{"id":"https://openalex.org/W2046034331","doi":"https://doi.org/10.1063/1.1791322","title":"Growth and characterization of tungsten carbide nanowires by thermal annealing of sputter-deposited WCx films","display_name":"Growth and characterization of tungsten carbide nanowires by thermal annealing of sputter-deposited WCx films","publication_year":2004,"publication_date":"2004-09-20","ids":{"openalex":"https://openalex.org/W2046034331","doi":"https://doi.org/10.1063/1.1791322","mag":"2046034331"},"language":"en","primary_location":{"id":"doi:10.1063/1.1791322","doi":"https://doi.org/10.1063/1.1791322","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.1791322","pdf_url":null,"source":{"id":"https://openalex.org/S105243760","display_name":"Applied Physics Letters","issn_l":"0003-6951","issn":["0003-6951","1077-3118","1520-8842"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-3","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics Letters","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5065360164","display_name":"Shui-Jinn Wang","orcid":"https://orcid.org/0000-0002-2396-3649","observed_orcids":["https://orcid.org/0000-0002-2396-3649"]},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Shui-Jinn Wang","raw_affiliation_strings":["Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043264806","display_name":"Chao-Hsuing Chen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Chao-Hsuing Chen","raw_affiliation_strings":["Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113834893","display_name":"Shu-Cheng Chang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Shu-Cheng Chang","raw_affiliation_strings":["Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113580457","display_name":"Kai-Ming Uang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I91807558","display_name":"National Cheng Kung University","ror":"https://ror.org/01b8kcc49","country_code":"TW","type":"education","lineage":["https://openalex.org/I91807558"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Kai-Ming Uang","raw_affiliation_strings":["Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University , Tainan, Taiwan, Republic of China","institution_ids":["https://openalex.org/I91807558"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051433440","display_name":"Chuan-Ping Juan","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Chuan-Ping Juan","raw_affiliation_strings":["Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University , Hsinchu 300, Taiwan, Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University , Hsinchu 300, Taiwan, Republic of China","institution_ids":["https://openalex.org/I148366613"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110126725","display_name":"Huang\u2010Chung Cheng","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Huang-Chung Cheng","raw_affiliation_strings":["Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University , Hsinchu 300, Taiwan, Republic of China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University , Hsinchu 300, Taiwan, Republic of China","institution_ids":["https://openalex.org/I148366613"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.3936,"has_fulltext":false,"cited_by_count":27,"citation_normalized_percentile":{"value":0.78610188,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":97},"biblio":{"volume":"85","issue":"12","first_page":"2358","last_page":"2360"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.7939000129699707,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.7939000129699707,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10074","display_name":"Carbon Nanotubes in Composites","score":0.06629999727010727,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12099","display_name":"Advanced materials and composites","score":0.057100001722574234,"subfield":{"id":"https://openalex.org/subfields/2503","display_name":"Ceramics and Composites"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/w2c","display_name":"W2C","score":0.8809999823570251},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.7699999809265137},{"id":"https://openalex.org/keywords/sputter-deposited-films","display_name":"sputter-deposited films","score":0.8339999914169312},{"id":"https://openalex.org/keywords/carbon-depletion","display_name":"carbon depletion","score":0.5059999823570251},{"id":"https://openalex.org/keywords/autocatalytic-growth","display_name":"self-catalyzed growth","score":0.8389999866485596},{"id":"https://openalex.org/keywords/field-emission","display_name":"field