{"id":"https://openalex.org/W2055464605","doi":"https://doi.org/10.1143/jjap.43.492","title":"Large-Scale Atomistic Modeling of Thermally Grown SiO2on Si(111) Substrate","display_name":"Large-Scale Atomistic Modeling of Thermally Grown SiO2on Si(111) Substrate","publication_year":2004,"publication_date":"2004-02-10","ids":{"openalex":"https://openalex.org/W2055464605","doi":"https://doi.org/10.1143/jjap.43.492","mag":"2055464605"},"language":"en","primary_location":{"id":"doi:10.1143/jjap.43.492","doi":"https://doi.org/10.1143/jjap.43.492","is_oa":false,"landing_page_url":"https://doi.org/10.1143/jjap.43.492","pdf_url":null,"source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5069341139","display_name":"Kosuke Tatsumura","orcid":"https://orcid.org/0000-0003-0511-443X","observed_orcids":["https://orcid.org/0000-0003-0511-443X"]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kosuke Tatsumura","raw_affiliation_strings":["School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-8555, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-8555, Japan","institution_ids":["https://openalex.org/I150744194"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045377347","display_name":"Takanobu Watanabe","orcid":"https://orcid.org/0000-0002-9421-8195","observed_orcids":["https://orcid.org/0000-0002-9421-8195"]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takanobu Watanabe","raw_affiliation_strings":["PRESTO, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi-shi, Saitama 322-0012, Japan","School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-8555, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"PRESTO, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi-shi, Saitama 322-0012, Japan","institution_ids":["https://openalex.org/I4210086780"]},{"raw_affiliation_string":"School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-8555, Japan","institution_ids":["https://openalex.org/I150744194"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110206762","display_name":"Daisuke Yamasaki","orcid":"https://orcid.org/0009-0002-9326-4138","observed_orcids":["https://orcid.org/0009-0002-9326-4138"]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Daisuke Yamasaki","raw_affiliation_strings":["School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-8555, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-8555, Japan","institution_ids":["https://openalex.org/I150744194"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056128134","display_name":"Takayoshi Shimura","orcid":"https://orcid.org/0000-0002-8859-7010","observed_orcids":["https://orcid.org/0000-0002-8859-7010"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takayoshi Shimura","raw_affiliation_strings":["Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita-shi, Osaka 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita-shi, Osaka 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109500546","display_name":"M. Umeno","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I125590103","display_name":"Fukui University of Technology","ror":"https://ror.org/01tm0rr86","country_code":"JP","type":"education","lineage":["https://openalex.org/I125590103"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masataka Umeno","raw_affiliation_strings":["Department of Management Science, Faculty of Engineering, Fukui University of Technology, 3-6-1 Gakuen, Fukui-shi, Fukui 910-8505, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Management Science, Faculty of Engineering, Fukui University of Technology, 3-6-1 Gakuen, Fukui-shi, Fukui 910-8505, Japan","institution_ids":["https://openalex.org/I125590103"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113626230","display_name":"Iwao Ohdomari","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Iwao Ohdomari","raw_affiliation_strings":["Kagami Memorial Laboratory for Materials Science and Technology, Waseda University, 2-8-26 Nishi-waseda, Shinjuku-ku, Tokyo 169-0051, Japan","School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-8555, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kagami Memorial Laboratory for Materials Science and Technology, Waseda University, 2-8-26 Nishi-waseda, Shinjuku-ku, Tokyo 169-0051, Japan","institution_ids":["https://openalex.org/I150744194"]},{"raw_affiliation_string":"School of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-8555, Japan","institution_ids":["https://openalex.org/I150744194"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2210,"currency":"USD","value_usd":2210},"apc_paid":null,"fwci":1.5829,"has_fulltext":false,"cited_by_count":17,"citation_normalized_percentile":{"value":0.83023039,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"43","issue":"2","first_page":"492","last_page":"497"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9491999745368958,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9491999745368958,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.006599999964237213,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12420","display_name":"Silicone and Siloxane Chemistry","score":0.006200000178068876,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/thermally-grown-sio2","display_name":"thermally grown SiO2","score":0.9570000171661377},{"id":"https://openalex.org/keywords/si-111-substrate","display_name":"Si(111) substrate","score":0.9490000009536743},{"id":"https://openalex.org/keywords/si-100-substrate","display_name":"Si(100) substrate","score":0.9020000100135803},{"id":"https://openalex.org/keywords/substrate-orientation-effects","display_name":"substrate orientation effects","score":0.6460000276565552},{"id":"https://openalex.org/keywords/si-sio2-interface","display_name":"Si/SiO2 interface","score":0.7170000076293945},{"id":"https://openalex.org/keywords/interfacial-stress","display_name":"interfacial