{"id":"https://openalex.org/W2053364769","doi":"https://doi.org/10.1243/14644207jmda48","title":"Electroplating of CoNiMnP-based permanent magnet and its application in bidirectionally actuated micro-electro-mechanical systems","display_name":"Electroplating of CoNiMnP-based permanent magnet and its application in bidirectionally actuated micro-electro-mechanical systems","publication_year":2006,"publication_date":"2006-07-01","ids":{"openalex":"https://openalex.org/W2053364769","doi":"https://doi.org/10.1243/14644207jmda48","mag":"2053364769"},"language":"en","primary_location":{"id":"doi:10.1243/14644207jmda48","doi":"https://doi.org/10.1243/14644207jmda48","is_oa":false,"landing_page_url":"https://doi.org/10.1243/14644207jmda48","pdf_url":null,"source":{"id":"https://openalex.org/S986594421","display_name":"Proceedings of the Institution of Mechanical Engineers Part L Journal of Materials Design and Applications","issn_l":"1464-4207","issn":["1464-4207","2041-3076"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","norway-1","poland-40","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320017","host_organization_name":"SAGE Publishing","host_organization_lineage":["https://openalex.org/P4310320017"],"host_organization_lineage_names":["SAGE Publishing"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the Institution of Mechanical Engineers, Part L: Journal of Materials: Design and Applications","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5011865422","display_name":"Yufeng Su","orcid":"https://orcid.org/0000-0003-1675-1776","observed_orcids":["https://orcid.org/0000-0003-1675-1776"]},"institutions":[{"id":"https://openalex.org/I183067930","display_name":"Shanghai Jiao Tong University","ror":"https://ror.org/0220qvk04","country_code":"CN","type":"education","lineage":["https://openalex.org/I183067930"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Y Su","raw_affiliation_strings":["National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","institution_ids":[]},{"raw_affiliation_string":"Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China","institution_ids":["https://openalex.org/I183067930"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076251475","display_name":"Haoxin Wang","orcid":"https://orcid.org/0009-0000-9360-6084","observed_orcids":["https://orcid.org/0009-0000-9360-6084"]},"institutions":[{"id":"https://openalex.org/I183067930","display_name":"Shanghai Jiao Tong University","ror":"https://ror.org/0220qvk04","country_code":"CN","type":"education","lineage":["https://openalex.org/I183067930"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"H Wang","raw_affiliation_strings":["National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","institution_ids":[]},{"raw_affiliation_string":"Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China","institution_ids":["https://openalex.org/I183067930"]}]},{"author_position":"middle","author":{"id":null,"display_name":"G Ding","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I183067930","display_name":"Shanghai Jiao Tong University","ror":"https://ror.org/0220qvk04","country_code":"CN","type":"education","lineage":["https://openalex.org/I183067930"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"G Ding","raw_affiliation_strings":["National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","institution_ids":[]},{"raw_affiliation_string":"Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China","institution_ids":["https://openalex.org/I183067930"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100746912","display_name":"Feng Cui","orcid":"https://orcid.org/0009-0009-9617-9124","observed_orcids":["https://orcid.org/0009-0009-9617-9124"]},"institutions":[{"id":"https://openalex.org/I183067930","display_name":"Shanghai Jiao Tong University","ror":"https://ror.org/0220qvk04","country_code":"CN","type":"education","lineage":["https://openalex.org/I183067930"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"F Cui","raw_affiliation_strings":["National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","institution_ids":[]},{"raw_affiliation_string":"Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China","institution_ids":["https://openalex.org/I183067930"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100385514","display_name":"Wenjie