{"id":"https://openalex.org/W2074972046","doi":"https://doi.org/10.1016/s0167-9317(98)00050-1","title":"Sub-10 nm pattern placement verification of quantum tomography freestanding gratings","display_name":"Sub-10 nm pattern placement verification of quantum tomography freestanding gratings","publication_year":1998,"publication_date":"1998-03-01","ids":{"openalex":"https://openalex.org/W2074972046","doi":"https://doi.org/10.1016/s0167-9317(98)00050-1","mag":"2074972046"},"language":"en","primary_location":{"id":"doi:10.1016/s0167-9317(98)00050-1","doi":"https://doi.org/10.1016/s0167-9317(98)00050-1","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0167-9317(98)00050-1","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5025612392","display_name":"Mark Eurlings","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I83019370","display_name":"Eindhoven University of Technology","ror":"https://ror.org/02c2kyt77","country_code":"NL","type":"education","lineage":["https://openalex.org/I83019370"]}],"countries":["NL"],"is_corresponding":true,"raw_author_name":"M.F.A. Eurlings","raw_affiliation_strings":["Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I83019370"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108637682","display_name":"J.T.M. van Beek","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I83019370","display_name":"Eindhoven University of Technology","ror":"https://ror.org/02c2kyt77","country_code":"NL","type":"education","lineage":["https://openalex.org/I83019370"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"J.T.M. van Beek","raw_affiliation_strings":["Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I83019370"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103556819","display_name":"Martin J. Verheijen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122849","display_name":"Philips (Netherlands)","ror":"https://ror.org/02p2bgp27","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210122849"]},{"id":"https://openalex.org/I4210163196","display_name":"Signify (Netherlands)","ror":"https://ror.org/0532vdr17","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210163196"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"M.J. Verheijen","raw_affiliation_strings":["Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210122849","https://openalex.org/I4210163196"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5091312257","display_name":"J. Weterings","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122849","display_name":"Philips (Netherlands)","ror":"https://ror.org/02p2bgp27","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210122849"]},{"id":"https://openalex.org/I4210163196","display_name":"Signify (Netherlands)","ror":"https://ror.org/0532vdr17","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210163196"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"J.P. Weterings","raw_affiliation_strings":["Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210122849","https://openalex.org/I4210163196"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112526427","display_name":"Herman C. W. Beijerinck","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I83019370","display_name":"Eindhoven University of Technology","ror":"https://ror.org/02c2kyt77","country_code":"NL","type":"education","lineage":["https://openalex.org/I83019370"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"H.C.W. Beijerinck","raw_affiliation_strings":["Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I83019370"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5025612392"],"corresponding_institution_ids":["https://openalex.org/I83019370"],"apc_list":{"value":2860,"currency":"USD","value_usd":2860},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.25255682,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"41-42","issue":null,"first_page":"219","last_page":"222"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9907000064849854,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9907000064849854,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.002400000113993883,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10857","display_name":"Advanced Electron Microscopy Techniques and Applications","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/1315","display_name":"Structural Biology"},"field":{"id":"https://openalex.org/fields/13","display_name":"Biochemistry, Genetics and Molecular Biology"},"domain":{"id":"https://openalex.org/domains/1","display_name":"Life Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"electron beam lithography","score":0.8119999766349792},{"id":"https://openalex.org/keywords/drift-correction","display_name":"drift correction","score":0.39399999380111694},{"id":"https://openalex.org/keywords/charge-accumulation","display_name":"charge accumulation","score":0.4320000112056732},{"id":"https://openalex.org/keywords/silicon-nitride-membranes","display_name":"silicon nitride membranes","score":0.7639999985694885},{"id":"https://openalex.org/keywords/quantum-state-tomography","display_name":"quantum state tomography","score":0.703000009059906}],"concepts":[{"id":"https://openalex.org/C2777813233","wikidata":"https://www.wikidata.org/wiki/Q1527816","display_name":"Grating","level":2,"score":0.7563045024871826},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6583852767944336},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.5921173691749573},{"id":"https://openalex.org/C126753812","wikidata":"https://www.wikidata.org/wiki/Q653294","display_name":"Diffraction grating","level":3,"score":0.544788122177124},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5411050319671631},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.4621809720993042},{"id":"https://openalex.org/C143724316","wikidata":"https://www.wikidata.org/wiki/Q312468","display_name":"Series (stratigraphy)","level":2,"score":0.4165745973587036},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4032900631427765},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2631736993789673},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2430645227432251},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0936984121799469},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0}],"mesh":[],"locations_count":6,"locations":[{"id":"doi:10.1016/s0167-9317(98)00050-1","doi":"https://doi.org/10.1016/s0167-9317(98)00050-1","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0167-9317(98)00050-1","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},{"id":"pmh:oai:pure.tue.nl:openaire_cris_publications/b232a286-d70e-46a9-8eba-2b4a7533f43d","doi":null,"is_oa":false,"landing_page_url":"https://research.tue.nl/en/publications/b232a286-d70e-46a9-8eba-2b4a7533f43d","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Eurlings, M F A, van Beek, J T M, Verheijen, M J, Weterings, J P & Beijerinck, H C W 1998, 'Sub-10 nm pattern placement verification of quantum tomography freestanding gratings', Microelectronic Engineering, vol. 41/42, pp. 219-222. https://doi.org/10.1016/S0167-9317(98)00050-1","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:678555","doi":null,"is_oa":false,"landing_page_url":"http://library.tue.nl/csp/dare/LinkToRepository.csp?recordnumber=678555","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ISSN:0167-9317","raw_type":"Article / Letter to the editor"},{"id":"pmh:oai:library.tue.nl:678555","doi":null,"is_oa":false,"landing_page_url":"http://repository.tue.nl/678555","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ISSN:0167-9317","raw_type":"Article / Letter to the editor"},{"id":"pmh:tue:oai:library.tue.nl:678555","doi":null,"is_oa":false,"landing_page_url":"http://repository.tue.nl/678555","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Microelectronic Engineering, 41/42, 219","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:tue:oai:pure.tue.nl:publications/b232a286-d70e-46a9-8eba-2b4a7533f43d","doi":null,"is_oa":false,"landing_page_url":"https://research.tue.nl/nl/publications/b232a286-d70e-46a9-8eba-2b4a7533f43d","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Microelectronic Engineering, 41/42, 219 - 222. Elsevier","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W28442029","https://openalex.org/W1981058050","https://openalex.org/W1984508165","https://openalex.org/W2004342071","https://openalex.org/W2027599667","https://openalex.org/W2041808430"],"related_works":["https://openalex.org/W2063256262","https://openalex.org/W1984508165","https://openalex.org/W2086154718","https://openalex.org/W2567388739","https://openalex.org/W2618240089","https://openalex.org/W7162546551","https://openalex.org/W2113595173","https://openalex.org/W2028776048","https://openalex.org/W2607338687","https://openalex.org/W1971467070"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}