{"id":"https://openalex.org/W2034587368","doi":"https://doi.org/10.2320/matertrans.me201106","title":"Heat Treatment Effects on Electrochemically Grown Bi2Te3 Thin Films for Thermoelectric Applications","display_name":"Heat Treatment Effects on Electrochemically Grown Bi2Te3 Thin Films for Thermoelectric Applications","publication_year":2012,"publication_date":"2012-01-01","ids":{"openalex":"https://openalex.org/W2034587368","doi":"https://doi.org/10.2320/matertrans.me201106","mag":"2034587368"},"language":"en","primary_location":{"id":"doi:10.2320/matertrans.me201106","doi":"https://doi.org/10.2320/matertrans.me201106","is_oa":true,"landing_page_url":"https://doi.org/10.2320/matertrans.me201106","pdf_url":"https://www.jstage.jst.go.jp/article/matertrans/53/8/53_ME201106/_pdf","source":{"id":"https://openalex.org/S4210209311","display_name":"MATERIALS TRANSACTIONS","issn_l":"1345-9678","issn":["1345-9678","1347-5320"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4322765269","host_organization_name":"Japan Institute of Metals","host_organization_lineage":["https://openalex.org/P4322765269"],"host_organization_lineage_names":["Japan Institute of Metals"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MATERIALS TRANSACTIONS","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://www.jstage.jst.go.jp/article/matertrans/53/8/53_ME201106/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5082764855","display_name":"Biswapriya Deb","orcid":"https://orcid.org/0000-0001-7954-9386","observed_orcids":["https://orcid.org/0000-0001-7954-9386"]},"institutions":[{"id":"https://openalex.org/I205401836","display_name":"National Institute for Materials Science","ror":"https://ror.org/026v1ze26","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Biswapriya Deb","raw_affiliation_strings":["National Institute for Materials Science"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute for Materials Science","institution_ids":["https://openalex.org/I205401836"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034691894","display_name":"Yukihiro Isoda","orcid":"https://orcid.org/0000-0003-4043-3575","observed_orcids":["https://orcid.org/0000-0003-4043-3575"]},"institutions":[{"id":"https://openalex.org/I205401836","display_name":"National Institute for Materials Science","ror":"https://ror.org/026v1ze26","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yukihiro Isoda","raw_affiliation_strings":["National Institute for Materials Science"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute for Materials Science","institution_ids":["https://openalex.org/I205401836"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5057750353","display_name":"Olga Caballero\u2010Calero","orcid":"https://orcid.org/0000-0003-1777-7126","observed_orcids":["https://orcid.org/0000-0003-1777-7126"]},"institutions":[{"id":"https://openalex.org/I134820265","display_name":"Consejo Superior de Investigaciones Cient\u00edficas","ror":"https://ror.org/02gfc7t72","country_code":"ES","type":"government","lineage":["https://openalex.org/I134820265"]},{"id":"https://openalex.org/I4210147934","display_name":"Centro Nacional de Microelectr\u00f3nica","ror":"https://ror.org/03ycqrz18","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]}],"countries":["ES"],"is_corresponding":false,"raw_author_name":"Olga Caballero-Calero","raw_affiliation_strings":["Thermoelectrics group, IMM-Instituto de Microelectr\u00f3nica de Madrid (CNM-CSIC)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thermoelectrics group, IMM-Instituto de Microelectr\u00f3nica de Madrid (CNM-CSIC)","institution_ids":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110461137","display_name":"Pablo D\u00edaz-Chao","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I134820265","display_name":"Consejo Superior de Investigaciones Cient\u00edficas","ror":"https://ror.org/02gfc7t72","country_code":"ES","type":"government","lineage":["https://openalex.org/I134820265"]},{"id":"https://openalex.org/I4210147934","display_name":"Centro Nacional de Microelectr\u00f3nica","ror":"https://ror.org/03ycqrz18","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]}],"countries":["ES"],"is_corresponding":false,"raw_author_name":"Pablo Díaz-Chao","raw_affiliation_strings":["Thermoelectrics group, IMM-Instituto de Microelectr\u00f3nica de Madrid (CNM-CSIC)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thermoelectrics group, IMM-Instituto de Microelectr\u00f3nica de Madrid (CNM-CSIC)","institution_ids":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111710706","display_name":"Marisol S. Mart iacute n-Gonz aacute lez","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I134820265","display_name":"Consejo Superior de Investigaciones Cient\u00edficas","ror":"https://ror.org/02gfc7t72","country_code":"ES","type":"government","lineage":["https://openalex.org/I134820265"]},{"id":"https://openalex.org/I4210147934","display_name":"Centro Nacional de Microelectr\u00f3nica","ror":"https://ror.org/03ycqrz18","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]}],"countries":["ES"],"is_corresponding":false,"raw_author_name":"Marisol