{"id":"https://openalex.org/W2051025720","doi":"https://doi.org/10.1116/1.4843515","title":"Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode","display_name":"Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode","publication_year":2013,"publication_date":"2013-12-12","ids":{"openalex":"https://openalex.org/W2051025720","doi":"https://doi.org/10.1116/1.4843515","mag":"2051025720"},"language":"en","primary_location":{"id":"doi:10.1116/1.4843515","doi":"https://doi.org/10.1116/1.4843515","is_oa":true,"landing_page_url":"https://doi.org/10.1116/1.4843515","pdf_url":"https://avs.scitation.org/doi/pdf/10.1116/1.4843515","source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://avs.scitation.org/doi/pdf/10.1116/1.4843515","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5005196297","display_name":"J. Pointet","orcid":"https://orcid.org/0000-0001-9763-8219","observed_orcids":["https://orcid.org/0000-0001-9763-8219"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]},{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"John Pointet","raw_affiliation_strings":["Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745","https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080903360","display_name":"P. Gonon","orcid":"https://orcid.org/0000-0003-1784-7649","observed_orcids":["https://orcid.org/0000-0003-1784-7649"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]},{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Patrice Gonon","raw_affiliation_strings":["Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745","https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073800402","display_name":"Laurence Latu-Romain","orcid":"https://orcid.org/0000-0002-9422-9636","observed_orcids":["https://orcid.org/0000-0002-9422-9636"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]},{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Lawrence Latu-Romain","raw_affiliation_strings":["Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745","https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5021038334","display_name":"A. Bsiesy","orcid":"https://orcid.org/0000-0001-6504-8740","observed_orcids":["https://orcid.org/0000-0001-6504-8740"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]},{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Ahmad Bsiesy","raw_affiliation_strings":["Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745","https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5049537110","display_name":"C. Vall\u00e9e","orcid":"https://orcid.org/0000-0002-9324-2345","observed_orcids":["https://orcid.org/0000-0002-9324-2345"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]},{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Christophe Vall\u00e9e","raw_affiliation_strings":["Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Microelectronics Technology Laboratory (LTM), Joseph Fourier University (UJF) and French National Center for Scientific Research (CNRS), CEA \u2013 LETI MINATEC , 17 Avenue des Martyrs, 38054 Grenoble Cedex 9, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745","https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.9825,"has_fulltext":true,"cited_by_count":21,"citation_normalized_percentile":{"value":0.77293291,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"32","issue":"1","first_page":"01A120","last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.989300012588501,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.989300012588501,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.0017999999690800905,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10024","display_name":"TiO2 Photocatalysis and Solar Cells","score":0.000699999975040555,"subfield":{"id":"https://openalex.org/subfields/2105","display_name":"Renewable Energy, Sustainability and the Environment"},"field":{"id":"https://openalex.org/fields/21","display_name":"Energy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/rutile-tio2","display_name":"rutile TiO2","score":0.8970000147819519},{"id":"https://openalex.org/keywords/tio2-thin-films","display_name":"TiO2 thin films","score":0.859000027179718},{"id":"https://openalex.org/keywords/plasma-enhanced-atomic-layer-deposition","display_name":"plasma-enhanced atomic layer deposition","score":0.9739999771118164},{"id":"https://openalex.org/keywords/mim-capacitors","display_name":"metal-insulator-metal capacitors","score":0.9599999785423279},{"id":"https://openalex.org/keywords/dielectric-constant","display_name":"dielectric constant","score":0.9980000257492065},{"id":"https://openalex.org/keywords/leakage-current","display_name":"leakage current","score":0.8999999761581421},{"id":"https://openalex.org/keywords/dielectric-films","display_name":"dielectric films","score":0.421999990940094}],"concepts":[{"id":"https://openalex.org/C2777889555","wikidata":"https://www.wikidata.org/wiki/Q320603","display_name":"Rutile","level":2,"score":0.8723331689834595},{"id":"https://openalex.org/C69544855","wikidata":"https://www.wikidata.org/wiki/Q757625","display_name":"Atomic layer deposition","level":3,"score":0.8306068778038025},{"id":"https://openalex.org/C506065880","wikidata":"https://www.wikidata.org/wiki/Q716","display_name":"Titanium","level":2,"score":0.7564622759819031},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7043410539627075},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.6919713616371155},{"id":"https://openalex.org/C2777593239","wikidata":"https://www.wikidata.org/wiki/Q193521","display_name":"Titanium