{"id":"https://openalex.org/W2040887649","doi":"https://doi.org/10.1088/0963-0252/13/3/008","title":"Improvement of a microwave ECR plasma source for the plasma immersion ion implantation and deposition process","display_name":"Improvement of a microwave ECR plasma source for the plasma immersion ion implantation and deposition process","publication_year":2004,"publication_date":"2004-05-18","ids":{"openalex":"https://openalex.org/W2040887649","doi":"https://doi.org/10.1088/0963-0252/13/3/008","mag":"2040887649"},"language":"en","primary_location":{"id":"doi:10.1088/0963-0252/13/3/008","doi":"https://doi.org/10.1088/0963-0252/13/3/008","is_oa":false,"landing_page_url":"https://doi.org/10.1088/0963-0252/13/3/008","pdf_url":null,"source":{"id":"https://openalex.org/S57082650","display_name":"Plasma Sources Science and Technology","issn_l":"0963-0252","issn":["0963-0252","1361-6595"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Plasma Sources Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5066925951","display_name":"Hongchen Wu","orcid":"https://orcid.org/0000-0002-2104-3419","observed_orcids":["https://orcid.org/0000-0002-2104-3419"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hongchen Wu","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054446381","display_name":"Huafang Zhang","orcid":"https://orcid.org/0000-0002-2832-5339","observed_orcids":["https://orcid.org/0000-0002-2832-5339"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Huafang Zhang","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5012718254","display_name":"Liping Peng","orcid":"https://orcid.org/0000-0001-9351-709X","observed_orcids":["https://orcid.org/0000-0001-9351-709X"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Liping Peng","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101705141","display_name":"Yanli Jiang","orcid":"https://orcid.org/0000-0002-3671-3120","observed_orcids":["https://orcid.org/0000-0002-3671-3120"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yanli Jiang","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5101174849","display_name":"Guojia Ma","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Guojia Ma","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3325,"currency":"USD","value_usd":3325},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"13","issue":"3","first_page":"420","last_page":"423"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9726999998092651,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9726999998092651,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11367","display_name":"Particle accelerators and beam dynamics","score":0.005100000184029341,"subfield":{"id":"https://openalex.org/subfields/3106","display_name":"Nuclear and High Energy Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10642","display_name":"Atmospheric-Pressure Plasma Applications","score":0.004699999932199717,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/plasma-immersion-ion-implantation-and-deposition","display_name":"plasma immersion ion implantation and deposition","score":0.8849999904632568},{"id":"https://openalex.org/keywords/microwave-plasma-source","display_name":"microwave plasma source","score":0.8360000252723694},{"id":"https://openalex.org/keywords/electron-cyclotron-resonance-plasma","display_name":"electron cyclotron resonance plasma","score":0.7139999866485596},{"id":"https://openalex.org/keywords/magnetic-circuits","display_name":"magnetic circuits","score":0.906000018119812},{"id":"https://openalex.org/keywords/coating-adhesion","display_name":"coating adhesion","score":0.7289999723434448},{"id":"https://openalex.org/keywords/bias-voltage","display_name":"bias voltage","score":0.746999979019165}],"concepts":[{"id":"https://openalex.org/C2778702798","wikidata":"https://www.wikidata.org/wiki/Q2098457","display_name":"Plasma-immersion ion implantation","level":4,"score":0.7908484935760498},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.7058262228965759},{"id":"https://openalex.org/C188224857","wikidata":"https://www.wikidata.org/wiki/Q905291","display_name":"Ion source","level":3,"score":0.6504852771759033},{"id":"https://openalex.org/C44838205","wikidata":"https://www.wikidata.org/wiki/Q127995","display_name":"Microwave","level":2,"score":0.6068300008773804},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.5393540263175964},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.483195424079895},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.4698948562145233},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.39447587728500366},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.3841542601585388},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.32730767130851746},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.10775533318519592},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09446054697036743},{"id":"https://openalex.org/C107872376","wikidata":"https://www.wikidata.org/wiki/Q321355","display_name":"Environmental chemistry","level":1,"score":0.07049545645713806},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.044343024492263794},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1088/0963-0252/13/3/008","doi":"https://doi.org/10.1088/0963-0252/13/3/008","is_oa":false,"landing_page_url":"https://doi.org/10.1088/0963-0252/13/3/008","pdf_url":null,"source":{"id":"https://openalex.org/S57082650","display_name":"Plasma Sources Science and Technology","issn_l":"0963-0252","issn":["0963-0252","1361-6595"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Plasma Sources Science and Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1600833788","https://openalex.org/W1973241980","https://openalex.org/W1986495087","https://openalex.org/W1998882256","https://openalex.org/W2033147537","https://openalex.org/W2074037723","https://openalex.org/W2092319000"],"related_works":["https://openalex.org/W7014614901","https://openalex.org/W2110922100","https://openalex.org/W2049746969","https://openalex.org/W2053426534","https://openalex.org/W2376379203","https://openalex.org/W1640777652","https://openalex.org/W1973186474","https://openalex.org/W2032719216","https://openalex.org/W2008020278","https://openalex.org/W2096500520"],"abstract_inverted_index":{"The":[0],"Plasma":[1],"Immersion":[2],"Ion":[3],"Implantation":[4],"and":[5,36,70,88,108,124],"Deposition":[6],"(PIII&D)":[7],"process":[8,60],"has":[9],"many":[10],"advantages":[11],"over":[12],"the":[13,27,30,38,42,58,77,94,97,103,106,117,122],"pure":[14],"plasma":[15,54],"immersion":[16],"ion":[17],"implantation":[18,123],"or":[19,25],"deposition.":[20],"It":[21],"can":[22,129],"compensate":[23],"for":[24],"eliminate":[26],"disadvantages":[28],"of":[29,41,52,64,96],"shallow":[31],"modification":[32],"layer":[33],"(for":[34],"PIII)":[35],"increase":[37],"bond":[39],"strength":[40],"coating":[43,87,107],"(of":[44],"deposition).":[45],"For":[46],"this":[47],"purpose,":[48],"a":[49,65,71,86,110],"new":[50,111],"type":[51],"microwave":[53],"source":[55],"used":[56],"in":[57,132],"PIII&D":[59],"was":[61,80],"developed,":[62],"composed":[63],"vacuum":[66,134],"bend":[67],"wave":[68],"guide":[69],"special":[72],"magnetic":[73],"circuit,":[74],"so":[75,120],"that":[76,121],"coupling":[78],"window":[79,98],"protected":[81],"from":[82],"being":[83],"deposited":[84],"with":[85],"bombarded":[89],"by":[90],"high-energy":[91],"particles.":[92],"So":[93],"life":[95],"is":[99,114],"increased.":[100],"To":[101],"enhance":[102],"bonding":[104],"between":[105],"substrate":[109],"biasing":[112],"voltage":[113],"applied":[115],"to":[116],"work":[118],"piece":[119],"deposition":[125],"(or":[126],"hybrid":[127],"process)":[128],"be":[130],"completed":[131],"one":[133],"cycle.":[135]},"counts_by_year":[{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1}],"updated_date":"2026-09-19T07:32:40.446753","created_date":"2016-06-24T00:00:00"}