{"id":"https://openalex.org/W2045091674","doi":"https://doi.org/10.1016/j.tsf.2009.02.095","title":"Fabrication of polycrystalline silicon thin films on glass substrates using fiber laser crystallization","display_name":"Fabrication of polycrystalline silicon thin films on glass substrates using fiber laser crystallization","publication_year":2009,"publication_date":"2009-02-22","ids":{"openalex":"https://openalex.org/W2045091674","doi":"https://doi.org/10.1016/j.tsf.2009.02.095","mag":"2045091674"},"language":"en","primary_location":{"id":"doi:10.1016/j.tsf.2009.02.095","doi":"https://doi.org/10.1016/j.tsf.2009.02.095","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.tsf.2009.02.095","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5003903345","display_name":"Vinh Ai Dao","orcid":"https://orcid.org/0000-0002-5039-2431","observed_orcids":["https://orcid.org/0000-0002-5039-2431"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Vinh Ai Dao","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110085215","display_name":"Kuymin Han","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kuymin Han","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109976262","display_name":"Jongkyu Heo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jongkyu Heo","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109835279","display_name":"Dohyeon Kyeong","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Dohyeon Kyeong","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100374317","display_name":"Jae\u2010Hong Kim","orcid":"https://orcid.org/0000-0003-2224-3516","observed_orcids":["https://orcid.org/0000-0003-2224-3516","https://orcid.org/0000-0003-1968-2753"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jaehong Kim","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100701674","display_name":"Youngseok Lee","orcid":"https://orcid.org/0000-0003-3037-8154","observed_orcids":["https://orcid.org/0000-0003-3037-8154"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Youngseok Lee","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079853146","display_name":"Yongkuk Kim","orcid":"https://orcid.org/0009-0008-7274-024X","observed_orcids":["https://orcid.org/0009-0008-7274-024X"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Yongkuk Kim","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048187754","display_name":"Sungwook Jung","orcid":"https://orcid.org/0000-0001-8012-190X","observed_orcids":["https://orcid.org/0000-0001-8012-190X"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sungwook Jung","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046917879","display_name":"Kyunghae Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kyunghae Kim","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5026986287","display_name":"Junsin Yi","orcid":"https://orcid.org/0000-0002-6196-0035","observed_orcids":["https://orcid.org/0000-0002-6196-0035"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Junsin Yi","raw_affiliation_strings":["Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Information and Communication Device Laboratory, School of Information and Communication Engineering, Sungkyunkwan University, Republic of Korea","institution_ids":["https://openalex.org/I848706"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5026986287"],"corresponding_institution_ids":["https://openalex.org/I848706"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":1.0379,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.7830952,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":93},"biblio":{"volume":"517","issue":"14","first_page":"3971","last_page":"3974"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.7354000210762024,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.7354000210762024,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.18379999697208405,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.04050000011920929,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/polycrystalline-silicon-thin-films","display_name":"polycrystalline silicon thin films","score":0.9359999895095825},{"id":"https://openalex.org/keywords/laser-induced-crystallization","display_name":"laser-induced crystallization","score":0.8009999990463257},{"id":"https://openalex.org/keywords/fiber-lasers","display_name":"fiber lasers","score":0.9409999847412109},{"id":"https://openalex.org/keywords/amorphous-silicon","display_name":"amorphous silicon","score":0.968999981880188},{"id":"https://openalex.org/keywords/glass-substrates","display_name":"glass substrates","score":0.9240000247955322},{"id":"https://openalex.org/keywords/capping-layer","display_name":"capping layer","score":0.9810000061988831},{"id":"https://openalex.org/keywords/laser-fluence","display_name":"laser fluence","score":0.859000027179718},{"id":"https://openalex.org/keywords/crystallinity","display_name":"crystallinity","score":0.8809999823570251},{"id":"https://openalex.org/keywords/film-transmittance","display_name":"film transmittance","score":0.8650000095367432},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.972000002861023},{"id":"https://openalex.org/keywords/grain-size-uniformity","display_name":"grain size uniformity","score":0.8709999918937683},{"id":"https://openalex.org/keywords/infrared-absorption","display_name":"infrared absorption","score":0.3310000002384186}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7496770620346069},{"id":"https://openalex.org/C203036418","wikidata":"https://www.wikidata.org/wiki/Q284256","display_name":"Crystallization","level":2,"score":0.7424483299255371},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.7155882120132446},{"id":"https://openalex.org/C2780565262","wikidata":"https://www.wikidata.org/wiki/Q737038","display_name":"Polycrystalline silicon","level":4,"score":0.627527117729187},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.6058074831962585},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5887669920921326},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5152764320373535},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.43391916155815125},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3847895562648773},{"id":"https://openalex.org/C199289684","wikidata":"https://www.wikidata.org/wiki/Q83353","display_name":"Mineralogy","level":1,"score":0.3327729403972626},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.2649957537651062},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.23707294464111328},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.12335991859436035},{"id":"https://openalex.org/C87359718","wikidata":"https://www.wikidata.org/wiki/Q1271916","display_name":"Thin-film transistor","level":3,"score":0.11408752202987671},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1108790934085846},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.tsf.2009.02.095","doi":"https://doi.org/10.1016/j.tsf.2009.02.095","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.tsf.2009.02.095","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W1598285744","https://openalex.org/W1601915682","https://openalex.org/W1616132382","https://openalex.org/W1966790973","https://openalex.org/W1993677620","https://openalex.org/W2007508517","https://openalex.org/W2081776754","https://openalex.org/W2126175641","https://openalex.org/W2129601118"],"related_works":["https://openalex.org/W2075774240","https://openalex.org/W2913688366","https://openalex.org/W2043243466","https://openalex.org/W2361313039","https://openalex.org/W2069489470","https://openalex.org/W1667100864","https://openalex.org/W2322296845","https://openalex.org/W2094467085","https://openalex.org/W3108692686","https://openalex.org/W1543548347"],"abstract_inverted_index":null,"counts_by_year":[{"year":2019,"cited_by_count":1}],"updated_date":"2026-10-13T10:08:12.033832","created_date":"2016-06-24T00:00:00"}
