{"id":"https://openalex.org/W2045995459","doi":"https://doi.org/10.1063/1.4867665","title":"A parallel alignment device with dynamic force compensation for nanoimprint lithography","display_name":"A parallel alignment device with dynamic force compensation for nanoimprint lithography","publication_year":2014,"publication_date":"2014-03-01","ids":{"openalex":"https://openalex.org/W2045995459","doi":"https://doi.org/10.1063/1.4867665","mag":"2045995459","pmid":"https://pubmed.ncbi.nlm.nih.gov/24689620"},"language":"en","primary_location":{"id":"doi:10.1063/1.4867665","doi":"https://doi.org/10.1063/1.4867665","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.4867665","pdf_url":null,"source":{"id":"https://openalex.org/S31010182","display_name":"Review of Scientific Instruments","issn_l":"0034-6748","issn":["0034-6748","1089-7623","1527-2400"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","medline","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Review of Scientific Instruments","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","pubmed"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5026365889","display_name":"Weihai Chen","orcid":"https://orcid.org/0000-0001-7912-4505","observed_orcids":["https://orcid.org/0000-0001-7912-4505","https://orcid.org/0000-0001-6622-4558"]},"institutions":[{"id":"https://openalex.org/I4210091207","display_name":"Singapore Institute of Manufacturing Technology","ror":"https://ror.org/00f44np30","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210091207","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Weihai Chen","raw_affiliation_strings":["Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China","Singapore Institute of Manufacturing Technology 2 Mechatronics Group, , Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China","institution_ids":["https://openalex.org/I82880672"]},{"raw_affiliation_string":"Singapore Institute of Manufacturing Technology 2 Mechatronics Group, , Singapore","institution_ids":["https://openalex.org/I4210091207"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066238433","display_name":"Chong Du","orcid":"https://orcid.org/0000-0003-4840-8235","observed_orcids":["https://orcid.org/0000-0003-4840-8235"]},"institutions":[{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Chong Du","raw_affiliation_strings":["Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China","institution_ids":["https://openalex.org/I82880672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100620725","display_name":"Yunjie Wu","orcid":"https://orcid.org/0009-0003-1520-599X","observed_orcids":["https://orcid.org/0009-0003-1520-599X"]},"institutions":[{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yunjie Wu","raw_affiliation_strings":["Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China","institution_ids":["https://openalex.org/I82880672"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100462257","display_name":"Wenjie Chen","orcid":"https://orcid.org/0000-0002-4116-5392","observed_orcids":["https://orcid.org/0000-0002-4116-5392"]},"institutions":[{"id":"https://openalex.org/I4210091207","display_name":"Singapore Institute of Manufacturing Technology","ror":"https://ror.org/00f44np30","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210091207","https://openalex.org/I91275662"]},{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN","SG"],"is_corresponding":false,"raw_author_name":"Wenjie Chen","raw_affiliation_strings":["Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China","Singapore Institute of Manufacturing Technology 2 Mechatronics Group, , Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China","institution_ids":["https://openalex.org/I82880672"]},{"raw_affiliation_string":"Singapore Institute of Manufacturing Technology 2 Mechatronics Group, , Singapore","institution_ids":["https://openalex.org/I4210091207"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103013766","display_name":"Mei Yuan","orcid":"https://orcid.org/0000-0003-4064-7944","observed_orcids":["https://orcid.org/0000-0003-4064-7944"]},"institutions":[{"id":"https://openalex.org/I82880672","display_name":"Beihang University","ror":"https://ror.org/00wk2mp56","country_code":"CN","type":"education","lineage":["https://openalex.org/I82880672"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Mei Yuan","raw_affiliation_strings":["Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Beihang University 1 Department of Automation Science and Electrical Engineering, , Beijing, China","institution_ids":["https://openalex.org/I82880672"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.3454,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.51622472,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"85","issue":"3","first_page":"035107","last_page":"035107"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9940999746322632,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9940999746322632,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.0024999999441206455,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11525","display_name":"Piezoelectric Actuators and Control","score":0.0013000000035390258,"subfield":{"id":"https://openalex.org/subfields/2207","display_name":"Control and Systems Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/nanoimprint-lithography","display_name":"nanoimprint lithography","score":0.9950000047683716}],"concepts":[{"id":"https://openalex.org/C2777046567","wikidata":"https://www.wikidata.org/wiki/Q1540138","display_name":"Nanoimprint