{"id":"https://openalex.org/W2069914735","doi":"https://doi.org/10.1117/1.jmm.11.2.021115","title":"Free-standing spectral purity filters for extreme ultraviolet lithography","display_name":"Free-standing spectral purity filters for extreme ultraviolet lithography","publication_year":2012,"publication_date":"2012-05-31","ids":{"openalex":"https://openalex.org/W2069914735","doi":"https://doi.org/10.1117/1.jmm.11.2.021115","mag":"2069914735"},"language":"en","primary_location":{"id":"doi:10.1117/1.jmm.11.2.021115","doi":"https://doi.org/10.1117/1.jmm.11.2.021115","is_oa":false,"landing_page_url":"https://doi.org/10.1117/1.jmm.11.2.021115","pdf_url":null,"source":{"id":"https://openalex.org/S4210232087","display_name":"Journal of Micro/Nanopatterning Materials and Metrology","issn_l":"2708-8340","issn":["2708-8340"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Micro/Nanopatterning, Materials, and Metrology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5041034044","display_name":"\u041d. \u0418. \u0427\u0445\u0430\u043b\u043e","orcid":"https://orcid.org/0000-0003-0653-0857","observed_orcids":["https://orcid.org/0000-0003-0653-0857"]},"institutions":[{"id":"https://openalex.org/I1313323035","display_name":"Russian Academy of Sciences","ror":"https://ror.org/05qrfxd25","country_code":"RU","type":"government","lineage":["https://openalex.org/I1313323035"]},{"id":"https://openalex.org/I4210144079","display_name":"Institute for Physics of Microstructures","ror":"https://ror.org/03mzbmf11","country_code":"RU","type":"facility","lineage":["https://openalex.org/I1313323035","https://openalex.org/I4210096333","https://openalex.org/I4210144079"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Nikolay I. Chkhalo","raw_affiliation_strings":["Institute for Physics of Microstructures","Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute for Physics of Microstructures","institution_ids":["https://openalex.org/I4210144079"]},{"raw_affiliation_string":"Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia","institution_ids":["https://openalex.org/I1313323035","https://openalex.org/I4210144079"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010868316","display_name":"Mikhail Nikolaevich Drozdov","orcid":"https://orcid.org/0000-0001-5577-2460","observed_orcids":["https://orcid.org/0000-0001-5577-2460"]},"institutions":[{"id":"https://openalex.org/I1313323035","display_name":"Russian Academy of Sciences","ror":"https://ror.org/05qrfxd25","country_code":"RU","type":"government","lineage":["https://openalex.org/I1313323035"]},{"id":"https://openalex.org/I4210144079","display_name":"Institute for Physics of Microstructures","ror":"https://ror.org/03mzbmf11","country_code":"RU","type":"facility","lineage":["https://openalex.org/I1313323035","https://openalex.org/I4210096333","https://openalex.org/I4210144079"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Mikhail N. Drozdov","raw_affiliation_strings":["Institute for Physics of Microstructures","Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute for Physics of Microstructures","institution_ids":["https://openalex.org/I4210144079"]},{"raw_affiliation_string":"Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia","institution_ids":["https://openalex.org/I1313323035","https://openalex.org/I4210144079"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109175660","display_name":"Evgeniy B. Kluenkov","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1313323035","display_name":"Russian Academy of Sciences","ror":"https://ror.org/05qrfxd25","country_code":"RU","type":"government","lineage":["https://openalex.org/I1313323035"]},{"id":"https://openalex.org/I4210144079","display_name":"Institute for Physics of Microstructures","ror":"https://ror.org/03mzbmf11","country_code":"RU","type":"facility","lineage":["https://openalex.org/I1313323035","https://openalex.org/I4210096333","https://openalex.org/I4210144079"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Evgeniy B. Kluenkov","raw_affiliation_strings":["Institute for Physics of Microstructures","Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute for Physics of Microstructures","institution_ids":["https://openalex.org/I4210144079"]},{"raw_affiliation_string":"Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia","institution_ids":["https://openalex.org/I1313323035","https://openalex.org/I4210144079"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110230560","display_name":"A. Ya. Lopatin","orcid":"https://orcid.org/0009-0009-0844-6473","observed_orcids":["https://orcid.org/0009-0009-0844-6473"]},"institutions":[{"id":"https://openalex.org/I1313323035","display_name":"Russian Academy of Sciences","ror":"https://ror.org/05qrfxd25","country_code":"RU","type":"government","lineage":["https://openalex.org/I1313323035"]},{"id":"https://openalex.org/I4210144079","display_name":"Institute for Physics of Microstructures","ror":"https://ror.org/03mzbmf11","country_code":"RU","type":"facility","lineage":["https://openalex.org/I1313323035","https://openalex.org/I4210096333","https://openalex.org/I4210144079"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Alexsei Y. Lopatin","raw_affiliation_strings":["Institute for Physics of