toralf Scharf","raw_affiliation_strings":["Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","Ecole Polytechnique Federale de Lausanne  (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","institution_ids":["https://openalex.org/I5124864"]},{"raw_affiliation_string":"Ecole Polytechnique Federale de Lausanne  (Switzerland)","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Qing Tan","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Qing Tan","raw_affiliation_strings":["Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","Ecole Polytechnique Federale de Lausanne  (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","institution_ids":["https://openalex.org/I5124864"]},{"raw_affiliation_string":"Ecole Polytechnique Federale de Lausanne  (Switzerland)","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111522032","display_name":"Hans Peter Herzig","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Hans Peter Herzig","raw_affiliation_strings":["Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","Ecole Polytechnique Federale de Lausanne  (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","institution_ids":["https://openalex.org/I5124864"]},{"raw_affiliation_string":"Ecole Polytechnique Federale de Lausanne  (Switzerland)","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069017186","display_name":"David Nguyen","orcid":"https://orcid.org/0000-0002-3067-2241","observed_orcids":["https://orcid.org/0000-0002-3067-2241"]},"institutions":[{"id":"https://openalex.org/I5124864","display_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","ror":"https://ror.org/02s376052","country_code":"CH","type":"education","lineage":["https://openalex.org/I2799323385","https://openalex.org/I5124864"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"David Nguyen","raw_affiliation_strings":["Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","Ecole Polytechnique Federale de Lausanne  (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne (Switzerland)","institution_ids":["https://openalex.org/I5124864"]},{"raw_affiliation_string":"Ecole Polytechnique Federale de Lausanne  (Switzerland)","institution_ids":["https://openalex.org/I5124864"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050032922","display_name":"Uwe Vogler","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114065","display_name":"Suss Microoptics (Switzerland)","ror":"https://ror.org/0275t9a95","country_code":"CH","type":"company","lineage":["https://openalex.org/I4210114065"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Uwe Vogler","raw_affiliation_strings":["SUSS MicroOptics SA (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SUSS MicroOptics SA (Switzerland)","institution_ids":["https://openalex.org/I4210114065"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058108406","display_name":"Arianna Bramati","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114065","display_name":"Suss Microoptics (Switzerland)","ror":"https://ror.org/0275t9a95","country_code":"CH","type":"company","lineage":["https://openalex.org/I4210114065"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Arianna Bramati","raw_affiliation_strings":["SUSS MicroOptics SA (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SUSS MicroOptics SA (Switzerland)","institution_ids":["https://openalex.org/I4210114065"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5046008432","display_name":"Reinhard Voelkel","orcid":"https://orcid.org/0000-0003-1397-6988","observed_orcids":["https://orcid.org/0000-0003-1397-6988"]},"institutions":[{"id":"https://openalex.org/I4210114065","display_name":"Suss Microoptics (Switzerland)","ror":"https://ror.org/0275t9a95","country_code":"CH","type":"company","lineage":["https://openalex.org/I4210114065"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Reinhard Voelkel","raw_affiliation_strings":["SUSS MicroOptics SA (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SUSS MicroOptics SA (Switzerland)","institution_ids":["https://openalex.org/I4210114065"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":2.4087,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.89435497,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"9203","issue":null,"first_page":"92031B","last_page":"92031B"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/amplitude-mask","display_name":"amplitude mask","score":0.9390000104904175},{"id":"https://openalex.org/keywords/light-intensity-distribution","display_name":"light intensity distribution","score":0.6190000176429749},{"id":"https://openalex.org/keywords/edge-slope","display_name":"edge slope","score":0.6050000190734863},{"id":"https://openalex.org/keywords/mask-aligner","display_name":"mask aligner","score":0.7480000257492065},{"id":"https://openalex.org/keywords/simulation-versus-measurement","display_name":"simulation-measurement comparison","score":0.5410000085830688}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7773804068565369},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.7692842483520508},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6068968772888184},{"id":"https://openalex.org/C2777953097","wikidata":"https://www.wikidata.org/wiki/Q7252868","display_name":"Proximity effect (electron beam lithography)","level":5,"score":0.5963197350502014},{"id":"https://openalex.org/C162307627","wikidata":"https://www.wikidata.org/wiki/Q204833","display_name":"Enhanced Data Rates for GSM Evolution","level":2,"score":0.5686129927635193},{"id":"https://openalex.org/C93038891","wikidata":"https://www.wikidata.org/wiki/Q1061524","display_name":"Intensity (physics)","level":2,"score":0.5533645749092102},{"id":"https://openalex.org/C57493831","wikidata":"https://www.wikidata.org/wiki/Q3134666","display_name":"Projection (relational algebra)","level":2,"score":0.5368320345878601},{"id":"https://openalex.org/C2781089630","wikidata":"https://www.wikidata.org/wiki/Q21856745","display_name":"Realization (probability)","level":2,"score":0.5141330361366272},{"id":"https://openalex.org/C32022120","wikidata":"https://www.wikidata.org/wiki/Q797225","display_name":"Interference (communication)","level":3,"score":0.5074092745780945},{"id":"https://openalex.org/C180205008","wikidata":"https://www.wikidata.org/wiki/Q159190","display_name":"Amplitude","level":2,"score":0.47397464513778687},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.45455989241600037},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4316377639770508},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.28403016924858093},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.27441877126693726},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2575569748878479},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.25438377261161804},{"id":"https://openalex.org/C127162648","wikidata":"https://www.wikidata.org/wiki/Q16858953","display_name":"Channel (broadcasting)","level":2,"score":0.21984413266181946},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.17941904067993164},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.11915183067321777},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.10446241497993469},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0868181586265564},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1117/12.2060954","doi":"https://doi.org/10.1117/12.2060954","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2060954","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},{"id":"pmh:oai:infoscience.epfl.ch:208728","doi":null,"is_oa":true,"landing_page_url":"http://infoscience.epfl.ch/record/208728","pdf_url":null,"source":{"id":"https://openalex.org/S4306400487","display_name":"Infoscience (Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne)","issn_l":null,"issn":null,"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I5124864","host_organization_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","host_organization_lineage":["https://openalex.org/I5124864"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Text"},{"id":"pmh:oai:infoscience.tind.io:208728","doi":null,"is_oa":true,"landing_page_url":"http://infoscience.epfl.ch/record/208728","pdf_url":null,"source":{"id":"https://openalex.org/S4306400487","display_name":"Infoscience (Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne)","issn_l":null,"issn":null,"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I5124864","host_organization_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","host_organization_lineage":["https://openalex.org/I5124864"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-nc-nd","license_id":"https://openalex.org/licenses/cc-by-nc-nd","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference proceedings"}],"best_oa_location":{"id":"pmh:oai:infoscience.epfl.ch:208728","doi":null,"is_oa":true,"landing_page_url":"http://infoscience.epfl.ch/record/208728","pdf_url":null,"source":{"id":"https://openalex.org/S4306400487","display_name":"Infoscience (Ecole Polytechnique F\u00e9d\u00e9rale de Lausanne)","issn_l":null,"issn":null,"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I5124864","host_organization_name":"\u00c9cole Polytechnique F\u00e9d\u00e9rale de Lausanne","host_organization_lineage":["https://openalex.org/I5124864"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Text"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W1501261314","https://openalex.org/W1971679740","https://openalex.org/W1985518538","https://openalex.org/W2069785510","https://openalex.org/W2071455626","https://openalex.org/W2501873590","https://openalex.org/W4236340835","https://openalex.org/W4239995782"],"related_works":["https://openalex.org/W1517244022","https://openalex.org/W2594137780","https://openalex.org/W2552650570","https://openalex.org/W4412915702","https://openalex.org/W2981747388","https://openalex.org/W2065276094","https://openalex.org/W1973058214","https://openalex.org/W2043660699","https://openalex.org/W7131373244","https://openalex.org/W2060552955"],"abstract_inverted_index":{"Proximity":[0],"exposure":[1],"techniques":[2,71],"in":[3,60],"lithography":[4],"are":[5,86,94,101,115,151],"getting":[6],"more":[7,9],"and":[8,32,96,98,134,149,153],"popular":[10],"because":[11],"of":[12,15,18,46,62,130,138],"the":[13,33,36,75,99,113],"cost":[14],"ownership":[16],"advantage":[17],"mask":[19,114],"aligners":[20],"compared":[21,102,152],"to":[22,69],"projection":[23],"systems.":[24],"In":[25],"this":[26],"paper":[27],"a":[28,118],"gap":[29],"between":[30],"simulation":[31],"final":[34,66],"result,":[35],"prints":[37,93],"will":[38],"be":[39],"closed.":[40],"We":[41,124],"compare":[42],"high":[43],"resolution":[44,76],"measurements":[45,150],"intensity":[47,106,110],"field":[48],"behind":[49,112],"amplitude":[50],"masks":[51],"with":[52,56,88,103],"proximity":[53,63,146],"correction":[54,81,84],"structures":[55,85],"simulations":[57],"gain":[58],"insight":[59],"limitation":[61],"lithography.":[64],"The":[65,83,108],"goal":[67],"is":[68],"develop":[70],"that":[72],"allow":[73],"enhancing":[74],"by":[77],"using":[78,117],"advanced":[79],"optical":[80],"structures.":[82],"designed":[87],"Layout":[89],"Lab":[90],"(GenISys":[91],"GmbH),":[92],"done":[95],"characterized":[97],"results":[100],"measured":[104],"light":[105,109],"distributions.":[107],"distributions":[111],"recorded":[116],"High":[119],"Resolution":[120],"Interference":[121],"Microscopy":[122],"(HRIM).":[123],"concentrate":[125],"on":[126],"an":[127],"example":[128],"study":[129],"edge":[131,142],"slope":[132,143],"improvement":[133],"we":[135],"explore":[136],"possibilities":[137],"improved":[139],"parameters":[140],"like":[141],"at":[144],"different":[145],"distances.":[147],"Simulations":[148],"discussed.":[154]},"counts_by_year":[{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":1}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}