{"id":"https://openalex.org/W2073776390","doi":"https://doi.org/10.1117/12.154770","title":"Resist materials design: base-catalyzed chemical amplification","display_name":"Resist materials design: base-catalyzed chemical amplification","publication_year":1993,"publication_date":"1993-09-15","ids":{"openalex":"https://openalex.org/W2073776390","doi":"https://doi.org/10.1117/12.154770","mag":"2073776390"},"language":"en","primary_location":{"id":"doi:10.1117/12.154770","doi":"https://doi.org/10.1117/12.154770","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.154770","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5027381116","display_name":"Carlton Grant Willson","orcid":"https://orcid.org/0000-0002-2072-3981","observed_orcids":["https://orcid.org/0000-0002-2072-3981"]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},{"id":"https://openalex.org/I4210085935","display_name":"IBM Research - Almaden","ror":"https://ror.org/005w8dd04","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210085935","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C. Grant Willson","raw_affiliation_strings":["IBM Almaden Research Ctr. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Almaden Research Ctr. (United States)","institution_ids":["https://openalex.org/I1341412227","https://openalex.org/I4210085935"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111690484","display_name":"James F. Cameron","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},{"id":"https://openalex.org/I4210085935","display_name":"IBM Research - Almaden","ror":"https://ror.org/005w8dd04","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210085935","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"James F. Cameron","raw_affiliation_strings":["IBM Almaden Research Ctr. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Almaden Research Ctr. (United States)","institution_ids":["https://openalex.org/I1341412227","https://openalex.org/I4210085935"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108404725","display_name":"Scott A. MacDonald","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},{"id":"https://openalex.org/I4210085935","display_name":"IBM Research - Almaden","ror":"https://ror.org/005w8dd04","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210085935","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Scott A. MacDonald","raw_affiliation_strings":["IBM Almaden Research Ctr. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Almaden Research Ctr. (United States)","institution_ids":["https://openalex.org/I1341412227","https://openalex.org/I4210085935"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028975849","display_name":"C. P. Niesert","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},{"id":"https://openalex.org/I4210085935","display_name":"IBM Research - Almaden","ror":"https://ror.org/005w8dd04","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210085935","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C. P. Niesert","raw_affiliation_strings":["IBM Almaden Research Ctr. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Almaden Research Ctr. (United States)","institution_ids":["https://openalex.org/I1341412227","https://openalex.org/I4210085935"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002152167","display_name":"Jean M. J. Fr\u00e9chet","orcid":"https://orcid.org/0000-0001-6419-0163","observed_orcids":["https://orcid.org/0000-0001-6419-0163"]},"institutions":[{"id":"https://openalex.org/I205783295","display_name":"Cornell University","ror":"https://ror.org/05bnh6r87","country_code":"US","type":"education","lineage":["https://openalex.org/I205783295"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jean M. J. Frechet","raw_affiliation_strings":["Cornell Univ. United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cornell Univ. United States","institution_ids":["https://openalex.org/I205783295"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004555344","display_name":"Man\u2010kit Leung","orcid":"https://orcid.org/0000-0002-3297-9087","observed_orcids":["https://orcid.org/0000-0002-3297-9087"]},"institutions":[{"id":"https://openalex.org/I205783295","display_name":"Cornell University","ror":"https://ror.org/05bnh6r87","country_code":"US","type":"education","lineage":["https://openalex.org/I205783295"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. K. Leung","raw_affiliation_strings":["Cornell Univ. United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cornell Univ. United States","institution_ids":["https://openalex.org/I205783295"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5058793214","display_name":"Aaron J. Ackmann","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I205783295","display_name":"Cornell University","ror":"https://ror.org/05bnh6r87","country_code":"US","type":"education","lineage":["https://openalex.org/I205783295"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Aaron J. Ackman","raw_affiliation_strings":["Cornell Univ. United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cornell