Microstructures","Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute for Physics of Microstructures","institution_ids":["https://openalex.org/I4210144079"]},{"raw_affiliation_string":"Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia","institution_ids":["https://openalex.org/I1313323035","https://openalex.org/I4210144079"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5006453145","display_name":"\u0412. \u0418. \u041b\u0443\u0447\u0438\u043d","orcid":"https://orcid.org/0000-0002-3708-7934","observed_orcids":["https://orcid.org/0000-0002-3708-7934"]},"institutions":[{"id":"https://openalex.org/I1313323035","display_name":"Russian Academy of Sciences","ror":"https://ror.org/05qrfxd25","country_code":"RU","type":"government","lineage":["https://openalex.org/I1313323035"]},{"id":"https://openalex.org/I4210144079","display_name":"Institute for Physics of Microstructures","ror":"https://ror.org/03mzbmf11","country_code":"RU","type":"facility","lineage":["https://openalex.org/I1313323035","https://openalex.org/I4210096333","https://openalex.org/I4210144079"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Valerii I. Luchin","raw_affiliation_strings":["Institute for Physics of Microstructures","Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute for Physics of Microstructures","institution_ids":["https://openalex.org/I4210144079"]},{"raw_affiliation_string":"Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia","institution_ids":["https://openalex.org/I1313323035","https://openalex.org/I4210144079"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059404193","display_name":"\u041d. \u041d. \u0421\u0430\u043b\u0430\u0449\u0435\u043d\u043a\u043e","orcid":"https://orcid.org/0000-0003-1909-8637","observed_orcids":["https://orcid.org/0000-0003-1909-8637"]},"institutions":[{"id":"https://openalex.org/I1313323035","display_name":"Russian Academy of Sciences","ror":"https://ror.org/05qrfxd25","country_code":"RU","type":"government","lineage":["https://openalex.org/I1313323035"]},{"id":"https://openalex.org/I4210144079","display_name":"Institute for Physics of Microstructures","ror":"https://ror.org/03mzbmf11","country_code":"RU","type":"facility","lineage":["https://openalex.org/I1313323035","https://openalex.org/I4210096333","https://openalex.org/I4210144079"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Nikolay N. Salashchenko","raw_affiliation_strings":["Institute for Physics of Microstructures","Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute for Physics of Microstructures","institution_ids":["https://openalex.org/I4210144079"]},{"raw_affiliation_string":"Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia","institution_ids":["https://openalex.org/I1313323035","https://openalex.org/I4210144079"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108216594","display_name":"\u041d. \u041d. \u0426\u044b\u0431\u0438\u043d","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1313323035","display_name":"Russian Academy of Sciences","ror":"https://ror.org/05qrfxd25","country_code":"RU","type":"government","lineage":["https://openalex.org/I1313323035"]},{"id":"https://openalex.org/I4210144079","display_name":"Institute for Physics of Microstructures","ror":"https://ror.org/03mzbmf11","country_code":"RU","type":"facility","lineage":["https://openalex.org/I1313323035","https://openalex.org/I4210096333","https://openalex.org/I4210144079"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Nikolay N. Tsybin","raw_affiliation_strings":["Institute for Physics of Microstructures","Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute for Physics of Microstructures","institution_ids":["https://openalex.org/I4210144079"]},{"raw_affiliation_string":"Institute for Physics of Microstructures, Russian Academy of\u00a0Sciences, Nizhny Novgorod, Russia","institution_ids":["https://openalex.org/I1313323035","https://openalex.org/I4210144079"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089781204","display_name":"Leonid A. Sjmaenok","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Leonid A. Sjmaenok","raw_affiliation_strings":["PhysTeX","PhysTeX, Vaals, Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"PhysTeX","institution_ids":[]},{"raw_affiliation_string":"PhysTeX, Vaals, Netherlands","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032843176","display_name":"Vadim Banine","orcid":"https://orcid.org/0000-0001-6676-7421","observed_orcids":["https://orcid.org/0000-0001-6676-7421"]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Vadim E. Banine","raw_affiliation_strings":["ASML Netherlands B.V","ASML, Veldhoven, Netherlands#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V","institution_ids":["https://openalex.org/I927257375"]},{"raw_affiliation_string":"ASML, Veldhoven, Netherlands#TAB#","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5108084520","display_name":"Andrei M. Yakunin","orcid":"https://orcid.org/0009-0001-9270-7067","observed_orcids":["https://orcid.org/0009-0001-9270-7067"]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Andrei M. Yakunin","raw_affiliation_strings":["ASML Netherlands