{"id":"https://openalex.org/W2055095265","doi":"https://doi.org/10.1117/12.2011643","title":"Mask 3D effects and compensation for high NA EUV lithography","display_name":"Mask 3D effects and compensation for high NA EUV lithography","publication_year":2013,"publication_date":"2013-04-01","ids":{"openalex":"https://openalex.org/W2055095265","doi":"https://doi.org/10.1117/12.2011643","mag":"2055095265"},"language":"en","primary_location":{"id":"doi:10.1117/12.2011643","doi":"https://doi.org/10.1117/12.2011643","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2011643","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5085214620","display_name":"Sudharshanan Raghunathan","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I35662394","display_name":"GlobalFoundries (United States)","ror":"https://ror.org/02h0ps145","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Sudharshanan Raghunathan","raw_affiliation_strings":["GLOBALFOUNDRIES Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"GLOBALFOUNDRIES Inc. (United States)","institution_ids":["https://openalex.org/I35662394"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085826959","display_name":"Greg McIntyre","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Greg McIntyre","raw_affiliation_strings":["IBM Corp. (United States)","IBM Corporation, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Corp. (United States)","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Corporation, United States","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076956256","display_name":"Germain L. Fenger","orcid":"https://orcid.org/0000-0003-2448-0056","observed_orcids":["https://orcid.org/0000-0003-2448-0056"]},"institutions":[{"id":"https://openalex.org/I35662394","display_name":"GlobalFoundries (United States)","ror":"https://ror.org/02h0ps145","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Germain Fenger","raw_affiliation_strings":["GLOBALFOUNDRIES Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"GLOBALFOUNDRIES Inc. (United States)","institution_ids":["https://openalex.org/I35662394"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110545274","display_name":"Obert R. Wood","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I35662394","display_name":"GlobalFoundries (United States)","ror":"https://ror.org/02h0ps145","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Obert Wood","raw_affiliation_strings":["GLOBALFOUNDRIES Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"GLOBALFOUNDRIES Inc. (United States)","institution_ids":["https://openalex.org/I35662394"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":3.2582,"has_fulltext":false,"cited_by_count":27,"citation_normalized_percentile":{"value":0.92974541,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"8679","issue":null,"first_page":"867918","last_page":"867918"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.9210000038146973},{"id":"https://openalex.org/keywords/high-numerical-aperture","display_name":"high numerical aperture","score":0.8360000252723694},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"optical proximity correction","score":0.9710000157356262},{"id":"https://openalex.org/keywords/optical-magnification","display_name":"optical magnification","score":0.8500000238418579},{"id":"https://openalex.org/keywords/critical-dimension-control","display_name":"critical dimension control","score":0.6449999809265137},{"id":"https://openalex.org/keywords/overlay-control","display_name":"overlay control","score":0.8999999761581421}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9755140542984009},{"id":"https://openalex.org/C159108749","wikidata":"https://www.wikidata.org/wiki/Q898896","display_name":"Numerical aperture","level":3,"score":0.7643933296203613},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6752731204032898},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6621577739715576},{"id":"https://openalex.org/C14737013","wikidata":"https://www.wikidata.org/wiki/Q1319657","display_name":"Photomask","level":4,"score":0.651934802532196},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.5947399735450745},{"id":"https://openalex.org/C2780023022","wikidata":"https://www.wikidata.org/wiki/Q1338171","display_name":"Compensation (psychology)","level":2,"score":0.5858068466186523},{"id":"https://openalex.org/C192209626","wikidata":"https://www.wikidata.org/wiki/Q190909","display_name":"Focus (optics)","level":2,"score":0.5781049132347107},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5364341139793396},{"id":"https://openalex.org/C136085584","wikidata":"https://www.wikidata.org/wiki/Q910289","display_name":"Overlay","level":2,"score":0.519374668598175},{"id":"https://openalex.org/C78336883","wikidata":"https://www.wikidata.org/wiki/Q4779385","display_name":"Aperture (computer memory)","level":2,"score":0.4964011311531067},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.47963768243789673},{"id":"https://openalex.org/C2779751349","wikidata":"https://www.wikidata.org/wiki/Q1474480","display_name":"Scanner","level":2,"score":0.4200063943862915},{"id":"https://openalex.org/C2776401178","wikidata":"https://www.wikidata.org/wiki/Q12050496","display_name":"Feature (linguistics)","level":2,"score":0.4103417992591858},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.34420961141586304},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.27544349431991577},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.27475786209106445},{"id":"https://openalex.org/C24890656","wikidata":"https://www.wikidata.org/wiki/Q82811","display_name":"Acoustics","level":1,"score":0.11071184277534485},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.09652730822563171},{"id":"https://openalex.org/C6260449","wikidata":"https://www.wikidata.org/wiki/Q41364","display_name":"Wavelength","level":2,"score":0.0},{"id":"https://openalex.org/C11171543","wikidata":"https://www.wikidata.org/wiki/Q41630","display_name":"Psychoanalysis","level":1,"score":0.0},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.0},{"id":"https://openalex.org/C15744967","wikidata":"https://www.wikidata.org/wiki/Q9418","display_name":"Psychology","level":0,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2011643","doi":"https://doi.org/10.1117/12.2011643","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2011643","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2100507324","https://openalex.org/W2765342571","https://openalex.org/W2064289474","https://openalex.org/W7152649384","https://openalex.org/W7167473300","https://openalex.org/W2922506810","https://openalex.org/W1978234343","https://openalex.org/W4367296991","https://openalex.org/W4409655263","https://openalex.org/W4251354754"],"abstract_inverted_index":{"Mask":[0],"shadow":[1],"compensation":[2],"for":[3,45,59,78,101],"EUV":[4,63,107,172],"lithography":[5],"has":[6],"typically":[7],"been":[8],"performed":[9],"using":[10],"simple":[11],"rule-based":[12],"schemes":[13],"during":[14],"optical":[15,157],"proximity":[16],"correction":[17],"(OPC).":[18],"However,":[19],"as":[20,30],"feature":[21,36],"sizes":[22],"decrease,":[23],"the":[24,72,94,113,121,138],"required":[25,162],"corrections":[26],"get":[27],"more":[28,57],"complex":[29],"they":[31,132],"become":[32,55],"dependent":[33],"on":[34,71,86],"both":[35],"size":[37],"and":[38,74,80,92,124],"type.":[39],"Thus,":[40],"OPC":[41,99],"models":[42,54,100,118],"that":[43,112,128],"account":[44],"these":[46,88],"3D":[47,89,116],"mask":[48,73,90,117,149],"effects":[49,91,123],"are":[50,119,133],"becoming":[51],"essential.":[52],"These":[53],"even":[56],"important":[58],"higher":[60,104,169],"numerical":[61,105,170],"aperture":[62,106,171],"systems":[64],"due":[65],"to":[66,136,163],"larger":[67,156],"angles":[68],"of":[69,96,140,147],"incidence":[70],"tighter":[75,151],"process":[76],"budgets":[77],"CD":[79],"overlay.":[81],"This":[82],"paper":[83],"will":[84,159],"focus":[85,153],"estimating":[87],"evaluate":[93],"extendibility":[95],"current":[97,114],"available":[98,115],"some":[102],"specific":[103],"systems.":[108,173],"It":[109],"is":[110,126],"concluded":[111],"capturing":[120],"primary":[122],"it":[125],"believed":[127],"with":[129,168],"further":[130],"refinement":[131],"likely":[134,160],"extendable":[135],"meet":[137],"needs":[139],"future":[141],"high-NA":[142],"tools.":[143],"Additionally,":[144],"a":[145],"combination":[146],"thinner":[148],"absorber,":[150],"scanner":[152],"control":[154],"and/or":[155],"magnification":[158],"be":[161],"print":[164],"sub-30nm":[165],"pitch":[166],"structures":[167]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":4},{"year":2020,"cited_by_count":3},{"year":2018,"cited_by_count":3},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":4},{"year":2013,"cited_by_count":1}],"updated_date":"2026-10-26T11:51:55.731654","created_date":"2016-06-24T00:00:00"}