{"id":"https://openalex.org/W2072445293","doi":"https://doi.org/10.1063/1.2717607","title":"Electrical and optical characterization of SiONC dielectric thin film deposited by polymer-source chemical vapor deposition","display_name":"Electrical and optical characterization of SiONC dielectric thin film deposited by polymer-source chemical vapor deposition","publication_year":2007,"publication_date":"2007-04-15","ids":{"openalex":"https://openalex.org/W2072445293","doi":"https://doi.org/10.1063/1.2717607","mag":"2072445293"},"language":"en","primary_location":{"id":"doi:10.1063/1.2717607","doi":"https://doi.org/10.1063/1.2717607","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.2717607","pdf_url":null,"source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5009972495","display_name":"El Hassane Oulachgar","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135117807","display_name":"Universit\u00e9 de Sherbrooke","ror":"https://ror.org/00kybxq39","country_code":"CA","type":"education","lineage":["https://openalex.org/I135117807"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"El Hassane Oulachgar","raw_affiliation_strings":["Sherbrooke University Nanofabrication and Nanocharacterization Research Center (CRN2), Electrical & Computer Engineering Department, , Sherbrooke, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sherbrooke University Nanofabrication and Nanocharacterization Research Center (CRN2), Electrical & Computer Engineering Department, , Sherbrooke, Canada","institution_ids":["https://openalex.org/I135117807"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020188731","display_name":"Cetin Aktik","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135117807","display_name":"Universit\u00e9 de Sherbrooke","ror":"https://ror.org/00kybxq39","country_code":"CA","type":"education","lineage":["https://openalex.org/I135117807"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Cetin Aktik","raw_affiliation_strings":["Sherbrooke University Nanofabrication and Nanocharacterization Research Center (CRN2), Electrical & Computer Engineering Department, , Sherbrooke, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sherbrooke University Nanofabrication and Nanocharacterization Research Center (CRN2), Electrical & Computer Engineering Department, , Sherbrooke, Canada","institution_ids":["https://openalex.org/I135117807"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5078766436","display_name":"Mihai Scarlete","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I113281461","display_name":"Bishop's University","ror":"https://ror.org/051prj435","country_code":"CA","type":"education","lineage":["https://openalex.org/I113281461"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Mihai Scarlete","raw_affiliation_strings":["Bishop\u2019s University Chemistry Department, , Sherbrooke, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bishop\u2019s University Chemistry Department, , Sherbrooke, Canada","institution_ids":["https://openalex.org/I113281461"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039020794","display_name":"Starr Dostie","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I113281461","display_name":"Bishop's University","ror":"https://ror.org/051prj435","country_code":"CA","type":"education","lineage":["https://openalex.org/I113281461"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Starr Dostie","raw_affiliation_strings":["Bishop\u2019s University Chemistry Department, , Sherbrooke, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bishop\u2019s University Chemistry Department, , Sherbrooke, Canada","institution_ids":["https://openalex.org/I113281461"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026047670","display_name":"Rob Sowerby","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I113281461","display_name":"Bishop's University","ror":"https://ror.org/051prj435","country_code":"CA","type":"education","lineage":["https://openalex.org/I113281461"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Rob Sowerby","raw_affiliation_strings":["Bishop\u2019s University Chemistry Department, , Sherbrooke, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bishop\u2019s University Chemistry Department, , Sherbrooke, Canada","institution_ids":["https://openalex.org/I113281461"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5091873266","display_name":"Subhash C. Gujrathi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I70931966","display_name":"Universit\u00e9 de Montr\u00e9al","ror":"https://ror.org/0161xgx34","country_code":"CA","type":"education","lineage":["https://openalex.org/I70931966"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Subhash Gujrathi","raw_affiliation_strings":["Montreal University, Thin Film Physics and Technology Research Center (GCM), Physics Department, Montreal, Canada","Thin Film Physics and Technology Research Center (GCM), Physics Department, Montreal University, Montreal, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Montreal University, Thin Film Physics and Technology Research Center (GCM), Physics Department, Montreal, Canada","institution_ids":["https://openalex.org/I70931966"]},{"raw_affiliation_string":"Thin Film Physics and Technology Research Center (GCM), Physics Department, Montreal University, Montreal, Canada","institution_ids":["https://openalex.org/I70931966"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3500,"currency":"USD","value_usd":3500},"apc_paid":null,"fwci":0.3054,"has_fulltext":false,"cited_by_count":10,"citation_normalized_percentile":{"value":0.63046363,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":94},"biblio":{"volume":"101","issue":"8","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9746000170707703,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9746000170707703,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.018799999728798866,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.0005000000237487257,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/organosilane-precursors","display_name":"organosilane