{"id":"https://openalex.org/W2063374987","doi":"https://doi.org/10.1109/rtp.2008.4690551","title":"Control of laser induced interface traps with in-line corona charge metrology","display_name":"Control of laser induced interface traps with in-line corona charge metrology","publication_year":2008,"publication_date":"2008-09-01","ids":{"openalex":"https://openalex.org/W2063374987","doi":"https://doi.org/10.1109/rtp.2008.4690551","mag":"2063374987"},"language":"en","primary_location":{"id":"doi:10.1109/rtp.2008.4690551","doi":"https://doi.org/10.1109/rtp.2008.4690551","is_oa":false,"landing_page_url":"https://doi.org/10.1109/rtp.2008.4690551","pdf_url":null,"source":{"id":"https://openalex.org/S4306419107","display_name":"International Conference on Advanced Thermal Processing of Semiconductors","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111912401","display_name":"J.-L. Everaert","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"J-L. Everaert","raw_affiliation_strings":["IMEC, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5029989684","display_name":"Erik Rosseel","orcid":"https://orcid.org/0000-0002-2737-8391","observed_orcids":["https://orcid.org/0000-0002-2737-8391"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"E. Rosseel","raw_affiliation_strings":["IMEC, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082043749","display_name":"Claude Ortolland","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"C. Ortolland","raw_affiliation_strings":["IMEC, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028923484","display_name":"M. Aoulaiche","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"M. Aoulaiche","raw_affiliation_strings":["IMEC, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048779687","display_name":"Thomas Hoffmann","orcid":"https://orcid.org/0000-0002-3181-9962","observed_orcids":["https://orcid.org/0000-0002-3181-9962","https://orcid.org/0000-0003-4761-0722"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"T. Hoffmann","raw_affiliation_strings":["IMEC, Leuven, Belgium","IMEC, Kapeldreef 75, 3001 Leuven Belgium,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC, Leuven, Belgium","institution_ids":["https://openalex.org/I4210114974"]},{"raw_affiliation_string":"IMEC, Kapeldreef 75, 3001 Leuven Belgium,","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111762310","display_name":"T. Pavelka","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210166314","display_name":"Semilab (Hungary)","ror":"https://ror.org/05jy9ww07","country_code":"HU","type":"company","lineage":["https://openalex.org/I4210166314"]}],"countries":["HU"],"is_corresponding":false,"raw_author_name":"T. Pavelka","raw_affiliation_strings":["Semilab, Budapest, Hungary","Semilab, Prielle Kornelia u2, H-1117 Budapest Hungary"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semilab, Budapest, Hungary","institution_ids":["https://openalex.org/I4210166314"]},{"raw_affiliation_string":"Semilab, Prielle Kornelia u2, H-1117 Budapest Hungary","institution_ids":["https://openalex.org/I4210166314"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112726552","display_name":"E. Don\ufffd","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"E. Don","raw_affiliation_strings":["SemiMetrics Ltd., Kings Langley, United Kingdom","SemiMetrics Ltd., P.O. Box 36, Kings Langley, WD4 9WB, United Kingdom"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SemiMetrics Ltd., Kings Langley, United Kingdom","institution_ids":[]},{"raw_affiliation_string":"SemiMetrics Ltd., P.O. Box 36, Kings Langley, WD4 9WB, United Kingdom","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.4739,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.5269195,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"84","issue":null,"first_page":"163","last_page":"168"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9937000274658203,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9937000274658203,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.0012000000569969416,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.0012000000569969416,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/laser-annealing","display_name":"laser annealing","score":0.9049999713897705},{"id":"https://openalex.org/keywords/interface-states","display_name":"interface states","score":0.875},{"id":"https://openalex.org/keywords/ultrashallow-junctions","display_name":"ultra-shallow