{"id":"https://openalex.org/W2069678656","doi":"https://doi.org/10.1117/12.46359","title":"New aqueous base-developable negative-tone photoresist based on furans","display_name":"New aqueous base-developable negative-tone photoresist based on furans","publication_year":1991,"publication_date":"1991-06-01","ids":{"openalex":"https://openalex.org/W2069678656","doi":"https://doi.org/10.1117/12.46359","mag":"2069678656"},"language":"en","primary_location":{"id":"doi:10.1117/12.46359","doi":"https://doi.org/10.1117/12.46359","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.46359","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111854788","display_name":"James T. Fahey","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I205783295","display_name":"Cornell University","ror":"https://ror.org/05bnh6r87","country_code":"US","type":"education","lineage":["https://openalex.org/I205783295"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"James T. Fahey","raw_affiliation_strings":["Cornell University,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cornell University,USA","institution_ids":["https://openalex.org/I205783295"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5002152167","display_name":"Jean M. J. Fr\u00e9chet","orcid":"https://orcid.org/0000-0001-6419-0163","observed_orcids":["https://orcid.org/0000-0001-6419-0163"]},"institutions":[{"id":"https://openalex.org/I205783295","display_name":"Cornell University","ror":"https://ror.org/05bnh6r87","country_code":"US","type":"education","lineage":["https://openalex.org/I205783295"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jean M. J. Frechet","raw_affiliation_strings":["Cornell University,USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cornell University,USA","institution_ids":["https://openalex.org/I205783295"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I205783295"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.27044025,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"1466","issue":null,"first_page":"67","last_page":"74"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.0010999999940395355,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11708","display_name":"Photochromic and Fluorescence Chemistry","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/negative-photoresist","display_name":"negative photoresist","score":0.9819999933242798},{"id":"https://openalex.org/keywords/photoacid-generator","display_name":"photoacid generator","score":0.8360000252723694},{"id":"https://openalex.org/keywords/chemically-amplified-resists","display_name":"chemically amplified resists","score":0.984000027179718},{"id":"https://openalex.org/keywords/deep-ultraviolet-lithography","display_name":"deep ultraviolet lithography","score":0.7760000228881836},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"electron beam lithography","score":0.9350000023841858},{"id":"https://openalex.org/keywords/radiation-crosslinking","display_name":"radiation crosslinking","score":0.9580000042915344},{"id":"https://openalex.org/keywords/phenolic-substituents","display_name":"phenolic substituents","score":0.734000027179718},{"id":"https://openalex.org/keywords/resist-swelling","display_name":"resist swelling","score":0.8080000281333923}],"concepts":[{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.971657395362854},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.8543466329574585},{"id":"https://openalex.org/C184651966","wikidata":"https://www.wikidata.org/wiki/Q906356","display_name":"Aqueous solution","level":2,"score":0.7035436630249023},{"id":"https://openalex.org/C2780583480","wikidata":"https://www.wikidata.org/wiki/Q1366327","display_name":"Tone (literature)","level":2,"score":0.5170764923095703},{"id":"https://openalex.org/C151857401","wikidata":"https://www.wikidata.org/wiki/Q640621","display_name":"Optical engineering","level":2,"score":0.5149950981140137},{"id":"https://openalex.org/C188027245","wikidata":"https://www.wikidata.org/wiki/Q750446","display_name":"Polymer chemistry","level":1,"score":0.4746606647968292},{"id":"https://openalex.org/C50027330","wikidata":"https://www.wikidata.org/wiki/Q908086","display_name":"Electrophile","level":3,"score":0.46542876958847046},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.4580082595348358},{"id":"https://openalex.org/C2777566558","wikidata":"https://www.wikidata.org/wiki/Q28917","display_name":"Styrene","level":4,"score":0.44932255148887634},{"id":"https://openalex.org/C2777965246","wikidata":"https://www.wikidata.org/wiki/Q899587","display_name":"Electrophilic substitution","level":2,"score":0.43016862869262695},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4250127077102661},{"id":"https://openalex.org/C111337013","wikidata":"https://www.wikidata.org/wiki/Q2737837","display_name":"Irradiation","level":2,"score":0.4246312379837036},{"id":"https://openalex.org/C2778540859","wikidata":"https://www.wikidata.org/wiki/Q152234","display_name":"Swelling","level":2,"score":0.4160325527191162},{"id":"https://openalex.org/C75473681","wikidata":"https://www.wikidata.org/wiki/Q188651","display_name":"Photochemistry","level":1,"score":0.3394808769226074},{"id":"https://openalex.org/C521977710","wikidata":"https://www.wikidata.org/wiki/Q81163","display_name":"Polymer","level":2,"score":0.3272740840911865},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.290193110704422},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.24320057034492493},{"id":"https://openalex.org/C15920480","wikidata":"https://www.wikidata.org/wiki/Q421281","display_name":"Copolymer","level":3,"score":0.24017629027366638},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.23544025421142578},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.18094795942306519},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.12582600116729736},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.07220518589019775},{"id":"https://openalex.org/C124952713","wikidata":"https://www.wikidata.org/wiki/Q8242","display_name":"Literature","level":1,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0},{"id":"https://openalex.org/C142362112","wikidata":"https://www.wikidata.org/wiki/Q735","display_name":"Art","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.46359","doi":"https://doi.org/10.1117/12.46359","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.46359","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320306076","display_name":"National Science Foundation","ror":"https://ror.org/021nxhr62"},{"id":"https://openalex.org/F4320307762","display_name":"International Business Machines Corporation","ror":"https://ror.org/05hh8d621"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1966148975","https://openalex.org/W1972916030","https://openalex.org/W2072578054","https://openalex.org/W2087906923","https://openalex.org/W2155010853","https://openalex.org/W2046267365","https://openalex.org/W2034702624","https://openalex.org/W2145442192","https://openalex.org/W2068184859","https://openalex.org/W2485326493"],"abstract_inverted_index":{"A":[0],"new":[1],"versatile":[2],"negative-tone":[3],"resist":[4,19,57],"consisting":[5],"of":[6,39,52,74],"poly":[7],"[4-":[8],"hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene],":[9],"and":[10,29],"a":[11],"photoacid":[12],"generator":[13],"is":[14,63,77],"described.":[15],"This":[16],"chemically":[17],"amplified":[18],"which":[20],"shows":[21],"high":[22],"sensitivity":[23],"in":[24,55],"the":[25,37,50,56,75],"deep-UV":[26],"(2.3":[27],"mJ/cm2)":[28],"E-Beam":[30],"(3.4":[31],"(mu)":[32],"C/cm2)":[33],"modes,":[34],"operates":[35],"on":[36],"basis":[38],"radiation":[40],"induced":[41],"crosslinking":[42],"via":[43],"acid-catalyzed":[44],"electrophilic":[45],"aromatic":[46],"substitution.":[47],"Due":[48],"to":[49],"incorporation":[51],"phenolic":[53],"substituents":[54],"design":[58],"aqueous":[59],"development":[60],"without":[61],"swelling":[62],"possible.\u00a9":[64],"(1991)":[65],"COPYRIGHT":[66],"SPIE--The":[67],"International":[68],"Society":[69],"for":[70,79],"Optical":[71],"Engineering.":[72],"Downloading":[73],"abstract":[76],"permitted":[78],"personal":[80],"use":[81],"only.":[82]},"counts_by_year":[{"year":2014,"cited_by_count":1}],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2016-06-24T00:00:00"}