Zhang","orcid":"https://orcid.org/0000-0002-7753-695X","observed_orcids":["https://orcid.org/0000-0002-7753-695X","https://orcid.org/0009-0006-7757-6536","https://orcid.org/0009-0007-2231-4253"]},"institutions":[{"id":"https://openalex.org/I183067930","display_name":"Shanghai Jiao Tong University","ror":"https://ror.org/0220qvk04","country_code":"CN","type":"education","lineage":["https://openalex.org/I183067930"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"W Zhang","raw_affiliation_strings":["National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","institution_ids":[]},{"raw_affiliation_string":"Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China","institution_ids":["https://openalex.org/I183067930"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101827050","display_name":"Wenyuan Chen","orcid":"https://orcid.org/0000-0002-0973-5922","observed_orcids":["https://orcid.org/0000-0002-0973-5922"]},"institutions":[{"id":"https://openalex.org/I183067930","display_name":"Shanghai Jiao Tong University","ror":"https://ror.org/0220qvk04","country_code":"CN","type":"education","lineage":["https://openalex.org/I183067930"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"W Chen","raw_affiliation_strings":["National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Micro Fabrication Technology of Ministry of Education, Shanghai, People's Republic of China","institution_ids":[]},{"raw_affiliation_string":"Research Institute of Micro/nano Science and Technology, Shanghai Jiao Tong University, Shanghai, People's Republic of China","institution_ids":["https://openalex.org/I183067930"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I183067930"],"apc_list":{"value":4150,"currency":"USD","value_usd":4150},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.17227484,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"220","issue":"3","first_page":"139","last_page":"145"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11782","display_name":"Magnetic Properties of Alloys","score":0.8701000213623047,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11782","display_name":"Magnetic Properties of Alloys","score":0.8701000213623047,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.06769999861717224,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11222","display_name":"Magnetic Properties and Applications","score":0.03020000085234642,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electroplating","display_name":"electroplating","score":0.9279999732971191},{"id":"https://openalex.org/keywords/vertical-magnetic-anisotropy","display_name":"vertical magnetic anisotropy","score":0.8209999799728394},{"id":"https://openalex.org/keywords/chloride-electrolyte","display_name":"chloride electrolyte","score":0.5740000009536743},{"id":"https://openalex.org/keywords/sulfate-electrolyte","display_name":"sulfate electrolyte","score":0.9940000176429749},{"id":"https://openalex.org/keywords/coercivity","display_name":"coercivity","score":0.7749999761581421},{"id":"https://openalex.org/keywords/remanent-magnetization","display_name":"remanent magnetization","score":0.8700000047683716},{"id":"https://openalex.org/keywords/magnetic-energy-density","display_name":"magnetic energy density","score":0.8600000143051147},{"id":"https://openalex.org/keywords/stress-suppression","display_name":"stress suppression","score":0.625},{"id":"https://openalex.org/keywords/microelectromechanical-systems","display_name":"microelectromechanical systems","score":0.7929999828338623},{"id":"https://openalex.org/keywords/micropumps","display_name":"micropumps","score":0.7749999761581421},{"id":"https://openalex.org/keywords/microswitches","display_name":"microswitches","score":0.9300000071525574},{"id":"https://openalex.org/keywords/microgripper","display_name":"microgripper","score":0.8569999933242798},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.8579999804496765}],"concepts":[{"id":"https://openalex.org/C51807945","wikidata":"https://www.wikidata.org/wiki/Q3503392","display_name":"Electroplating","level":3,"score":0.8048678040504456},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7482579946517944},{"id":"https://openalex.org/C155058782","wikidata":"https://www.wikidata.org/wiki/Q66468430","display_name":"Remanence","level":4,"score":0.7146443724632263},{"id":"https://openalex.org/C16389437","wikidata":"https://www.wikidata.org/wiki/Q11421","display_name":"Magnet","level":2,"score":0.6633340120315552},{"id":"https://openalex.org/C126530901","wikidata":"https://www.wikidata.org/wiki/Q432635","display_name":"Coercivity","level":2,"score":0.5821282267570496},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.46700796484947205},{"id":"https://openalex.org/C115260700","wikidata":"https://www.wikidata.org/wiki/Q11408","display_name":"Magnetic