B.V","ASML, Veldhoven, Netherlands#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V","institution_ids":["https://openalex.org/I927257375"]},{"raw_affiliation_string":"ASML, Veldhoven, Netherlands#TAB#","institution_ids":["https://openalex.org/I927257375"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":3.0012,"has_fulltext":false,"cited_by_count":44,"citation_normalized_percentile":{"value":0.91393939,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"11","issue":"02","first_page":"1","last_page":"8"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9779999852180481,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9779999852180481,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.01889999955892563,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.9670000076293945}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9246219396591187},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7981322407722473},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7425138354301453},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.7076077461242676},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6294201016426086},{"id":"https://openalex.org/C2776798109","wikidata":"https://www.wikidata.org/wiki/Q11391","display_name":"Ultraviolet","level":2,"score":0.6144972443580627},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5060855746269226},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4655419588088989},{"id":"https://openalex.org/C542268612","wikidata":"https://www.wikidata.org/wiki/Q743","display_name":"Tungsten","level":2,"score":0.4310705065727234},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.41708576679229736},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.16939032077789307},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.09593582153320312},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/1.jmm.11.2.021115","doi":"https://doi.org/10.1117/1.jmm.11.2.021115","is_oa":false,"landing_page_url":"https://doi.org/10.1117/1.jmm.11.2.021115","pdf_url":null,"source":{"id":"https://openalex.org/S4210232087","display_name":"Journal of Micro/Nanopatterning Materials and Metrology","issn_l":"2708-8340","issn":["2708-8340"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Micro/Nanopatterning, Materials, and Metrology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320337932","display_name":"Institute for Physics of\u00a0Microstructures of\u00a0the Russian Academy of\u00a0Sciences","ror":"https://ror.org/03mzbmf11"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W1969819184","https://openalex.org/W1972283567","https://openalex.org/W1988961705","https://openalex.org/W2011674684","https://openalex.org/W2018047815","https://openalex.org/W2023934381","https://openalex.org/W2026877955","https://openalex.org/W2043768664","https://openalex.org/W2047346845","https://openalex.org/W2052645836","https://openalex.org/W2054486439","https://openalex.org/W2060223653","https://openalex.org/W2068741325","https://openalex.org/W2082281511","https://openalex.org/W2084721344","https://openalex.org/W2085742656","https://openalex.org/W2092658406","https://openalex.org/W2104525067","https://openalex.org/W2123628749","https://openalex.org/W2158698487"],"related_works":["https://openalex.org/W2011674684","https://openalex.org/W7155059505","https://openalex.org/W1969819184","https://openalex.org/W2012301475","https://openalex.org/W7204939284","https://openalex.org/W2057762528","https://openalex.org/W4390485883","https://openalex.org/W2111636794","https://openalex.org/W2335133053","https://openalex.org/W2114289174"],"abstract_inverted_index":{"Free-standing":[0],"multilayer":[1,34],"films":[2],"consisting":[3],"of":[4,10,33,37,74,76,87,92,113],"Si,":[5],"Zr,":[6],"Mo":[7],"and":[8,16,83],"silicides":[9],"both":[11],"metals":[12],"have":[13,40],"been":[14,41],"fabricated":[15,108],"studied":[17],"as":[18,109],"spectral":[19],"purity":[20],"filters":[21],"(SPF)":[22],"for":[23],"extreme":[24],"ultraviolet":[25],"(EUV)":[26],"(13.5":[27],"nm)":[28],"lithography":[29],"tools.":[30],"Comparative":[31],"tests":[32],"SPF":[35],"structures":[36],"various":[38],"compositions":[39],"performed":[42],"at":[43,70,102],"high":[44],"power":[45],"loads.":[46],"It":[47],"was":[48,81,107],"found":[49],"that":[50],"a":[51,84,110],"Mo/ZrSi2":[52],"structure":[53,91],"with":[54,60,100,115],"MoSi2":[55],"capping":[56],"layers":[57],"is":[58],"featured":[59],"capability":[61],"to":[62],"withstand":[63],"prolonged":[64],"heating":[65],"in":[66,95],"vacuum":[67],"(10\u22127":[68],"mbar)":[69],"900-950\u00b0C.":[71],"A":[72],"technique":[73],"fabrication":[75],"large":[77,116],"aperture":[78],"free-standing":[79],"multilayers":[80],"developed,":[82],"pilot":[85],"sample":[86],"the":[88],"above":[89,105],"film":[90],"160":[93],"mm":[94],"diameter,":[96],"50":[97],"nm":[98,104],"thick,":[99],"transparency":[101],"13.5":[103],"70%":[106],"conceptual":[111],"prototype":[112],"SPFs":[114],"dimensions.":[117]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":6},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":4},{"year":2018,"cited_by_count":3},{"year":2017,"cited_by_count":5},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":5},{"year":2014,"cited_by_count":6},{"year":2013,"cited_by_count":4}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}