{"id":"https://openalex.org/W2054130612","doi":"https://doi.org/10.1117/12.436855","title":"Image collapse issues in photoresist","display_name":"Image collapse issues in photoresist","publication_year":2001,"publication_date":"2001-08-24","ids":{"openalex":"https://openalex.org/W2054130612","doi":"https://doi.org/10.1117/12.436855","mag":"2054130612"},"language":"en","primary_location":{"id":"doi:10.1117/12.436855","doi":"https://doi.org/10.1117/12.436855","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.436855","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"John P. Simons","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"John P. Simons","raw_affiliation_strings":["IBM Thomas J. Watson Research Ctr. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Ctr. (United States)","institution_ids":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053836824","display_name":"Dar\u0131\u0301o L. Goldfarb","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Dario L. Goldfarb","raw_affiliation_strings":["IBM Thomas J. Watson Research Ctr. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Ctr. (United States)","institution_ids":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5022984117","display_name":"Marie Angelopoulos","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},{"id":"https://openalex.org/I4210114115","display_name":"IBM Research - Thomas J. Watson Research Center","ror":"https://ror.org/0265w5591","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Marie Angelopoulos","raw_affiliation_strings":["IBM Thomas J. Watson Research Ctr. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Thomas J. Watson Research Ctr. (United States)","institution_ids":["https://openalex.org/I1341412227","https://openalex.org/I4210114115"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086902116","display_name":"Scott Messick","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Scott Messick","raw_affiliation_strings":["IBM Microelectronics, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, United States","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085356663","display_name":"Wayne M. Moreau","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Wayne M. Moreau","raw_affiliation_strings":["IBM Microelectronics, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, United States","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000648147","display_name":"Chris Robinson","orcid":"https://orcid.org/0009-0003-3107-3157","observed_orcids":["https://orcid.org/0009-0003-3107-3157","https://orcid.org/0009-0000-7093-7024"]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Chris Robinson","raw_affiliation_strings":["IBM Microelectronics, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Microelectronics, United States","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Juan J. de Pablo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135310074","display_name":"University of Wisconsin\u2013Madison","ror":"https://ror.org/01y2jtd41","country_code":"US","type":"education","lineage":["https://openalex.org/I135310074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Juan J. de Pablo","raw_affiliation_strings":["Univ. of Wisconsin/Madison (United States)","University of Wisconsin - Madison, United States;"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Wisconsin/Madison (United States)","institution_ids":["https://openalex.org/I135310074"]},{"raw_affiliation_string":"University of Wisconsin - Madison, United States;","institution_ids":["https://openalex.org/I135310074"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5018918501","display_name":"Paul F. Nealey","orcid":"https://orcid.org/0000-0003-3889-142X","observed_orcids":["https://orcid.org/0000-0003-3889-142X"]},"institutions":[{"id":"https://openalex.org/I135310074","display_name":"University of Wisconsin\u2013Madison","ror":"https://ror.org/01y2jtd41","country_code":"US","type":"education","lineage":["https://openalex.org/I135310074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Paul F. Nealey","raw_affiliation_strings":["Univ. of Wisconsin/Madison (United States)","University of Wisconsin - Madison, United States;"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Wisconsin/Madison (United States)","institution_ids":["https://openalex.org/I135310074"]},{"raw_affiliation_string":"University of Wisconsin - Madison, United States;","institution_ids":["https://openalex.org/I135310074"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":4.6337,"has_fulltext":false,"cited_by_count":22,"citation_normalized_percentile":{"value":0.94597342,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"4345","issue":null,"first_page":"19","last_page":"19"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photoresist","display_name":"photoresist","score":0.9399999976158142},{"id":"https://openalex.org/keywords/surface-tension","display_name":"surface