dioxide","level":2,"score":0.5614545345306396},{"id":"https://openalex.org/C555196967","wikidata":"https://www.wikidata.org/wiki/Q1086","display_name":"Ruthenium","level":3,"score":0.5365035533905029},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.5294933915138245},{"id":"https://openalex.org/C52192207","wikidata":"https://www.wikidata.org/wiki/Q5322","display_name":"Capacitor","level":3,"score":0.4901488721370697},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.48798316717147827},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4852990508079529},{"id":"https://openalex.org/C544153396","wikidata":"https://www.wikidata.org/wiki/Q11426","display_name":"Metal","level":2,"score":0.45676282048225403},{"id":"https://openalex.org/C179104552","wikidata":"https://www.wikidata.org/wiki/Q11165","display_name":"Inorganic chemistry","level":1,"score":0.4533282518386841},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.43528982996940613},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4276343286037445},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.38740965723991394},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.24473318457603455},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.21054604649543762},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.17817601561546326},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.15602612495422363},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.14697769284248352},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.14508956670761108},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.09164977073669434},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.07398083806037903},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.051784366369247437},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.04733601212501526},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0}],"mesh":[],"locations_count":4,"locations":[{"id":"doi:10.1116/1.4843515","doi":"https://doi.org/10.1116/1.4843515","is_oa":true,"landing_page_url":"https://doi.org/10.1116/1.4843515","pdf_url":"https://avs.scitation.org/doi/pdf/10.1116/1.4843515","source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},{"id":"pmh:oai:HAL:hal-01798345v1","doi":null,"is_oa":true,"landing_page_url":"https://hal.science/hal-01798345","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4405252976","host_organization_name":"Centre pour la Communication Scientifique Directe","host_organization_lineage":["https://openalex.org/I4405252976"],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Journal of Vacuum Science & Technology A, 2014, A 32, pp.01A120. ⟨10.1116/1.4843515⟩","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:oai:HAL:hal-01798642v1","doi":null,"is_oa":false,"landing_page_url":"https://hal.archives-ouvertes.fr/hal-01798642","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ISSN: 0734-2101","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:oai:HAL:hal-01869728v1","doi":null,"is_oa":false,"landing_page_url":"https://hal.archives-ouvertes.fr/hal-01869728","pdf_url":null,"source":{"id":"https://openalex.org/S4377196329","display_name":"HAL Portal Artxiker (Hindustan Aeronautics Limited (India))","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4210088939","host_organization_name":"Hindustan Aeronautics Limited (India)","host_organization_lineage":["https://openalex.org/I4210088939"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ISSN: 0734-2101","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":{"id":"doi:10.1116/1.4843515","doi":"https://doi.org/10.1116/1.4843515","is_oa":true,"landing_page_url":"https://doi.org/10.1116/1.4843515","pdf_url":"https://avs.scitation.org/doi/pdf/10.1116/1.4843515","source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2051025720.pdf","grobid_xml":"https://content.openalex.org/works/W2051025720.grobid-xml"},"referenced_works_count":15,"referenced_works":["https://openalex.org/W1971471726","https://openalex.org/W1972586919","https://openalex.org/W1986252415","https://openalex.org/W1986410144","https://openalex.org/W1997477746","https://openalex.org/W1999343861","https://openalex.org/W2007300615","https://openalex.org/W2008960829","https://openalex.org/W2015005661","https://openalex.org/W2018507210","https://openalex.org/W2061520688","https://openalex.org/W2092746093","https://openalex.org/W2140940671","https://openalex.org/W2171889318","https://openalex.org/W2172066774"],"related_works":["https://openalex.org/W2042567662","https://openalex.org/W2084833079","https://openalex.org/W2062333397","https://openalex.org/W4400515297","https://openalex.org/W7151516851","https://openalex.org/W1984573819","https://openalex.org/W2018507210","https://openalex.org/W2335199606","https://openalex.org/W7212502580","https://openalex.org/W3197216527"],"abstract_inverted_index":{"In":[0],"this":[1,47],"work,":[2],"tetrakis(dimethylamino)titanium":[3],"precursor":[4],"as":[5,7],"well":[6],"in-situ":[8],"oxidized":[9],"ruthenium":[10],"bottom":[11],"electrode":[12],"were":[13],"used":[14],"to":[15,35,50],"grow":[16],"rutile-structured":[17],"titanium":[18],"dioxide":[19],"thin":[20],"layers":[21],"by":[22],"plasma":[23],"enhanced":[24],"atomic":[25],"layer":[26],"deposition.":[27],"Metal\u2013insulator\u2013metal":[28],"capacitors":[29],"have":[30],"been":[31],"elaborated":[32],"in":[33,55],"order":[34],"study":[36],"the":[37,41],"electrical":[38],"properties":[39],"of":[40,57],"device.":[42],"It":[43],"is":[44],"shown":[45],"that":[46],"process":[48],"leads":[49],"devices":[51],"exhibiting":[52],"excellent":[53],"results":[54],"terms":[56],"dielectric":[58],"constant":[59],"and":[60],"leakage":[61],"current.":[62]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2022,"cited_by_count":2},{"year":2019,"cited_by_count":4},{"year":2018,"cited_by_count":5},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}