{"id":"https://openalex.org/W2067014607","doi":"https://doi.org/10.1016/j.mssp.2003.08.017","title":"Structural properties of V2O5 thin films prepared by vacuum evaporation","display_name":"Structural properties of V2O5 thin films prepared by vacuum evaporation","publication_year":2003,"publication_date":"2003-10-01","ids":{"openalex":"https://openalex.org/W2067014607","doi":"https://doi.org/10.1016/j.mssp.2003.08.017","mag":"2067014607"},"language":"en","primary_location":{"id":"doi:10.1016/j.mssp.2003.08.017","doi":"https://doi.org/10.1016/j.mssp.2003.08.017","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.mssp.2003.08.017","pdf_url":null,"source":{"id":"https://openalex.org/S82126420","display_name":"Materials Science in Semiconductor Processing","issn_l":"1369-8001","issn":["1369-8001","1873-4081"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science in Semiconductor Processing","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109149123","display_name":"R.T. Rajendra Kumar","orcid":"https://orcid.org/0000-0002-4188-5859","observed_orcids":["https://orcid.org/0000-0002-4188-5859"]},"institutions":[{"id":"https://openalex.org/I111575329","display_name":"Bharathiar University","ror":"https://ror.org/04fht8c22","country_code":"IN","type":"education","lineage":["https://openalex.org/I111575329"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"R.T. Rajendra Kumar","raw_affiliation_strings":["Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India","institution_ids":["https://openalex.org/I111575329"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056847096","display_name":"Bojan Karunagaran","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I111575329","display_name":"Bharathiar University","ror":"https://ror.org/04fht8c22","country_code":"IN","type":"education","lineage":["https://openalex.org/I111575329"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"B. Karunagaran","raw_affiliation_strings":["Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India","institution_ids":["https://openalex.org/I111575329"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100748988","display_name":"V. Senthil Kumar","orcid":"https://orcid.org/0000-0002-9965-0497","observed_orcids":["https://orcid.org/0000-0002-9965-0497"]},"institutions":[{"id":"https://openalex.org/I111575329","display_name":"Bharathiar University","ror":"https://ror.org/04fht8c22","country_code":"IN","type":"education","lineage":["https://openalex.org/I111575329"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"V. Senthil Kumar","raw_affiliation_strings":["Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India","institution_ids":["https://openalex.org/I111575329"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076424834","display_name":"Yekkoni Lakshmanan Jeyachandran","orcid":"https://orcid.org/0000-0002-9971-0365","observed_orcids":["https://orcid.org/0000-0002-9971-0365"]},"institutions":[{"id":"https://openalex.org/I111575329","display_name":"Bharathiar University","ror":"https://ror.org/04fht8c22","country_code":"IN","type":"education","lineage":["https://openalex.org/I111575329"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Y.L. Jeyachandran","raw_affiliation_strings":["Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India","institution_ids":["https://openalex.org/I111575329"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076612246","display_name":"Devanesan Mangalaraj","orcid":"https://orcid.org/0000-0002-0173-8205","observed_orcids":["https://orcid.org/0000-0002-0173-8205"]},"institutions":[{"id":"https://openalex.org/I111575329","display_name":"Bharathiar University","ror":"https://ror.org/04fht8c22","country_code":"IN","type":"education","lineage":["https://openalex.org/I111575329"]}],"countries":["IN"],"is_corresponding":true,"raw_author_name":"D. Mangalaraj","raw_affiliation_strings":["Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India","institution_ids":["https://openalex.org/I111575329"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111458730","display_name":"Sa. K. Narayandass","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I111575329","display_name":"Bharathiar University","ror":"https://ror.org/04fht8c22","country_code":"IN","type":"education","lineage":["https://openalex.org/I111575329"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Sa.K. Narayandass","raw_affiliation_strings":["Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046, India","institution_ids":["https://openalex.org/I111575329"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5076612246"],"corresponding_institution_ids":["https://openalex.org/I111575329"],"apc_list":{"value":3540,"currency":"USD","value_usd":3540},"apc_paid":null,"fwci":0.7428,"has_fulltext":false,"cited_by_count":60,"citation_normalized_percentile":{"value":0.65798664,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"6","issue":"5-6","first_page":"543","last_page":"546"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11128","display_name":"Transition Metal Oxide Nanomaterials","score":0.9243000149726868,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11128","display_name":"Transition Metal Oxide Nanomaterials","score":0.9243000149726868,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12613","display_name":"X-ray Diffraction