lithography","level":4,"score":0.8285671472549438},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7735929489135742},{"id":"https://openalex.org/C2777813233","wikidata":"https://www.wikidata.org/wiki/Q1527816","display_name":"Grating","level":2,"score":0.5398037433624268},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5274377465248108},{"id":"https://openalex.org/C47422493","wikidata":"https://www.wikidata.org/wiki/Q2755127","display_name":"Wedge (geometry)","level":2,"score":0.490087628364563},{"id":"https://openalex.org/C93021684","wikidata":"https://www.wikidata.org/wiki/Q3816735","display_name":"Pressing","level":2,"score":0.4700518846511841},{"id":"https://openalex.org/C2780023022","wikidata":"https://www.wikidata.org/wiki/Q1338171","display_name":"Compensation (psychology)","level":2,"score":0.4356170892715454},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3531684875488281},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3397257924079895},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.27673178911209106},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.22811320424079895},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.16154488921165466},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C11171543","wikidata":"https://www.wikidata.org/wiki/Q41630","display_name":"Psychoanalysis","level":1,"score":0.0},{"id":"https://openalex.org/C15744967","wikidata":"https://www.wikidata.org/wiki/Q9418","display_name":"Psychology","level":0,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1063/1.4867665","doi":"https://doi.org/10.1063/1.4867665","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.4867665","pdf_url":null,"source":{"id":"https://openalex.org/S31010182","display_name":"Review of Scientific Instruments","issn_l":"0034-6748","issn":["0034-6748","1089-7623","1527-2400"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","medline","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Review of Scientific Instruments","raw_type":"journal-article"},{"id":"pmid:24689620","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/24689620","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"The Review of scientific instruments","raw_type":"Journal Article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G808070385","display_name":null,"funder_award_id":"91023036","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"}],"funders":[{"id":"https://openalex.org/F4320306076","display_name":"National Science Foundation","ror":"https://ror.org/021nxhr62"},{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":18,"referenced_works":["https://openalex.org/W1973312921","https://openalex.org/W1980590573","https://openalex.org/W1983772203","https://openalex.org/W1990426280","https://openalex.org/W1990730337","https://openalex.org/W1994835874","https://openalex.org/W2009912540","https://openalex.org/W2016406132","https://openalex.org/W2018609609","https://openalex.org/W2038685838","https://openalex.org/W2052416995","https://openalex.org/W2052886083","https://openalex.org/W2073307089","https://openalex.org/W2073381129","https://openalex.org/W2080963553","https://openalex.org/W2084334532","https://openalex.org/W4234109392","https://openalex.org/W4240936489"],"related_works":["https://openalex.org/W2013725874","https://openalex.org/W1975504444","https://openalex.org/W2020595118","https://openalex.org/W2392965297","https://openalex.org/W2039268713","https://openalex.org/W7206668485","https://openalex.org/W2116765448","https://openalex.org/W2012843591","https://openalex.org/W4283033343","https://openalex.org/W2062584644"],"abstract_inverted_index":{"Nanoimprint":[0],"lithography":[1],"is":[2,54,86,93,103,129,137],"a":[3,13,19,42,58,64],"nano/micro":[4],"patterning":[5],"technology":[6],"to":[7,33,113],"fabricate":[8],"functional":[9],"devices":[10],"by":[11,96,139],"pressing":[12],"template":[14,72],"with":[15,36,46,63,151],"predefined":[16],"structures":[17,147],"on":[18,132],"substrate.":[20],"Uniformity":[21],"of":[22,49,125,157],"the":[23,27,47,71,74,89,97,101,114,122,126,141,152,158],"force":[24,51,85,92,108,123,135],"distribution":[25,52,124],"between":[26,70],"contacting":[28],"surfaces":[29],"should":[30],"be":[31,77],"ensured":[32],"produce":[34],"features":[35],"high":[37,107],"fidelity.":[38],"In":[39],"this":[40],"paper,":[41],"parallel":[43],"alignment":[44],"device":[45,102,153],"abilities":[48],"dynamic":[50,134],"control":[53],"developed.":[55],"By":[56],"adopting":[57],"spherical":[59,98],"air":[60,99],"bearing":[61],"held":[62],"5-degree-of-freedom":[65],"flexure-based":[66],"stage,":[67],"wedge":[68],"errors":[69],"and":[73,154],"substrate":[75],"can":[76],"eliminated":[78],"passively":[79],"without":[80,110],"friction":[81],"when":[82],"an":[83],"imprint":[84,91,127],"applied.":[87],"Since":[88],"vertical":[90],"mainly":[94],"supported":[95],"bearing,":[100],"very":[104],"suitable":[105],"for":[106],"applications,":[109],"causing":[111],"damage":[112],"delicate":[115],"compliant":[116,142],"stage":[117,143],"or":[118],"precision":[119],"degradation.":[120],"Besides,":[121],"process":[128],"measured,":[130],"based":[131],"which":[133],"compensation":[136],"performed":[138],"actuating":[140],"actively.":[144],"Five-hundred-nm-period":[145],"grating":[146],"are":[148],"transferred":[149],"successfully":[150],"proofs":[155],"effectiveness":[156],"device.":[159]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1}],"updated_date":"2026-10-02T10:15:12.560889","created_date":"2016-06-24T00:00:00"}