tension","score":0.7149999737739563},{"id":"https://openalex.org/keywords/surfactants","display_name":"surfactants","score":0.7960000038146973},{"id":"https://openalex.org/keywords/supercritical-co2-drying","display_name":"supercritical CO2 drying","score":0.7699999809265137},{"id":"https://openalex.org/keywords/emulsification","display_name":"emulsification","score":0.7680000066757202},{"id":"https://openalex.org/keywords/arf-resist","display_name":"ArF resist","score":0.6840000152587891},{"id":"https://openalex.org/keywords/negative-tone-resist","display_name":"negative resist","score":0.9670000076293945},{"id":"https://openalex.org/keywords/interfacial-tension","display_name":"interfacial tension","score":0.7120000123977661},{"id":"https://openalex.org/keywords/high-aspect-ratio-features","display_name":"high aspect ratio features","score":0.6050000190734863}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9475498199462891},{"id":"https://openalex.org/C8892853","wikidata":"https://www.wikidata.org/wiki/Q170749","display_name":"Surface tension","level":2,"score":0.8337076902389526},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.7705541849136353},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6570391654968262},{"id":"https://openalex.org/C58226133","wikidata":"https://www.wikidata.org/wiki/Q1324199","display_name":"Pulmonary surfactant","level":2,"score":0.509859025478363},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.47812262177467346},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.4614298343658447},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.43844494223594666},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3382980525493622},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2503419518470764},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.12085187435150146},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.436855","doi":"https://doi.org/10.1117/12.436855","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.436855","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2048137038","https://openalex.org/W2071980018","https://openalex.org/W2071414888","https://openalex.org/W2073957517","https://openalex.org/W2040507186","https://openalex.org/W2043829963","https://openalex.org/W2014880400","https://openalex.org/W2038739036","https://openalex.org/W1964446803","https://openalex.org/W2279826246"],"abstract_inverted_index":{"The":[0,21],"continued":[1],"shrinkage":[2],"of":[3,13,17,23,46,90,111,120,134,144,151,174,179,196,212,236,239],"line":[4],"widths":[5],"below":[6],"150nm":[7],"has":[8],"not":[9],"been":[10,167],"without":[11],"concerns":[12],"the":[14,18,24,44,58,65,86,91,103,108,112,117,121,131,135,141,145,152,171,177,193,209],"mechanical":[15,109],"stability":[16,110],"resist":[19,26,78,113,162,165,223],"structure.":[20],"development":[22,45],"exposed":[25],"undergoes":[27],"many":[28],"phase":[29,59],"changes":[30,60],"such":[31],"as":[32,229],"solid":[33],"solubilization":[34],"into":[35],"a":[36,185,233],"liquid":[37,147],"followed":[38,181,205],"by":[39,41,139,149,182,198,206],"drying":[40,183,207],"volatilization.":[42],"In":[43],"features":[47],"especially":[48],"with":[49,202],"aspect":[50,217],"ratio":[51,218],"(AR)":[52],">3":[53],"and":[54,67,160,163],"for":[55],"lines/spaces":[56],"(l/s)<1:2,":[57],"create":[61],"interfacial":[62],"tensions":[63],"at":[64,220],"liquid/solid":[66],"gas/liquid/solid":[68],"surfaces":[69],"that":[70],"can":[71,214,231],"cause":[72],"image":[73],"collapse":[74,83],"(IC).":[75],"Aqueous":[76],"based":[77],"are":[79,105,224],"particularly":[80],"susceptible":[81],"to":[82,85,99,106,115,129,156,227],"due":[84],"high":[87,216],"surface":[88,118,132,142,172],"tension":[89,119,133,143,173],"rinse":[92,137,146,153,175],"water":[93,136,154,197],"(72":[94],"mN/m).":[95],"Two":[96],"major":[97],"steps":[98],"reduce":[100,116,130,170],"or":[101,114,148,200],"eliminate":[102],"IC":[104],"strengthen":[107],"drying/rinse":[122],"liquid.":[123],"We":[124],"have":[125,166],"investigated":[126],"various":[127],"methods":[128],"either":[138],"lowering":[140],"removal":[150,195],"prior":[155,194],"drying.":[157],"Positive":[158],"ArF":[159],"KrF":[161],"negative":[164],"investigated.":[168],"To":[169],"liquid,":[176],"addition":[178],"surfactant":[180],"is":[184],"direct":[186],"method":[187],"which":[188],"may":[189],"be":[190],"used.":[191],"Indirectly,":[192],"solvents":[199,238],"emulsification":[201],"inert":[203],"components":[204],"in":[208],"supercritical":[210],"fluid":[211],"CO2":[213,240],"maintain":[215],"images":[219],"AR>3.":[221],"Negative":[222],"more":[225],"applicable":[226],"process":[228],"they":[230],"tolerate":[232],"wider":[234],"variety":[235],"co-":[237],"phillic":[241],"surfactants.":[242]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2018,"cited_by_count":2},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}