in Crystallography","score":0.04830000177025795,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.006500000134110451,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/vanadium-pentoxide","display_name":"vanadium pentoxide","score":0.9589999914169312},{"id":"https://openalex.org/keywords/v2o5-thin-films","display_name":"V2O5 thin films","score":0.9829999804496765},{"id":"https://openalex.org/keywords/vacuum-evaporation","display_name":"vacuum evaporation","score":0.9259999990463257},{"id":"https://openalex.org/keywords/deposition-temperature","display_name":"deposition temperature","score":0.9610000252723694},{"id":"https://openalex.org/keywords/amorphous-films","display_name":"amorphous films","score":0.7710000276565552},{"id":"https://openalex.org/keywords/polycrystalline-films","display_name":"polycrystalline films","score":0.9179999828338623},{"id":"https://openalex.org/keywords/orthorhombic-structure","display_name":"orthorhombic structure","score":0.9039999842643738},{"id":"https://openalex.org/keywords/lattice-parameters","display_name":"lattice parameters","score":0.9739999771118164},{"id":"https://openalex.org/keywords/nonstoichiometry","display_name":"nonstoichiometry","score":0.8859999775886536},{"id":"https://openalex.org/keywords/crystallographic-texture","display_name":"crystallographic texture","score":0.9440000057220459},{"id":"https://openalex.org/keywords/recrystallization","display_name":"recrystallization","score":0.9959999918937683},{"id":"https://openalex.org/keywords/grain-size","display_name":"grain size","score":0.9850000143051147},{"id":"https://openalex.org/keywords/microstrain","display_name":"microstrain","score":0.9919999837875366},{"id":"https://openalex.org/keywords/dislocation-density","display_name":"dislocation density","score":1.0}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.871507465839386},{"id":"https://openalex.org/C132612359","wikidata":"https://www.wikidata.org/wiki/Q625641","display_name":"Lattice constant","level":3,"score":0.7846627831459045},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.7318782806396484},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.5918259620666504},{"id":"https://openalex.org/C37243968","wikidata":"https://www.wikidata.org/wiki/Q648961","display_name":"Orthorhombic crystal system","level":3,"score":0.5500985383987427},{"id":"https://openalex.org/C40003534","wikidata":"https://www.wikidata.org/wiki/Q862228","display_name":"Raman spectroscopy","level":2,"score":0.5030083060264587},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.48529499769210815},{"id":"https://openalex.org/C2780162846","wikidata":"https://www.wikidata.org/wiki/Q7165280","display_name":"Pentoxide","level":3,"score":0.48023325204849243},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.47119995951652527},{"id":"https://openalex.org/C2779192298","wikidata":"https://www.wikidata.org/wiki/Q7908061","display_name":"Vacuum evaporation","level":3,"score":0.4381803274154663},{"id":"https://openalex.org/C504678139","wikidata":"https://www.wikidata.org/wiki/Q722","display_name":"Vanadium","level":2,"score":0.41714951395988464},{"id":"https://openalex.org/C169573571","wikidata":"https://www.wikidata.org/wiki/Q466824","display_name":"Raman scattering","level":3,"score":0.41143763065338135},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.3224455714225769},{"id":"https://openalex.org/C115624301","wikidata":"https://www.wikidata.org/wiki/Q895901","display_name":"Crystal structure","level":2,"score":0.3109152317047119},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.22339773178100586},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.16193494200706482},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.11350461840629578},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.08882194757461548},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.mssp.2003.08.017","doi":"https://doi.org/10.1016/j.mssp.2003.08.017","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.mssp.2003.08.017","pdf_url":null,"source":{"id":"https://openalex.org/S82126420","display_name":"Materials Science in Semiconductor Processing","issn_l":"1369-8001","issn":["1369-8001","1873-4081"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science in Semiconductor Processing","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W1971928571","https://openalex.org/W1983274899","https://openalex.org/W1993432569","https://openalex.org/W1997137877","https://openalex.org/W1999629973","https://openalex.org/W2035107688","https://openalex.org/W2042205667","https://openalex.org/W2051492243","https://openalex.org/W2095206347"],"related_works":["https://openalex.org/W1964016836","https://openalex.org/W2064625087","https://openalex.org/W2393545301","https://openalex.org/W2008694534","https://openalex.org/W2520609674","https://openalex.org/W2527851128","https://openalex.org/W2048790989","https://openalex.org/W2990306518","https://openalex.org/W2086415496","https://openalex.org/W1998036097"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":4},{"year":2022,"cited_by_count":3},{"year":2021,"cited_by_count":5},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":5},{"year":2016,"cited_by_count":5},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":4}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}