stress","score":0.6389999985694885},{"id":"https://openalex.org/keywords/dangling-bonds","display_name":"dangling bonds","score":0.7540000081062317},{"id":"https://openalex.org/keywords/oxygen-insertion","display_name":"oxygen insertion","score":0.492000013589859}],"concepts":[{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.6863763928413391},{"id":"https://openalex.org/C32424582","wikidata":"https://www.wikidata.org/wiki/Q5216183","display_name":"Dangling bond","level":3,"score":0.6578789353370667},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5977206826210022},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.57976895570755},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.5744926929473877},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5313979387283325},{"id":"https://openalex.org/C58312451","wikidata":"https://www.wikidata.org/wiki/Q4817200","display_name":"Atom (system on chip)","level":2,"score":0.5306718945503235},{"id":"https://openalex.org/C66823137","wikidata":"https://www.wikidata.org/wiki/Q757568","display_name":"Atomic units","level":2,"score":0.5277512669563293},{"id":"https://openalex.org/C192157962","wikidata":"https://www.wikidata.org/wiki/Q4087243","display_name":"Bilayer","level":3,"score":0.48775917291641235},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.44140374660491943},{"id":"https://openalex.org/C2776029896","wikidata":"https://www.wikidata.org/wiki/Q3935810","display_name":"Relaxation (psychology)","level":2,"score":0.42678162455558777},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2891838848590851},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.14368638396263123},{"id":"https://openalex.org/C41625074","wikidata":"https://www.wikidata.org/wiki/Q176088","display_name":"Membrane","level":2,"score":0.07182148098945618},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.06765973567962646},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.06679517030715942},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C15744967","wikidata":"https://www.wikidata.org/wiki/Q9418","display_name":"Psychology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C77805123","wikidata":"https://www.wikidata.org/wiki/Q161272","display_name":"Social psychology","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C55493867","wikidata":"https://www.wikidata.org/wiki/Q7094","display_name":"Biochemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1143/jjap.43.492","doi":"https://doi.org/10.1143/jjap.43.492","is_oa":false,"landing_page_url":"https://doi.org/10.1143/jjap.43.492","pdf_url":null,"source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":10,"referenced_works":["https://openalex.org/W1972509915","https://openalex.org/W1976021383","https://openalex.org/W1982688805","https://openalex.org/W2003974290","https://openalex.org/W2007981259","https://openalex.org/W2047099409","https://openalex.org/W2049178509","https://openalex.org/W2069421474","https://openalex.org/W2077590866","https://openalex.org/W2502622051"],"related_works":["https://openalex.org/W2000044400","https://openalex.org/W2053393978","https://openalex.org/W2052245864","https://openalex.org/W1970959666","https://openalex.org/W2079624187","https://openalex.org/W2012616757","https://openalex.org/W2093762059","https://openalex.org/W802731835","https://openalex.org/W1998661075","https://openalex.org/W2081628506"],"abstract_inverted_index":{"Large-scale":[0],"SiO":[1,83,115,145,181,217],"2":[2,84,116,146,182,218],"/Si(111)":[3,147],"models":[4,14],"were":[5],"constructed":[6],"by":[7,87],"introducing":[8],"oxygen":[9,88],"atoms":[10],"in":[11,15,73,103,106,193,201],"c":[12,196],"-Si":[13],"an":[16],"atom-by-atom":[17],"manner.":[18],"Molecular":[19],"dynamics":[20],"calculation":[21],"at":[22,81],"a":[23,70,123,132,150,154],"constant":[24],"temperature":[25],"was":[26,59],"repeatedly":[27],"carried":[28],"out":[29],"for":[30,93,98,143],"the":[31,37,50,56,63,74,77,82,94,99,107,144,160,163,178,184,189,194,202,205,208,212,216,222],"growing":[32],"oxide":[33,57],"model.":[34],"By":[35],"comparing":[36],"oxidation":[38,96],"simulation":[39],"of":[40,45,52,66,113,135,159,199],"Si(111)":[41,75,95,118],"substrate":[42,47,53,223],"with":[43,153,170],"that":[44,127,177],"Si(001)":[46,100],"performed":[48],"previously,":[49],"influence":[51],"orientation":[54],"on":[55,117,128,157,221],"structure":[58,112],"discussed.":[60],"Owing":[61],"to":[62],"significant":[64],"feature":[65],"bonding":[67,108],"arrangement":[68],"within":[69,215],"Si":[71],"bilayer":[72],"substrate,":[76],"inherent":[78],"stress":[79],"induced":[80],"/Si":[85],"interface":[86],"insertions":[89],"is":[90],"originally":[91],"higher":[92],"than":[97,126],"oxidation,":[101],"resulting":[102,111],"frequent":[104],"changes":[105],"network.":[109],"The":[110,138],"bulk":[114],"has":[119],"less":[120],"strain":[121],"and":[122,165,207],"lower":[124],"density":[125],"Si(001),":[129],"but":[130],"involves":[131],"larger":[133],"number":[134],"dangling":[136],"bonds.":[137],"X-ray":[139],"diffraction":[140,151,174],"pattern":[141],"calculated":[142],"model":[148],"exhibits":[149],"peak":[152],"Laue-function-like":[155],"profile":[156],"each":[158],"crystal-truncation-rods":[161],"from":[162,188],"111":[164,166],"points,":[167],"agreeing":[168],"well":[169],"experimental":[171],"results.":[172],"These":[173],"peaks":[175],"indicate":[176],"thermally":[179],"grown":[180],"retains":[183],"residual":[185,213],"order":[186,214],"emanating":[187],"{111}":[190,209],"atomic":[191,210],"planes":[192],"original":[195],"-Si.":[197],"Because":[198],"differences":[200],"angles":[203],"between":[204],"surface":[206],"planes,":[211],"differs":[219],"depending":[220],"orientation.":[224]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}