emission","score":0.8309999704360962},{"id":"https://openalex.org/keywords/turn-on-field","display_name":"turn-on field","score":0.7490000128746033},{"id":"https://openalex.org/keywords/nitrogen-annealing","display_name":"nitrogen annealing","score":0.5580000281333923},{"id":"https://openalex.org/keywords/nanowire-growth","display_name":"nanowire growth","score":0.6399999856948853}],"concepts":[{"id":"https://openalex.org/C74214498","wikidata":"https://www.wikidata.org/wiki/Q631739","display_name":"Nanowire","level":2,"score":0.7821013331413269},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7215767502784729},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7009446024894714},{"id":"https://openalex.org/C2781422231","wikidata":"https://www.wikidata.org/wiki/Q423265","display_name":"Tungsten carbide","level":2,"score":0.6992102861404419},{"id":"https://openalex.org/C542268612","wikidata":"https://www.wikidata.org/wiki/Q743","display_name":"Tungsten","level":2,"score":0.659701943397522},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.6027904748916626},{"id":"https://openalex.org/C121029787","wikidata":"https://www.wikidata.org/wiki/Q902877","display_name":"Field electron emission","level":3,"score":0.589622437953949},{"id":"https://openalex.org/C5335593","wikidata":"https://www.wikidata.org/wiki/Q241906","display_name":"Carbide","level":2,"score":0.5475366115570068},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.4658055901527405},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3874085247516632},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.3494807183742523},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.34864646196365356},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.2222718596458435},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1063/1.1791322","doi":"https://doi.org/10.1063/1.1791322","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.1791322","pdf_url":null,"source":{"id":"https://openalex.org/S105243760","display_name":"Applied Physics Letters","issn_l":"0003-6951","issn":["0003-6951","1077-3118","1520-8842"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-3","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics Letters","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":19,"referenced_works":["https://openalex.org/W1965987619","https://openalex.org/W1973622283","https://openalex.org/W1979351818","https://openalex.org/W1994799397","https://openalex.org/W1996302828","https://openalex.org/W2002542276","https://openalex.org/W2002665804","https://openalex.org/W2017968046","https://openalex.org/W2023309703","https://openalex.org/W2033032018","https://openalex.org/W2034508754","https://openalex.org/W2038589869","https://openalex.org/W2050229890","https://openalex.org/W2066406068","https://openalex.org/W2070523629","https://openalex.org/W2079043180","https://openalex.org/W2079473041","https://openalex.org/W2082904789","https://openalex.org/W2101211372"],"related_works":["https://openalex.org/W1972553383","https://openalex.org/W2022456161","https://openalex.org/W2413815822","https://openalex.org/W431832235","https://openalex.org/W1979351818","https://openalex.org/W2079252297","https://openalex.org/W2080803312","https://openalex.org/W2183550105","https://openalex.org/W7017838452","https://openalex.org/W2016374937"],"abstract_inverted_index":{"In":[0],"this":[1],"letter,":[2],"the":[3,33,40,67,77],"growth":[4,60],"of":[5,14,28,35,55,61,69],"dense":[6],"W2C":[7,62],"nanowires":[8,24,63],"by":[9,73],"a":[10,26,51],"simple":[11],"thermal":[12,81],"annealing":[13],"sputter-deposited":[15],"WCx":[16,78],"films":[17,79],"in":[18,32,76],"nitrogen":[19],"ambient":[20],"is":[21,64],"reported.":[22],"Straight":[23],"with":[25,50],"density":[27],"250\u2013260\u03bcm\u22122":[29],"and":[30],"length\u2215diameter":[31],"range":[34],"0.2\u20130.3\u03bcm\u221513\u201315nm":[36],"were":[37],"obtained":[38],"from":[39],"700\u00b0C-annealed":[41],"samples,":[42],"which":[43],"exhibit":[44],"good":[45],"electron":[46],"field":[47,54],"emission":[48],"characteristics":[49],"typical":[52],"turn-on":[53],"about":[56],"1.7V\u2215\u03bcm.":[57],"The":[58],"self-catalytic":[59],"attributed":[65],"to":[66],"formation":[68],"\u03b1-W2C":[70],"phase":[71],"caused":[72],"carbon":[74],"depletion":[75],"during":[80],"annealing.":[82]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":2},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":3}],"updated_date":"2026-09-26T08:19:03.415552","created_date":"2016-06-24T00:00:00"}