{"id":"https://openalex.org/W2056277342","doi":"https://doi.org/10.1016/s0169-4332(02)00392-6","title":"Pulsed laser deposition of adherent hexagonal/cubic boron nitride layer systems at high growth rates","display_name":"Pulsed laser deposition of adherent hexagonal/cubic boron nitride layer systems at high growth rates","publication_year":2002,"publication_date":"2002-09-01","ids":{"openalex":"https://openalex.org/W2056277342","doi":"https://doi.org/10.1016/s0169-4332(02)00392-6","mag":"2056277342"},"language":"en","primary_location":{"id":"doi:10.1016/s0169-4332(02)00392-6","doi":"https://doi.org/10.1016/s0169-4332(02)00392-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0169-4332(02)00392-6","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5076761793","display_name":"Steffen Wei\u00dfmantel","orcid":"https://orcid.org/0000-0002-7240-996X","observed_orcids":["https://orcid.org/0000-0002-7240-996X"]},"institutions":[{"id":"https://openalex.org/I116397343","display_name":"Hochschule Mittweida","ror":"https://ror.org/024ga3r86","country_code":"DE","type":"education","lineage":["https://openalex.org/I116397343"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Steffen Wei\u00dfmantel","raw_affiliation_strings":["University of Applied Sciences, Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Applied Sciences, Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany","institution_ids":["https://openalex.org/I116397343"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113528494","display_name":"Guenter Reisse","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I116397343","display_name":"Hochschule Mittweida","ror":"https://ror.org/024ga3r86","country_code":"DE","type":"education","lineage":["https://openalex.org/I116397343"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"G\u00fcnter Rei\u00dfe","raw_affiliation_strings":["University of Applied Sciences, Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Applied Sciences, Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany","institution_ids":["https://openalex.org/I116397343"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I116397343"],"apc_list":{"value":3930,"currency":"USD","value_usd":3930},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":14,"citation_normalized_percentile":{"value":0.16972204,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"197-198","issue":null,"first_page":"331","last_page":"337"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11341","display_name":"Boron and Carbon Nanomaterials Research","score":0.7134000062942505,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11341","display_name":"Boron and Carbon Nanomaterials Research","score":0.7134000062942505,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.2660999894142151,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.010099999606609344,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cubic-boron-nitride","display_name":"cubic boron nitride","score":0.9390000104904175},{"id":"https://openalex.org/keywords/hexagonal-boron-nitride","display_name":"hexagonal boron nitride","score":0.9660000205039978},{"id":"https://openalex.org/keywords/krf-excimer-laser-ablation","display_name":"KrF excimer laser ablation","score":0.8370000123977661},{"id":"https://openalex.org/keywords/high-growth-rate","display_name":"high growth rate","score":0.6930000185966492},{"id":"https://openalex.org/keywords/thin-film-adhesion","display_name":"film adhesion","score":0.8230000138282776},{"id":"https://openalex.org/keywords/intermediate-layer","display_name":"intermediate layer","score":0.6499999761581421},{"id":"https://openalex.org/keywords/thin-film-stress","display_name":"film stress","score":0.5389999747276306},{"id":"https://openalex.org/keywords/hardness","display_name":"hardness","score":0.7789999842643738},{"id":"https://openalex.org/keywords/microstructure","display_name":"microstructure","score":0.6159999966621399},{"id":"https://openalex.org/keywords/tungsten-carbide-substrate","display_name":"tungsten carbide substrate","score":0.7820000052452087},{"id":"https://openalex.org/keywords/silicon-substrate","display_name":"silicon substrate","score":0.9829999804496765}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7070133090019226},{"id":"https://openalex.org/C2780243435","wikidata":"https://www.wikidata.org/wiki/Q410193","display_name":"Boron nitride","level":2,"score":0.657841145992279},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.6310766935348511},{"id":"https://openalex.org/C128765274","wikidata":"https://www.wikidata.org/wiki/Q663314","display_name":"Hexagonal crystal system","level":2,"score":0.5804216861724854},{"id":"https://openalex.org/C37982897","wikidata":"https://www.wikidata.org/wiki/Q901321","display_name":"Pulsed laser deposition","level":3,"score":0.5693539381027222},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.5634443163871765},{"id":"https://openalex.org/C2991998659","wikidata":"https://www.wikidata.org/wiki/Q410193","display_name":"Hexagonal boron nitride","level":3,"score":0.49205154180526733},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.4541574716567993},{"id":"https://openalex.org/C194760766","wikidata":"https://www.wikidata.org/wiki/Q410851","display_name":"Nitride","level":3,"score":0.4237293004989624},{"id":"https://openalex.org/C62960913","wikidata":"https://www.wikidata.org/wiki/Q1809389","display_name":"Layer by layer","level":3,"score":0.4143928587436676},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.3437228500843048},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.3424398899078369},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3097030520439148},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.2826530933380127},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2047254741191864},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.056218087673187256},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C30080830","wikidata":"https://www.wikidata.org/wiki/Q169917","display_name":"Graphene","level":2,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0169-4332(02)00392-6","doi":"https://doi.org/10.1016/s0169-4332(02)00392-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0169-4332(02)00392-6","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W2012257054","https://openalex.org/W2067624310","https://openalex.org/W2098787639","https://openalex.org/W2154900332","https://openalex.org/W2323072039"],"related_works":["https://openalex.org/W4230041345","https://openalex.org/W2012257054","https://openalex.org/W1965722977","https://openalex.org/W1972559167","https://openalex.org/W2105735342","https://openalex.org/W2154900332","https://openalex.org/W1974866460","https://openalex.org/W2107138273","https://openalex.org/W2098787639","https://openalex.org/W2005383512"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2014,"cited_by_count":3}],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}