{"id":"https://openalex.org/W2043912717","doi":"https://doi.org/10.1149/1.2085648","title":"Selected\u2010Area Nucleation and Patterning of Diamond Thin Films by Electrophoretic Seeding","display_name":"Selected\u2010Area Nucleation and Patterning of Diamond Thin Films by Electrophoretic Seeding","publication_year":1991,"publication_date":"1991-02-01","ids":{"openalex":"https://openalex.org/W2043912717","doi":"https://doi.org/10.1149/1.2085648","mag":"2043912717"},"language":"en","primary_location":{"id":"doi:10.1149/1.2085648","doi":"https://doi.org/10.1149/1.2085648","is_oa":false,"landing_page_url":"https://doi.org/10.1149/1.2085648","pdf_url":null,"source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5104521556","display_name":"J. L. Vald\u00e9s","orcid":"https://orcid.org/0000-0002-1121-1132","observed_orcids":["https://orcid.org/0000-0002-1121-1132"]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. L. Valdes","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey 07973"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey 07973","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002185094","display_name":"J. W. Mitchel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. W. Mitchel","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey 07973"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey 07973","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110567574","display_name":"J. A. Mucha","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. A. Mucha","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey 07973"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey 07973","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038240901","display_name":"L. Seibles","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"L Seibles","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey 07973"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey 07973","institution_ids":["https://openalex.org/I1283103587"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5042804916","display_name":"Harold A. Huggins","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1283103587","display_name":"AT&T (United States)","ror":"https://ror.org/02bbd5539","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"H. Huggins","raw_affiliation_strings":["AT&T Bell Laboratories, Murray Hill, New Jersey 07973"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AT&T Bell Laboratories, Murray Hill, New Jersey 07973","institution_ids":["https://openalex.org/I1283103587"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I1283103587"],"apc_list":{"value":1950,"currency":"USD","value_usd":1950},"apc_paid":null,"fwci":1.876,"has_fulltext":false,"cited_by_count":35,"citation_normalized_percentile":{"value":0.85174653,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"138","issue":"2","first_page":"635","last_page":"636"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.0008999999845400453,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14382","display_name":"Electrophoretic Deposition in Materials Science","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/diamond-films","display_name":"diamond films","score":0.9340000152587891},{"id":"https://openalex.org/keywords/diamond-growth","display_name":"diamond growth","score":0.4320000112056732},{"id":"https://openalex.org/keywords/electrophoretic-deposition","display_name":"electrophoretic deposition","score":0.6439999938011169}],"concepts":[{"id":"https://openalex.org/C61048295","wikidata":"https://www.wikidata.org/wiki/Q909022","display_name":"Nucleation","level":2,"score":0.8490792512893677},{"id":"https://openalex.org/C2776921476","wikidata":"https://www.wikidata.org/wiki/Q5283","display_name":"Diamond","level":2,"score":0.7121285796165466},{"id":"https://openalex.org/C36248471","wikidata":"https://www.wikidata.org/wiki/Q7445669","display_name":"Seeding","level":2,"score":0.6710978746414185},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6263630390167236},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4719970226287842},{"id":"https://openalex.org/C40250595","wikidata":"https://www.wikidata.org/wiki/Q185098","display_name":"Electrophoresis","level":2,"score":0.43248724937438965},{"id":"https://openalex.org/C159467904","wikidata":"https://www.wikidata.org/wiki/Q2001702","display_name":"Chemical physics","level":1,"score":0.3723228871822357},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.37091541290283203},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2445046305656433},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.17788156867027283},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.09869551658630371},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.061766356229782104},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.06048741936683655},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1149/1.2085648","doi":"https://doi.org/10.1149/1.2085648","is_oa":false,"landing_page_url":"https://doi.org/10.1149/1.2085648","pdf_url":null,"source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1625793478","https://openalex.org/W2092719249","https://openalex.org/W1976709546","https://openalex.org/W2004820903","https://openalex.org/W2095471377","https://openalex.org/W2047480946","https://openalex.org/W3142529400","https://openalex.org/W2009376334","https://openalex.org/W2049015176","https://openalex.org/W2043232975"],"abstract_inverted_index":{"We":[0],"demonstrate":[1],"here":[2],"an":[3],"electrophoretic":[4],"process":[5],"for":[6,13],"nucleating":[7],"and":[8,25],"patteming":[9],"of":[10,15],"silicon":[11],"substrates":[12],"CVD":[14],"polycrystalline":[16],"diamond":[17],"films":[18],"that":[19],"is":[20],"simpler":[21],"than":[22],"present":[23],"methods":[24],"far":[26],"less":[27],"damaging":[28],"to":[29],"the":[30],"underlying":[31],"substrate":[32]},"counts_by_year":[{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2016,"cited_by_count":1},{"year":2012,"cited_by_count":2}],"updated_date":"2026-10-26T11:51:55.731654","created_date":"2016-06-24T00:00:00"}
