{"id":"https://openalex.org/W2058788538","doi":"https://doi.org/10.1117/12.846677","title":"16nm with 193nm immersion lithography and double exposure","display_name":"16nm with 193nm immersion lithography and double exposure","publication_year":2010,"publication_date":"2010-03-11","ids":{"openalex":"https://openalex.org/W2058788538","doi":"https://doi.org/10.1117/12.846677","mag":"2058788538"},"language":"en","primary_location":{"id":"doi:10.1117/12.846677","doi":"https://doi.org/10.1117/12.846677","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.846677","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5110497890","display_name":"Valery Axelrad","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210151112","display_name":"Sequoia (United States)","ror":"https://ror.org/05y5sz883","country_code":"US","type":"company","lineage":["https://openalex.org/I4210151112"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Valery Axelrad","raw_affiliation_strings":["Sequoia Design Systems, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sequoia Design Systems, Inc. (United States)","institution_ids":["https://openalex.org/I4210151112"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113576594","display_name":"Michael C. Smayling","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210147385","display_name":"Tela Innovations (United States)","ror":"https://ror.org/03wbd7629","country_code":"US","type":"company","lineage":["https://openalex.org/I4210147385"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Michael C. Smayling","raw_affiliation_strings":["Tela Innovations, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tela Innovations, Inc. (United States)","institution_ids":["https://openalex.org/I4210147385"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":3.8501,"has_fulltext":false,"cited_by_count":18,"citation_normalized_percentile":{"value":0.94493396,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"7641","issue":null,"first_page":"764109","last_page":"764109"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/193-nm-immersion-lithography","display_name":"193 nm immersion lithography","score":0.9620000123977661},{"id":"https://openalex.org/keywords/double-patterning","display_name":"double patterning","score":0.9599999785423279},{"id":"https://openalex.org/keywords/local-interconnects","display_name":"local interconnects","score":0.6480000019073486},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"optical proximity correction","score":0.6610000133514404},{"id":"https://openalex.org/keywords/critical-dimension-control","display_name":"critical dimension control","score":0.45100000500679016},{"id":"https://openalex.org/keywords/lens-aberrations","display_name":"lens aberrations","score":0.9139999747276306},{"id":"https://openalex.org/keywords/polarization-effects","display_name":"polarization effects","score":0.875},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.8569999933242798},{"id":"https://openalex.org/keywords/near-isogenic-lines","display_name":"near-isogenic lines","score":0.6850000023841858},{"id":"https://openalex.org/keywords/manufacturability","display_name":"manufacturability","score":0.5540000200271606}],"concepts":[{"id":"https://openalex.org/C62064638","wikidata":"https://www.wikidata.org/wiki/Q553878","display_name":"Design for manufacturability","level":2,"score":0.8848661780357361},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.8134558796882629},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.7214600443840027},{"id":"https://openalex.org/C2779751349","wikidata":"https://www.wikidata.org/wiki/Q1474480","display_name":"Scanner","level":2,"score":0.61649489402771},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5837030410766602},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.5496892333030701},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5379247665405273},{"id":"https://openalex.org/C199068039","wikidata":"https://www.wikidata.org/wiki/Q574523","display_name":"Immersion (mathematics)","level":2,"score":0.5320252776145935},{"id":"https://openalex.org/C134786449","wikidata":"https://www.wikidata.org/wiki/Q3391255","display_name":"Planar","level":2,"score":0.49265581369400024},{"id":"https://openalex.org/C15336307","wikidata":"https://www.wikidata.org/wiki/Q1766051","display_name":"Lens (geology)","level":2,"score":0.4833754897117615},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4808545708656311},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.4713938534259796},{"id":"https://openalex.org/C55020928","wikidata":"https://www.wikidata.org/wiki/Q3813865","display_name":"Image quality","level":3,"score":0.4652239978313446},{"id":"https://openalex.org/C123745756","wikidata":"https://www.wikidata.org/wiki/Q1665949","display_name":"Interconnection","level":2,"score":0.42932984232902527},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.4024242162704468},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.36291101574897766},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.350454181432724},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.3115236163139343},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.26463890075683594},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.23465868830680847},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.15302225947380066},{"id":"https://openalex.org/C121684516","wikidata":"https://www.wikidata.org/wiki/Q7600677","display_name":"Computer graphics (images)","level":1,"score":0.14671531319618225},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.12220394611358643},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.08339020609855652},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.07984066009521484},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.07252222299575806},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.846677","doi":"https://doi.org/10.1117/12.846677","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.846677","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2065951698","https://openalex.org/W2082542863","https://openalex.org/W2153147714"],"related_works":["https://openalex.org/W2084881922","https://openalex.org/W2153147714","https://openalex.org/W2025304056","https://openalex.org/W2094395317","https://openalex.org/W2095427590","https://openalex.org/W1976479623","https://openalex.org/W2064974897","https://openalex.org/W2058893466","https://openalex.org/W2068852572","https://openalex.org/W2022529271"],"abstract_inverted_index":{"Gridded":[0],"Design":[1],"Rules":[2],"(GDR)":[3],"in":[4,26,99,175],"combination":[5],"with":[6,16,53],"lines/":[7,22],"cuts":[8,38,83,129],"double":[9],"patterning":[10],"allow":[11],"imaging":[12],"of":[13,29,34,41,68,78,82,94,110,132,144],"16nm":[14],"designs":[15],"193nm":[17],"immersion":[18],"lithography.":[19],"Highly":[20],"regular":[21],"cut":[23,92,111],"patterns":[24,93,146],"result":[25],"the":[27,79,142,176],"existence":[28],"a":[30],"well-defined":[31],"optimal":[32],"set":[33],"lithographic":[35,116],"conditions.":[36],"Since":[37],"are":[39],"all":[40,128],"identical":[42],"shape":[43],"and":[44,84,88,96,155,159,167],"relatively":[45],"sparse,":[46],"good":[47],"image":[48,89],"quality":[49],"can":[50],"be":[51],"obtained":[52],"minimal":[54],"or":[55],"simplified":[56],"pattern":[57,86],"correction":[58],"(OPC":[59],"equivalent)":[60],"to":[61,74,126,147],"compensate":[62],"for":[63],"proximity":[64,148],"effects.":[65,149],"The":[66],"use":[67],"local":[69],"interconnect":[70],"(LI)":[71],"is":[72],"shown":[73],"offer":[75],"further":[76],"reduction":[77],"required":[80],"number":[81],"improves":[85],"uniformity":[87],"quality.":[90],"Critical":[91],"poly":[95],"M1":[97],"layers":[98],"selected":[100],"worst":[101],"case":[102],"standard":[103],"GDR":[104],"cells":[105],"were":[106,173],"considered.":[107],"Simultaneous":[108],"co-optimization":[109],"geometry":[112],"as":[113,115,119],"well":[114],"conditions":[117,139],"such":[118],"scanner":[120],"entrance":[121,164],"pupil":[122,165],"illumination":[123,166],"was":[124,151],"used":[125],"bring":[127],"within":[130],"~1nm":[131],"target":[133],"CDs":[134],"at":[135],"best":[136],"focus.":[137],"Optimized":[138],"significantly":[140],"reduced":[141],"sensitivity":[143],"printed":[145],"Manufacturability":[150],"verified":[152],"using":[153],"DOF":[154],"NILS":[156],"metrics":[157],"before":[158],"after":[160],"co-optimization.":[161],"Experimental":[162],"lens":[163,168],"aberrations":[169],"including":[170],"polarization":[171],"effects":[172],"included":[174],"analysis.":[177]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":5}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}