{"id":"https://openalex.org/W2064633893","doi":"https://doi.org/10.1117/12.310802","title":"Effect of stage synchronization error of KrF scan on 0.18-\u03bcm patterning","display_name":"Effect of stage synchronization error of KrF scan on 0.18-\u03bcm patterning","publication_year":1998,"publication_date":"1998-06-29","ids":{"openalex":"https://openalex.org/W2064633893","doi":"https://doi.org/10.1117/12.310802","mag":"2064633893"},"language":"en","primary_location":{"id":"doi:10.1117/12.310802","doi":"https://doi.org/10.1117/12.310802","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.310802","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5054665656","display_name":"Takayuki Uchiyama","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takayuki Uchiyama","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Takeo Hashimoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takeo Hashimoto","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113596756","display_name":"M. Fujimoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masashi Fujimoto","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102076236","display_name":"Seiji Matsuura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Seiji Matsuura","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111683460","display_name":"Tamio Yamazaki","orcid":"https://orcid.org/0009-0007-6673-9608","observed_orcids":["https://orcid.org/0009-0007-6673-9608"]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tamio Yamazaki","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5081290321","display_name":"Kunihiko Kasama","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kunihiko Kasama","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I118347220"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"3334","issue":null,"first_page":"67","last_page":"67"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/krf-laser","display_name":"KrF excimer laser","score":0.7900000214576721},{"id":"https://openalex.org/keywords/photolithography","display_name":"photolithography","score":0.6489999890327454},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.7990000247955322},{"id":"https://openalex.org/keywords/critical-dimension-uniformity","display_name":"critical dimension uniformity","score":0.9649999737739563},{"id":"https://openalex.org/keywords/line-and-space-patterns","display_name":"line/space patterning","score":0.7049999833106995},{"id":"https://openalex.org/keywords/stage-control","display_name":"stage control","score":0.44600000977516174}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.932773768901825},{"id":"https://openalex.org/C171635847","wikidata":"https://www.wikidata.org/wiki/Q406983","display_name":"Micrometer","level":2,"score":0.8483268022537231},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6569063663482666},{"id":"https://openalex.org/C2779751349","wikidata":"https://www.wikidata.org/wiki/Q1474480","display_name":"Scanner","level":2,"score":0.5978394746780396},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.49000874161720276},{"id":"https://openalex.org/C138268822","wikidata":"https://www.wikidata.org/wiki/Q1051925","display_name":"Resolution (logic)","level":2,"score":0.4249446392059326},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3791393041610718},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.37783700227737427},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.1846444308757782},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.16615891456604004},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.310802","doi":"https://doi.org/10.1117/12.310802","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.310802","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2062393748","https://openalex.org/W2084897739","https://openalex.org/W2080853314","https://openalex.org/W2025836406","https://openalex.org/W2062434685","https://openalex.org/W4401974614","https://openalex.org/W2049873451","https://openalex.org/W7140289906","https://openalex.org/W2366434027","https://openalex.org/W2074794253"],"abstract_inverted_index":{"The":[0],"stage":[1,103,161,165],"vibration":[2,162],"effect":[3],"on":[4,116],"imaging":[5],"performance,":[6],"such":[7],"as":[8],"DOF":[9,72],"and":[10,16,39,43,70,118,132,154],"CD":[11,64],"uniformity":[12],"is":[13,181],"evaluated":[14],"experimentally":[15],"compared":[17],"with":[18,36,75],"simulation":[19],"analysis.":[20],"Various":[21],"kinds":[22],"of":[23,46,54,90,109],"0.25":[24,59],"-":[25],"0.18":[26,82,172],"micrometer":[27,60,83,173],"patterns":[28,121,156,174],"are":[29],"investigated":[30],"by":[31],"using":[32],"KrF":[33],"excimer":[34],"scanner":[35],"0.6":[37],"NA":[38],"0.75":[40],"partial":[41],"coherency":[42],"two":[44],"types":[45],"chemically":[47],"amplified":[48],"positive":[49],"resists.":[50],"In":[51,145],"the":[52,63,66,71,102,107,177],"case":[53],"a":[55,110],"standard":[56,78],"resist":[57,113,180],"for":[58,129,171],"level":[61,84],"patterning,":[62],"at":[65],"best":[67],"focus":[68],"changed":[69],"decreased":[73],"rapidly":[74],"increasing":[76],"moving":[77],"deviation":[79],"(MSD)":[80],"in":[81],"pattern":[85,92],"formation.":[86],"Allowable":[87],"MSD":[88,138],"value":[89,139],"L&S":[91,117],"was":[93,114,140,148],"estimated":[94],"to":[95,160,168],"be":[96,169],"around":[97],"25":[98],"nm.":[99,144],"To":[100],"improve":[101],"synchronous":[104],"error":[105],"margin,":[106],"application":[108],"high":[111,178],"resolution":[112,179],"effective":[115],"isolated":[119,130,152],"space":[120],"(about":[122],"40":[123],"nm),":[124],"but":[125],"showed":[126],"little":[127],"improvement":[128],"line":[131,153],"hole":[133,155],"patterns.":[134],"Therefore,":[135],"totally":[136],"allowable":[137],"still":[141],"about":[142],"30":[143],"particular":[146],"it":[147],"found":[149],"that":[150],"both":[151],"were":[157],"very":[158],"sensitive":[159],"effect.":[163],"Strict":[164],"control":[166],"has":[167],"required":[170],"even":[175],"if":[176],"used.":[182]},"counts_by_year":[],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}