junctions","score":0.902999997138977},{"id":"https://openalex.org/keywords/gate-dielectric","display_name":"gate dielectric","score":0.7490000128746033},{"id":"https://openalex.org/keywords/silica","display_name":"silica","score":0.7129999995231628},{"id":"https://openalex.org/keywords/sion","display_name":"Sion","score":0.9589999914169312},{"id":"https://openalex.org/keywords/high-k-gate-dielectrics","display_name":"high-k gate dielectrics","score":0.9110000133514404},{"id":"https://openalex.org/keywords/stress-relaxation","display_name":"stress relaxation","score":0.7670000195503235},{"id":"https://openalex.org/keywords/crystallization","display_name":"crystallization","score":0.5199999809265137}],"concepts":[{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.49817872047424316},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.4957359731197357},{"id":"https://openalex.org/C188198153","wikidata":"https://www.wikidata.org/wiki/Q1613840","display_name":"Limiting","level":2,"score":0.45839962363243103},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4392063021659851},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.4325387477874756},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.34010690450668335},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3387945890426636},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.3235095143318176},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3058605194091797},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.13472196459770203},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.1301741600036621},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.10096687078475952},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/rtp.2008.4690551","doi":"https://doi.org/10.1109/rtp.2008.4690551","is_oa":false,"landing_page_url":"https://doi.org/10.1109/rtp.2008.4690551","pdf_url":null,"source":{"id":"https://openalex.org/S4306419107","display_name":"International Conference on Advanced Thermal Processing of Semiconductors","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1501800313","https://openalex.org/W2014201750","https://openalex.org/W2022176230","https://openalex.org/W2041424982","https://openalex.org/W2053550352","https://openalex.org/W2113035836","https://openalex.org/W4293575764"],"related_works":["https://openalex.org/W2167895436","https://openalex.org/W3215631749","https://openalex.org/W2998658884","https://openalex.org/W3041309883","https://openalex.org/W4248466767","https://openalex.org/W2411312240","https://openalex.org/W2057100058","https://openalex.org/W3111541727","https://openalex.org/W2110066566","https://openalex.org/W2600096663"],"abstract_inverted_index":{"Laser":[0],"annealing":[1],"is":[2,37,107,130],"an":[3],"ideal":[4],"activation":[5],"step":[6],"for":[7,50,82],"ultra":[8],"shallow":[9],"junctions":[10],"(USJ).":[11],"But":[12],"it":[13],"can":[14,70,90,118],"increase":[15],"the":[16,23,32,59,65,68,74,77,105],"density":[17],"of":[18,22,34,73,79,98],"interface":[19],"traps":[20],"(Dit)":[21],"gate":[24,48,103],"dielectric,":[25],"resulting":[26],"in":[27,86,96],"degraded":[28],"NBTI":[29],"reliability.":[30],"Therefore":[31],"influence":[33],"anneal":[35,89,123],"conditions":[36,81],"studied":[38],"with":[39],"corona":[40],"charge":[41],"metrology.":[42],"SiO2is":[43],"used":[44],"as":[45],"a":[46],"reference":[47],"dielectric":[49],"which":[51],"recovery":[52,69],"solutions":[53],"are":[54],"worked":[55],"out":[56],"to":[57,111],"reduce":[58],"laser":[60,126],"induced":[61],"Dit.":[62],"But,":[63],"on":[64],"other":[66],"hand,":[67],"cause":[71],"degradation":[72],"USJ,":[75],"limiting":[76],"choice":[78],"process":[80],"recovery.":[83],"The":[84,128],"reduction":[85],"Ditby":[87],"spike":[88,122],"be":[91,119],"explained":[92],"by":[93,121],"stress":[94],"relaxation":[95],"case":[97],"SiO2and":[99],"SiON.":[100],"For":[101],"HiK":[102],"dielectrics":[104],"behaviour":[106],"more":[108],"complex":[109],"due":[110],"possible":[112],"chemical":[113],"interactions":[114],"and":[115,124],"crystallization.":[116],"Recovery":[117],"done":[120],"mulitscan":[125],"anneal.":[127],"latter":[129],"better":[131],"towards":[132],"USJ":[133],"properties.":[134]},"counts_by_year":[{"year":2013,"cited_by_count":1}],"updated_date":"2026-11-05T12:25:35.769452","created_date":"2016-06-24T00:00:00"}