S. Martín-González","raw_affiliation_strings":["Thermoelectrics group, IMM-Instituto de Microelectr\u00f3nica de Madrid (CNM-CSIC)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thermoelectrics group, IMM-Instituto de Microelectr\u00f3nica de Madrid (CNM-CSIC)","institution_ids":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5102934106","display_name":"Yoshikazu Shinohara","orcid":"https://orcid.org/0000-0002-3462-2268","observed_orcids":["https://orcid.org/0000-0002-3462-2268"]},"institutions":[{"id":"https://openalex.org/I205401836","display_name":"National Institute for Materials Science","ror":"https://ror.org/026v1ze26","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshikazu Shinohara","raw_affiliation_strings":["National Institute for Materials Science"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute for Materials Science","institution_ids":["https://openalex.org/I205401836"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.1304,"has_fulltext":true,"cited_by_count":3,"citation_normalized_percentile":{"value":0.38363891,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"53","issue":"8","first_page":"1481","last_page":"1485"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13251","display_name":"Electrical and Thermal Properties of Materials","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/bi2te3-thin-films","display_name":"Bi2Te3 thin films","score":0.9459999799728394},{"id":"https://openalex.org/keywords/thermoelectric-materials","display_name":"thermoelectric materials","score":0.8619999885559082},{"id":"https://openalex.org/keywords/electrodeposition","display_name":"electrodeposition","score":0.8960000276565552},{"id":"https://openalex.org/keywords/heat-treatment","display_name":"heat treatment","score":0.9020000100135803},{"id":"https://openalex.org/keywords/annealing-temperature","display_name":"annealing temperature","score":0.8679999709129333},{"id":"https://openalex.org/keywords/carrier-concentration","display_name":"carrier concentration","score":0.9070000052452087},{"id":"https://openalex.org/keywords/crystallite-size","display_name":"crystallite size","score":0.8640000224113464},{"id":"https://openalex.org/keywords/seebeck-coefficient","display_name":"Seebeck coefficient","score":0.9950000047683716},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.9980000257492065},{"id":"https://openalex.org/keywords/n-type-conductivity","display_name":"n-type conductivity","score":0.6230000257492065},{"id":"https://openalex.org/keywords/p-type-conductivity","display_name":"p-type conductivity","score":0.7839999794960022}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8720772862434387},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.7520163059234619},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7316704988479614},{"id":"https://openalex.org/C112625512","wikidata":"https://www.wikidata.org/wiki/Q1091448","display_name":"Seebeck coefficient","level":3,"score":0.6999977231025696},{"id":"https://openalex.org/C63024428","wikidata":"https://www.wikidata.org/wiki/Q552456","display_name":"Thermoelectric effect","level":2,"score":0.6913164854049683},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.688646137714386},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6140984296798706},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.6072874665260315},{"id":"https://openalex.org/C55766333","wikidata":"https://www.wikidata.org/wiki/Q11136680","display_name":"Inert gas","level":2,"score":0.5172979831695557},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.48937004804611206},{"id":"https://openalex.org/C544153396","wikidata":"https://www.wikidata.org/wiki/Q11426","display_name":"Metal","level":2,"score":0.4261462092399597},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.41816920042037964},{"id":"https://openalex.org/C207365445","wikidata":"https://www.wikidata.org/wiki/Q15020929","display_name":"Thermoelectric materials","level":3,"score":0.41229304671287537},{"id":"https://openalex.org/C97346530","wikidata":"https://www.wikidata.org/wiki/Q487005","display_name":"Thermal conductivity","level":2,"score":0.400075763463974},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.38884487748146057},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3871575593948364},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2961564362049103},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.14522305130958557},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.08670610189437866},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.056426167488098145},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.2320/matertrans.me201106","doi":"https://doi.org/10.2320/matertrans.me201106","is_oa":true,"landing_page_url":"https://doi.org/10.2320/matertrans.me201106","pdf_url":"https://www.jstage.jst.go.jp/article/matertrans/53/8/53_ME201106/_pdf","source":{"id":"https://openalex.org/S4210209311","display_name":"MATERIALS