precursors","score":0.9629999995231628},{"id":"https://openalex.org/keywords/oxygen-concentration","display_name":"oxygen concentration","score":0.7639999985694885},{"id":"https://openalex.org/keywords/high-k-dielectrics","display_name":"high-k dielectrics","score":0.9089999794960022},{"id":"https://openalex.org/keywords/mos-structures","display_name":"MOS structures","score":0.5630000233650208},{"id":"https://openalex.org/keywords/interface-trap-density","display_name":"interface trap density","score":0.9380000233650208},{"id":"https://openalex.org/keywords/dielectric-constant","display_name":"dielectric constant","score":0.8849999904632568},{"id":"https://openalex.org/keywords/refractive-index","display_name":"refractive index","score":0.9990000128746033},{"id":"https://openalex.org/keywords/optical-band-gap","display_name":"optical band gap","score":0.9700000286102295},{"id":"https://openalex.org/keywords/electro-optical-properties","display_name":"electro-optical properties","score":0.6779999732971191}],"concepts":[{"id":"https://openalex.org/C18293161","wikidata":"https://www.wikidata.org/wiki/Q898774","display_name":"Ellipsometry","level":3,"score":0.7607563734054565},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.6838963031768799},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.6804306507110596},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6801087260246277},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6024214029312134},{"id":"https://openalex.org/C181966813","wikidata":"https://www.wikidata.org/wiki/Q806352","display_name":"Band gap","level":2,"score":0.5811264514923096},{"id":"https://openalex.org/C42067758","wikidata":"https://www.wikidata.org/wiki/Q174102","display_name":"Refractive index","level":2,"score":0.5691350698471069},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.4686407744884491},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2746869921684265},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.23801776766777039},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.10848808288574219},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1063/1.2717607","doi":"https://doi.org/10.1063/1.2717607","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.2717607","pdf_url":null,"source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320334593","display_name":"Natural Sciences and Engineering Research Council of Canada","ror":"https://ror.org/01h531d29"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":22,"referenced_works":["https://openalex.org/W1635540212","https://openalex.org/W1659914018","https://openalex.org/W1965306035","https://openalex.org/W1965492919","https://openalex.org/W1975310337","https://openalex.org/W1996026665","https://openalex.org/W1996243515","https://openalex.org/W2003645630","https://openalex.org/W2009221461","https://openalex.org/W2016162937","https://openalex.org/W2035150410","https://openalex.org/W2052528601","https://openalex.org/W2057517257","https://openalex.org/W2061323089","https://openalex.org/W2067969324","https://openalex.org/W2070492522","https://openalex.org/W2081951671","https://openalex.org/W2088300839","https://openalex.org/W2134098010","https://openalex.org/W2156726374","https://openalex.org/W2166583766","https://openalex.org/W4285719527"],"related_works":["https://openalex.org/W1963638050","https://openalex.org/W2062818343","https://openalex.org/W2784680125","https://openalex.org/W2033800510","https://openalex.org/W1984891171","https://openalex.org/W2019122888","https://openalex.org/W2124419210","https://openalex.org/W2020883474","https://openalex.org/W4411471153","https://openalex.org/W3023415171"],"abstract_inverted_index":{"The":[0,65,115,148,173],"electro-optical":[1,51],"properties":[2,52],"of":[3,24,53,63,82,107,157,167],"SiONC":[4,30],"dielectric":[5,89,113,139],"thin":[6,31],"films":[7,32,55,135],"deposited":[8],"by":[9,59,152],"polymer-source":[10],"chemical":[11],"vapor":[12],"deposition":[13],"using":[14,35,123],"an":[15],"organosilane":[16],"precursor":[17],"has":[18],"been":[19],"investigated":[20],"as":[21,91,93,127,129],"a":[22,71,136,155,161],"function":[23],"oxygen":[25,83,168],"concentration":[26,62,81,166],"in":[27,145],"the":[28,50,54,60],"films.":[29],"were":[33],"characterized":[34],"capacitance-voltage":[36],"(C-V),":[37],"conductance-voltage":[38],"(G-V),":[39],"ellipsometry,":[40],"and":[41,143,189],"ultraviolet":[42],"visible":[43],"(UV-Vis)":[44],"photospectroscopy.":[45],"These":[46],"measurements":[47],"showed":[48],"that":[49],"are":[56],"greatly":[57],"influenced":[58],"atomic":[61,80,165],"oxygen.":[64],"high":[66,79,92],"frequency":[67],"C-V":[68],"measurement":[69,122],"revealed":[70],"nearly":[72],"ideal":[73],"metal-oxide-semiconductor":[74],"(MOS)":[75],"structure":[76],"behavior":[77],"at":[78,97,154],"(35":[84],"at.":[85,105],"%).":[86],"A":[87],"relative":[88],"constant":[90],"6":[94],"is":[95,126],"obtained":[96],"10":[98],"kHz":[99],"for":[100],"samples":[101],"with":[102,164],"about":[103],"5":[104],"%":[106],"oxygen,":[108],"which":[109],"corresponds":[110],"to":[111,141,171,185],"high-k":[112,138],"material.":[114],"interface":[116],"trap":[117],"density":[118],"extracted":[119,178],"from":[120,169,179],"G-V":[121],"Hill-Coleman":[124],"method":[125],"low":[128],"3.2\u00d71010":[130],"(cm\u22122":[131],"eV\u22121),":[132],"making":[133],"these":[134],"viable":[137],"alternative":[140],"SiO2":[142],"SiON":[144],"MOS":[146],"devices.":[147],"refractive":[149],"index":[150],"measured":[151],"ellipsometry":[153],"wavelength":[156],"632.8":[158],"nm":[159],"shows":[160],"linear":[162],"variation":[163],"1.58":[170],"1.69.":[172],"optical":[174],"energy":[175],"band":[176],"gap":[177],"UV-Vis":[180],"absorption":[181],"spectra":[182],"was":[183],"found":[184],"vary":[186],"between":[187],"4.40":[188],"5.25":[190],"eV.":[191]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}