field","level":2,"score":0.44740867614746094},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.4067080318927765},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2579977810382843},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.19734731316566467},{"id":"https://openalex.org/C32546565","wikidata":"https://www.wikidata.org/wiki/Q856711","display_name":"Magnetization","level":3,"score":0.14587974548339844},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1243/14644207jmda48","doi":"https://doi.org/10.1243/14644207jmda48","is_oa":false,"landing_page_url":"https://doi.org/10.1243/14644207jmda48","pdf_url":null,"source":{"id":"https://openalex.org/S986594421","display_name":"Proceedings of the Institution of Mechanical Engineers Part L Journal of Materials Design and Applications","issn_l":"1464-4207","issn":["1464-4207","2041-3076"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","norway-1","poland-40","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320017","host_organization_name":"SAGE Publishing","host_organization_lineage":["https://openalex.org/P4310320017"],"host_organization_lineage_names":["SAGE Publishing"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Proceedings of the Institution of Mechanical Engineers, Part L: Journal of Materials: Design and Applications","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":11,"referenced_works":["https://openalex.org/W1987717562","https://openalex.org/W2012155033","https://openalex.org/W2081293496","https://openalex.org/W2084494033","https://openalex.org/W2108814423","https://openalex.org/W2111487050","https://openalex.org/W2143791867","https://openalex.org/W2154862646","https://openalex.org/W2158344354","https://openalex.org/W2169961740","https://openalex.org/W2534257540"],"related_works":["https://openalex.org/W2172144890","https://openalex.org/W2158344354","https://openalex.org/W2386305368","https://openalex.org/W1940947314","https://openalex.org/W2117112020","https://openalex.org/W2389014052","https://openalex.org/W1987717562","https://openalex.org/W2051076157","https://openalex.org/W2389068939","https://openalex.org/W2108545056"],"abstract_inverted_index":{"This":[0],"article":[1],"reports":[2],"the":[3,28,41,51,87,91,94,98,102,105],"preparation":[4],"and":[5,15,26,64,89,97,134],"characterization":[6],"of":[7,57,61,69,104],"CoNiMnP-based":[8,117],"permanent":[9,118],"magnetic":[10,33,48,53,66,119],"material":[11,120],"using":[12],"various":[13],"sulphate":[14],"chloride":[16,44],"solutions":[17],"under":[18,24,46],"different":[19],"conditions.":[20],"Five":[21],"samples":[22,30],"are":[23],"study,":[25],"all":[27],"five":[29],"show":[31],"vertical":[32],"anisotropy,":[34],"among":[35],"which":[36],"sample":[37],"5":[38],"electroplated":[39,95,106,116],"from":[40],"low":[42],"concentration":[43],"solution":[45],"external":[47],"field":[49],"demonstrates":[50],"best":[52],"properties":[54],"with":[55],"coercivity":[56],"2632":[58],"Oe,":[59],"remanence":[60],"0.2":[62],"T,":[63],"maximum":[65],"energy":[67],"density":[68],"10.185":[70],"kJ/m":[71],"3":[72],".":[73],"Experiments":[74],"indicate":[75],"that":[76],"an":[77],"array":[78],"structure":[79],"rather":[80],"than":[81],"a":[82],"monolithic":[83],"plate":[84],"can":[85],"suppress":[86],"stress":[88],"enhance":[90],"adhesion":[92],"between":[93],"layer":[96],"seed":[99],"layer.":[100],"Furthermore,":[101],"resistivity":[103],"CoNiMnP":[107],"is":[108],"measured":[109],"as":[110,131],"160\u2013200":[111],"\u03bc\u03c9":[112],"cm.":[113],"The":[114],"low-stress":[115],"has":[121],"potential":[122],"for":[123],"bidirectional":[124],"actuators":[125],"in":[126],"micro-electro-mechanical":[127],"system":[128],"applications":[129],"such":[130],"micropump,":[132],"microswitch,":[133],"microgripper.":[135]},"counts_by_year":[],"updated_date":"2026-10-14T16:39:01.820549","created_date":"2016-06-24T00:00:00"}