Univ. United States","institution_ids":["https://openalex.org/I205783295"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.26863608,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"1925","issue":null,"first_page":"354","last_page":"365"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11708","display_name":"Photochromic and Fluorescence Chemistry","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/chemically-amplified-resists","display_name":"chemically amplified resists","score":0.796999990940094},{"id":"https://openalex.org/keywords/deep-uv-photoresists","display_name":"deep-UV photoresists","score":0.9810000061988831},{"id":"https://openalex.org/keywords/negative-tone-resist","display_name":"negative resist","score":0.6380000114440918},{"id":"https://openalex.org/keywords/silylation","display_name":"silylation","score":0.7300000190734863},{"id":"https://openalex.org/keywords/resist-materials","display_name":"resist materials","score":0.33399999141693115}],"concepts":[{"id":"https://openalex.org/C2780595602","wikidata":"https://www.wikidata.org/wiki/Q898436","display_name":"Decarboxylation","level":3,"score":0.8935351371765137},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.8734790086746216},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.7593574523925781},{"id":"https://openalex.org/C2779074116","wikidata":"https://www.wikidata.org/wiki/Q134856","display_name":"Carboxylic acid","level":2,"score":0.5937569737434387},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.5685384273529053},{"id":"https://openalex.org/C521977710","wikidata":"https://www.wikidata.org/wiki/Q81163","display_name":"Polymer","level":2,"score":0.5524529218673706},{"id":"https://openalex.org/C42058472","wikidata":"https://www.wikidata.org/wiki/Q810214","display_name":"Base (topology)","level":2,"score":0.5201014280319214},{"id":"https://openalex.org/C177801218","wikidata":"https://www.wikidata.org/wiki/Q36534","display_name":"Chemical reaction","level":2,"score":0.4795236885547638},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.38027024269104004},{"id":"https://openalex.org/C188027245","wikidata":"https://www.wikidata.org/wiki/Q750446","display_name":"Polymer chemistry","level":1,"score":0.3575250208377838},{"id":"https://openalex.org/C134306372","wikidata":"https://www.wikidata.org/wiki/Q7754","display_name":"Mathematical analysis","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.154770","doi":"https://doi.org/10.1117/12.154770","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.154770","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":1,"referenced_works":["https://openalex.org/W1579261923"],"related_works":["https://openalex.org/W2314392957","https://openalex.org/W1973616612","https://openalex.org/W295210821","https://openalex.org/W2072578054","https://openalex.org/W2063368127","https://openalex.org/W2026867035","https://openalex.org/W2172253633","https://openalex.org/W2016803582","https://openalex.org/W2148051033","https://openalex.org/W7162009903"],"abstract_inverted_index":{"Many":[0],"chemically":[1,60],"amplified":[2,61],"resists":[3,80],"that":[4,22],"function":[5,23],"on":[6,24,39,57],"the":[7,25,40,71,139,143,167],"basis":[8,26],"of":[9,12,27,42,45,73,88,101,126,138,145,169],"acid":[10,94,112,141],"catalysis":[11,44],"thermolytic":[13],"reactions":[14],"have":[15,34],"been":[16,35],"described":[17],"as":[18,20,68],"well":[19],"systems":[21],"free":[28],"radical":[29],"chain":[30],"reactions.":[31],"But":[32],"there":[33],"very":[36],"few":[37],"reports":[38],"use":[41,144],"base":[43,58,97,121],"chemical":[46,171],"transformations":[47],"in":[48,148],"resist":[49,128],"materials.":[50],"We":[51],"describe":[52],"here":[53],"our":[54],"initial":[55],"results":[56],"catalyzed":[59,122],"deep-UV":[62],"photoresists.":[63],"Photogenerated":[64],"amines":[65],"were":[66,84],"used":[67],"catalysts":[69],"for":[70],"decarboxylation":[72],"carboxylic":[74,93,111,140],"acids.":[75],"Two":[76],"approaches":[77],"to":[78,96],"building":[79],"around":[81],"this":[82,127,146,162],"chemistry":[83],"investigated.":[85],"(1)":[86],"Decarboxylation":[87],"a":[89,102,149],"low":[90],"molecular":[91],"weight":[92],"led":[95],"induced":[98],"dissolution":[99],"inhibition":[100],"phenolic":[103],"polymer":[104,113],"giving":[105],"negative":[106,131],"tone":[107,132,151],"images.":[108,133],"(2)":[109],"A":[110,155],"was":[114],"synthesized":[115],"which":[116],"also":[117],"is":[118],"susceptible":[119],"towards":[120],"decarboxylation.":[123],"Wet":[124],"development":[125],"material":[129,147],"gives":[130],"Site":[134],"specific":[135],"gas-phase":[136],"silylation":[137],"allows":[142],"positive":[150],"dry":[152,163],"develop":[153,164],"process.":[154],"0.5":[156],"micrometers":[157],"line-space":[158],"pattern":[159],"obtained":[160],"by":[161],"process":[165],"illustrates":[166],"potential":[168],"base-catalyzed":[170],"amplification.":[172]},"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}