TRANSACTIONS","issn_l":"1345-9678","issn":["1345-9678","1347-5320"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4322765269","host_organization_name":"Japan Institute of Metals","host_organization_lineage":["https://openalex.org/P4322765269"],"host_organization_lineage_names":["Japan Institute of Metals"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MATERIALS TRANSACTIONS","raw_type":"journal-article"},{"id":"pmh:oai:digital.csic.es:10261/133427","doi":null,"is_oa":false,"landing_page_url":"http://hdl.handle.net/10261/133427","pdf_url":null,"source":{"id":"https://openalex.org/S4306400616","display_name":"DIGITAL.CSIC (Spanish National Research Council (CSIC))","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I134820265","host_organization_name":"Consejo Superior de Investigaciones Cient\u00edficas","host_organization_lineage":["https://openalex.org/I134820265"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Art\u00edculo"}],"best_oa_location":{"id":"doi:10.2320/matertrans.me201106","doi":"https://doi.org/10.2320/matertrans.me201106","is_oa":true,"landing_page_url":"https://doi.org/10.2320/matertrans.me201106","pdf_url":"https://www.jstage.jst.go.jp/article/matertrans/53/8/53_ME201106/_pdf","source":{"id":"https://openalex.org/S4210209311","display_name":"MATERIALS TRANSACTIONS","issn_l":"1345-9678","issn":["1345-9678","1347-5320"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4322765269","host_organization_name":"Japan Institute of Metals","host_organization_lineage":["https://openalex.org/P4322765269"],"host_organization_lineage_names":["Japan Institute of Metals"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MATERIALS TRANSACTIONS","raw_type":"journal-article"},"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","score":0.75,"display_name":"Affordable and clean energy"}],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2034587368.pdf","grobid_xml":"https://content.openalex.org/works/W2034587368.grobid-xml"},"referenced_works_count":23,"referenced_works":["https://openalex.org/W65216577","https://openalex.org/W1526120591","https://openalex.org/W1999324759","https://openalex.org/W2001307454","https://openalex.org/W2007678322","https://openalex.org/W2008375944","https://openalex.org/W2016664576","https://openalex.org/W2028285928","https://openalex.org/W2030855458","https://openalex.org/W2038174300","https://openalex.org/W2038204793","https://openalex.org/W2042056247","https://openalex.org/W2064112386","https://openalex.org/W2068326806","https://openalex.org/W2070093297","https://openalex.org/W2083196956","https://openalex.org/W2091473129","https://openalex.org/W2121928679","https://openalex.org/W2123554644","https://openalex.org/W2148596493","https://openalex.org/W2151592156","https://openalex.org/W2168703872","https://openalex.org/W4233235406"],"related_works":["https://openalex.org/W7095753646","https://openalex.org/W3034246624","https://openalex.org/W2129588758","https://openalex.org/W2127116702","https://openalex.org/W2027290231","https://openalex.org/W7134914164","https://openalex.org/W3156389402","https://openalex.org/W2041068294","https://openalex.org/W2468074351","https://openalex.org/W4410946304"],"abstract_inverted_index":{"Bi2Te3":[0],"thin":[1],"films":[2,55,105,141],"were":[3,44,89,142],"grown":[4],"on":[5,124],"a":[6,92],"large":[7],"area":[8],"of":[9,53,77,139],"n-Si/Ti/Au":[10],"substrate":[11,122],"by":[12,107,148],"an":[13,47,62],"electrochemical":[14],"process.":[15],"The":[16,132],"synthesized":[17],"film":[18],"sample":[19],"was":[20,129,146],"cut":[21],"into":[22],"four":[23],"different":[24,30],"pieces":[25],"and":[26,86,112,144],"each":[27],"piece":[28],"underwent":[29],"heat":[31],"treatments":[32],"for":[33,103],"1":[34],"h":[35],"to":[36,50,100],"optimize":[37],"their":[38,149],"carrier":[39],"concentration.":[40],"Heat":[41],"treatment":[42],"experiments":[43],"performed":[45],"in":[46,64],"inert":[48],"atmosphere":[49],"prevent":[51],"oxidation":[52],"the":[54,57,65,74,78,83,96,108,121,125,136,140],"during":[56],"treatment.":[58],"X-ray":[59],"diffraction":[60],"showed":[61],"increase":[63],"crystallite":[66],"size":[67],"with":[68],"increasing":[69],"annealing":[70],"temperatures,":[71],"which":[72],"affected":[73],"thermoelectric":[75],"performances":[76],"films.":[79],"At":[80],"room":[81],"temperature,":[82],"Seebeck":[84],"coefficient":[85],"electrical":[87],"resistivity":[88],"measured":[90,97],"using":[91],"custom-built":[93],"setup.":[94],"Initially,":[95],"conductivity":[98],"appeared":[99],"be":[101],"n-type":[102],"all":[104],"backed":[106],"metal":[109],"buffer":[110],"layer":[111],"Si":[113],"substrate.":[114],"A":[115],"simple":[116],"model":[117,133],"that":[118,135],"could":[119],"classify":[120],"contribution":[123],"overall":[126],"transport":[127],"properties":[128],"then":[130],"developed.":[131],"confirmed":[134],"actual":[137],"conductivities":[138],"p-type,":[143],"this":[145],"supported":[147],"elemental":[150],"analysis.":[151]},"counts_by_year":[{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2015,"cited_by_count":1}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2016-06-24T00:00:00"}