{"id":"https://openalex.org/W2054838641","doi":"https://doi.org/10.1117/12.872967","title":"Full-wafer thermal imaging in ultrahigh epitaxy tools","display_name":"Full-wafer thermal imaging in ultrahigh epitaxy tools","publication_year":2010,"publication_date":"2010-06-17","ids":{"openalex":"https://openalex.org/W2054838641","doi":"https://doi.org/10.1117/12.872967","mag":"2054838641"},"language":"en","primary_location":{"id":"doi:10.1117/12.872967","doi":"https://doi.org/10.1117/12.872967","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.872967","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5021348728","display_name":"Bernard Paquette","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135117807","display_name":"Universit\u00e9 de Sherbrooke","ror":"https://ror.org/00kybxq39","country_code":"CA","type":"education","lineage":["https://openalex.org/I135117807"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Bernard Paquette","raw_affiliation_strings":["Univ. de Sherbrooke (Canada)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. de Sherbrooke (Canada)","institution_ids":["https://openalex.org/I135117807"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5031878894","display_name":"Andr\u00e9 Fekecs","orcid":"https://orcid.org/0000-0001-7191-2988","observed_orcids":["https://orcid.org/0000-0001-7191-2988"]},"institutions":[{"id":"https://openalex.org/I135117807","display_name":"Universit\u00e9 de Sherbrooke","ror":"https://ror.org/00kybxq39","country_code":"CA","type":"education","lineage":["https://openalex.org/I135117807"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Andr\u00e9 Fekecs","raw_affiliation_strings":["Univ. de Sherbrooke (Canada)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. de Sherbrooke (Canada)","institution_ids":["https://openalex.org/I135117807"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069543112","display_name":"Badii Gsib","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135117807","display_name":"Universit\u00e9 de Sherbrooke","ror":"https://ror.org/00kybxq39","country_code":"CA","type":"education","lineage":["https://openalex.org/I135117807"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Badii Gsib","raw_affiliation_strings":["Univ. de Sherbrooke (Canada)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. de Sherbrooke (Canada)","institution_ids":["https://openalex.org/I135117807"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000321811","display_name":"Hubert Pelletier","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135117807","display_name":"Universit\u00e9 de Sherbrooke","ror":"https://ror.org/00kybxq39","country_code":"CA","type":"education","lineage":["https://openalex.org/I135117807"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Hubert Pelletier","raw_affiliation_strings":["Univ. de Sherbrooke (Canada)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. de Sherbrooke (Canada)","institution_ids":["https://openalex.org/I135117807"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5016613191","display_name":"Richard Ar\u00e8s","orcid":"https://orcid.org/0000-0001-7697-9735","observed_orcids":["https://orcid.org/0000-0001-7697-9735"]},"institutions":[{"id":"https://openalex.org/I135117807","display_name":"Universit\u00e9 de Sherbrooke","ror":"https://ror.org/00kybxq39","country_code":"CA","type":"education","lineage":["https://openalex.org/I135117807"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"Richard Ar\u00e8s","raw_affiliation_strings":["Univ. de Sherbrooke (Canada)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. de Sherbrooke (Canada)","institution_ids":["https://openalex.org/I135117807"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I135117807"],"apc_list":null,"apc_paid":null,"fwci":1.4794,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.78447805,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"7750","issue":null,"first_page":"77500O","last_page":"77500O"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11856","display_name":"Thermography and Photoacoustic Techniques","score":0.67330002784729,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11856","display_name":"Thermography and Photoacoustic Techniques","score":0.67330002784729,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":0.10830000042915344,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12019","display_name":"Calibration and Measurement Techniques","score":0.04529999941587448,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/infrared-thermography","display_name":"infrared