{"id":"https://openalex.org/W2058712705","doi":"https://doi.org/10.1149/1.2097354","title":"Effect of Photoresist on Plasma Etching","display_name":"Effect of Photoresist on Plasma Etching","publication_year":1989,"publication_date":"1989-08-01","ids":{"openalex":"https://openalex.org/W2058712705","doi":"https://doi.org/10.1149/1.2097354","mag":"2058712705"},"language":"en","primary_location":{"id":"doi:10.1149/1.2097354","doi":"https://doi.org/10.1149/1.2097354","is_oa":true,"landing_page_url":"https://doi.org/10.1149/1.2097354","pdf_url":"https://iopscience.iop.org/article/10.1149/1.2097354/pdf","source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://iopscience.iop.org/article/10.1149/1.2097354/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113497219","display_name":"Len Tsou","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"L. Y. Tsou","raw_affiliation_strings":["North American Philips Corporation, Philips Laboratories, Briarcliff Manor, New York 10510"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"North American Philips Corporation, Philips Laboratories, Briarcliff Manor, New York 10510","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":["https://openalex.org/A5113497219"],"corresponding_institution_ids":[],"apc_list":{"value":1950,"currency":"USD","value_usd":1950},"apc_paid":null,"fwci":0.9224,"has_fulltext":true,"cited_by_count":6,"citation_normalized_percentile":{"value":0.74483025,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"136","issue":"8","first_page":"2354","last_page":"2356"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9560999870300293,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9560999870300293,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.03440000116825104,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.0020000000949949026,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photoresist","display_name":"photoresist","score":0.8090000152587891},{"id":"https://openalex.org/keywords/plasma-etching","display_name":"plasma etching","score":0.9850000143051147},{"id":"https://openalex.org/keywords/polysilicon-etching","display_name":"polysilicon etching","score":0.8949999809265137},{"id":"https://openalex.org/keywords/silicon-dioxide-etching","display_name":"silicon dioxide etching","score":0.9980000257492065},{"id":"https://openalex.org/keywords/etch-rate","display_name":"etch rate","score":0.843999981880188},{"id":"https://openalex.org/keywords/loading-effects","display_name":"loading effects","score":0.9160000085830688},{"id":"https://openalex.org/keywords/oxide-mask","display_name":"oxide mask","score":0.6510000228881836}],"concepts":[{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.9879919290542603},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.7719434499740601},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7392020225524902},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7049977779388428},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5554291009902954},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.5404030680656433},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5211194157600403},{"id":"https://openalex.org/C107187091","wikidata":"https://www.wikidata.org/wiki/Q2392011","display_name":"Plasma etching","level":4,"score":0.5133287310600281},{"id":"https://openalex.org/C2779089622","wikidata":"https://www.wikidata.org/wiki/Q116269","display_name":"Silicon dioxide","level":2,"score":0.47358494997024536},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.443835586309433},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.312444806098938},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.19395864009857178},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.12073898315429688},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.11255970597267151},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1149/1.2097354","doi":"https://doi.org/10.1149/1.2097354","is_oa":true,"landing_page_url":"https://doi.org/10.1149/1.2097354","pdf_url":"https://iopscience.iop.org/article/10.1149/1.2097354/pdf","source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.1149/1.2097354","doi":"https://doi.org/10.1149/1.2097354","is_oa":true,"landing_page_url":"https://doi.org/10.1149/1.2097354","pdf_url":"https://iopscience.iop.org/article/10.1149/1.2097354/pdf","source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2058712705.pdf","grobid_xml":"https://content.openalex.org/works/W2058712705.grobid-xml"},"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2113489028","https://openalex.org/W2065354689","https://openalex.org/W1748382849","https://openalex.org/W2072343806","https://openalex.org/W2001927344","https://openalex.org/W1519747310","https://openalex.org/W2152635352","https://openalex.org/W2042226780","https://openalex.org/W2040730470","https://openalex.org/W1987680690"],"abstract_inverted_index":{"Etching":[0],"characteristics":[1],"of":[2,28,34,44,56,115],"polysilicon":[3,45,57,96],"and":[4],"silicon":[5],"dioxide":[6],"with":[7,31,59,66,98],"various":[8],"photoresist":[9,21,35,51,67,74],"coverages":[10],"have":[11,86],"been":[12],"investigated":[13],"to":[14,49,78],"reveal":[15],"the":[16,20,37,40,50,53,73,113],"role":[17],"played":[18],"by":[19,112],"in":[22,95],"chlorinated":[23,99],"plasma.":[24],"The":[25],"etch":[26,42,54],"rate":[27,43,55],"oxide":[29,60],"decreases":[30],"decreasing":[32],"coverage":[33],"on":[36],"wafer.":[38],"Although":[39],"nominal":[41],"is":[46,62,90,105,110],"not":[47],"sensitive":[48],"coverage,":[52],"patterned":[58],"mask":[61,104],"higher":[63],"than":[64],"that":[65,88],"mask.":[68],"Chlorocarbon":[69],"species":[70],"originated":[71],"from":[72],"erosion":[75],"are":[76],"speculated":[77],"be":[79],"responsible":[80],"for":[81],"these":[82],"behaviors.":[83],"Furthermore,":[84],"we":[85],"observed":[87],"there":[89],"a":[91,102,116],"strong":[92],"loading":[93],"effect":[94,109],"etching":[97],"plasma":[100],"if":[101],"nonerodible":[103],"used,":[106],"but":[107],"this":[108],"suppressed":[111],"presence":[114],"photoresist.":[117]},"counts_by_year":[],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}