thermography","score":0.828000009059906},{"id":"https://openalex.org/keywords/gaas-wafers","display_name":"GaAs wafers","score":0.7950000166893005},{"id":"https://openalex.org/keywords/epitaxial-growth","display_name":"epitaxial growth","score":0.718999981880188},{"id":"https://openalex.org/keywords/surface-temperature-distribution","display_name":"surface temperature distribution","score":0.8399999737739563},{"id":"https://openalex.org/keywords/radial-temperature-profile","display_name":"radial temperature profile","score":0.9819999933242798},{"id":"https://openalex.org/keywords/ultra-high-vacuum","display_name":"ultrahigh vacuum","score":0.5360000133514404}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.9013025760650635},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7356868982315063},{"id":"https://openalex.org/C162307627","wikidata":"https://www.wikidata.org/wiki/Q204833","display_name":"Enhanced Data Rates for GSM Evolution","level":2,"score":0.5743248462677002},{"id":"https://openalex.org/C72293138","wikidata":"https://www.wikidata.org/wiki/Q909741","display_name":"Temperature measurement","level":2,"score":0.5683149695396423},{"id":"https://openalex.org/C2779698641","wikidata":"https://www.wikidata.org/wiki/Q5309","display_name":"Graphite","level":2,"score":0.5661255717277527},{"id":"https://openalex.org/C125287762","wikidata":"https://www.wikidata.org/wiki/Q1758948","display_name":"Absorption (acoustics)","level":2,"score":0.47473961114883423},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4719611406326294},{"id":"https://openalex.org/C134132462","wikidata":"https://www.wikidata.org/wiki/Q45621","display_name":"Ceramic","level":2,"score":0.4687405228614807},{"id":"https://openalex.org/C204530211","wikidata":"https://www.wikidata.org/wiki/Q752823","display_name":"Thermal","level":2,"score":0.4531169831752777},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.41231316328048706},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.20546835660934448},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1006331741809845},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0706942081451416},{"id":"https://openalex.org/C153294291","wikidata":"https://www.wikidata.org/wiki/Q25261","display_name":"Meteorology","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.872967","doi":"https://doi.org/10.1117/12.872967","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.872967","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2074188722","https://openalex.org/W2041615145","https://openalex.org/W4242483013","https://openalex.org/W2966249343","https://openalex.org/W2151892686","https://openalex.org/W2140471789","https://openalex.org/W2974865239","https://openalex.org/W7099167959","https://openalex.org/W2094324863","https://openalex.org/W2781882601"],"abstract_inverted_index":{"The":[0,29,50],"surface":[1,69],"temperature":[2,77,102],"distribution":[3],"of":[4,31,70,88,94,103],"a":[5,15,42,75,80,86,100,119,134,141,154],"GaAs":[6],"wafer,":[7],"heated":[8],"under":[9],"vacuum,":[10],"has":[11],"been":[12],"measured":[13],"using":[14],"digital":[16],"camera.":[17],"A":[18,92],"method":[19],"is":[20,35,97,116,130,143,151],"proposed":[21,144],"to":[22,56,118],"remove":[23],"parasitic":[24],"signals":[25],"from":[26,45,62],"the":[27,32,39,59,63,67,71,89,110,124,147],"image.":[28],"accuracy":[30],"thermal":[33,51],"image":[34],"validated":[36],"by":[37,126,153],"comparing":[38],"results":[40],"with":[41,79,109,133],"separate":[43],"measurement":[44],"absorption":[46],"band-edge":[47],"spectroscopy":[48],"(ABES).":[49],"imaging":[52],"data":[53],"are":[54],"observed":[55,98],"be":[57],"within":[58],"experimental":[60],"error":[61],"ABES":[64],"technique":[65],"for":[66,99],"entire":[68],"wafer.":[72],"We":[73],"observe":[74],"radial":[76],"profile":[78],"center-to-edge":[81],"difference":[82,93,107],"that":[83,114],"varies":[84],"as":[85],"function":[87],"central":[90,101],"temperature.":[91],"25":[95],"\u00b0C":[96],"565":[104],"\u00b0C.":[105],"This":[106],"increases":[108],"wafer":[111,125,149],"temperature,":[112],"confirming":[113],"it":[115],"due":[117],"net":[120],"heat":[121],"flux":[122],"escaping":[123],"its":[127],"edge,":[128],"which":[129,146],"in":[131,145],"contact":[132],"graphite":[135,148],"holder.":[136],"Based":[137],"on":[138],"these":[139],"results,":[140],"solution":[142],"holder":[150],"replaced":[152],"ceramic":[155],"version.":[156]},"counts_by_year":[],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2016-06-24T00:00:00"}