{"id":"https://openalex.org/W2031264071","doi":"https://doi.org/10.1117/12.2046616","title":"Methods of controlling cross-linking in negative-tone resists","display_name":"Methods of controlling cross-linking in negative-tone resists","publication_year":2014,"publication_date":"2014-03-27","ids":{"openalex":"https://openalex.org/W2031264071","doi":"https://doi.org/10.1117/12.2046616","mag":"2031264071"},"language":"en","primary_location":{"id":"doi:10.1117/12.2046616","doi":"https://doi.org/10.1117/12.2046616","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2046616","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5059167082","display_name":"Richard A. Lawson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Richard A. Lawson","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059379711","display_name":"Jun Sung Chun","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jun Sung Chun","raw_affiliation_strings":["SEMATECH Inc. (United States)","SUNY College of Nanoscale Science and Engineering (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SEMATECH Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"SUNY College of Nanoscale Science and Engineering (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079783999","display_name":"Mark O. Neisser","orcid":"https://orcid.org/0000-0002-3758-0534","observed_orcids":["https://orcid.org/0000-0002-3758-0534"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mark Neisser","raw_affiliation_strings":["Sematech, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sematech, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027096922","display_name":"Laren M. Tolbert","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Laren M. Tolbert","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113808570","display_name":"Clifford L. Henderson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Clifford L. Henderson","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":4.0145,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.95083404,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"9051","issue":null,"first_page":"90510Q","last_page":"90510Q"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/negative-tone-resist","display_name":"negative resist","score":0.8679999709129333},{"id":"https://openalex.org/keywords/chain-termination","display_name":"chain termination","score":0.7379999756813049},{"id":"https://openalex.org/keywords/photoacid-generator","display_name":"photoacid generator","score":0.6159999966621399},{"id":"https://openalex.org/keywords/resist-resolution","display_name":"resist resolution","score":0.36000001430511475},{"id":"https://openalex.org/keywords/line-edge-roughness","display_name":"line edge roughness","score":0.9660000205039978},{"id":"https://openalex.org/keywords/molecular-glasses","display_name":"molecular glasses","score":0.4020000100135803}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9171220064163208},{"id":"https://openalex.org/C2776920199","wikidata":"https://www.wikidata.org/wiki/Q408028","display_name":"Epoxide","level":3,"score":0.7057859897613525},{"id":"https://openalex.org/C183882617","wikidata":"https://www.wikidata.org/wiki/Q3046749","display_name":"Cationic polymerization","level":2,"score":0.6292784214019775},{"id":"https://openalex.org/C178907741","wikidata":"https://www.wikidata.org/wiki/Q745930","display_name":"Nucleophile","level":3,"score":0.6280267238616943},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5982010364532471},{"id":"https://openalex.org/C44228677","wikidata":"https://www.wikidata.org/wiki/Q181898","display_name":"Polymerization","level":3,"score":0.46400704979896545},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.4265672266483307},{"id":"https://openalex.org/C75473681","wikidata":"https://www.wikidata.org/wiki/Q188651","display_name":"Photochemistry","level":1,"score":0.34968602657318115},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3272262215614319},{"id":"https://openalex.org/C188027245","wikidata":"https://www.wikidata.org/wiki/Q750446","display_name":"Polymer chemistry","level":1,"score":0.30473023653030396},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.30324071645736694},{"id":"https://openalex.org/C521977710","wikidata":"https://www.wikidata.org/wiki/Q81163","display_name":"Polymer","level":2,"score":0.25028809905052185},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.1928974986076355},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.17601019144058228},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.11295825242996216},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2046616","doi":"https://doi.org/10.1117/12.2046616","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2046616","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320309321","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W617878254","https://openalex.org/W1967747853","https://openalex.org/W1971944808","https://openalex.org/W1990284496","https://openalex.org/W1991475464","https://openalex.org/W1991975839","https://openalex.org/W1996445702","https://openalex.org/W2013247052","https://openalex.org/W2016191561","https://openalex.org/W2035237992","https://openalex.org/W2058478776","https://openalex.org/W2071437586","https://openalex.org/W2092281114","https://openalex.org/W2120449835","https://openalex.org/W2141075684","https://openalex.org/W2142507821","https://openalex.org/W2220699902","https://openalex.org/W3002218115","https://openalex.org/W4232740282","https://openalex.org/W4256335425"],"related_works":["https://openalex.org/W1970487387","https://openalex.org/W2902047599","https://openalex.org/W2092281114","https://openalex.org/W2068137687","https://openalex.org/W1974226229","https://openalex.org/W2013247052","https://openalex.org/W2019401607","https://openalex.org/W1964618855","https://openalex.org/W7067722922","https://openalex.org/W1980089819"],"abstract_inverted_index":{"Negative":[0],"tone":[1,19,57,225],"resists":[2,20],"based":[3,21,198],"on":[4,22,47,199],"cross-linking":[5,89,168,307],"via":[6],"epoxide/cationic":[7],"polymerization":[8,147,421],"have":[9,93],"a":[10,43,68,71,179,240,267,318,328,335,344,368,374,380,388,408,427,434,451,466],"variety":[11],"of":[12,61,73,88,111,145,148,167,172,202,281,292,299,306,317,327,343,366,371,418,426,436,446,453,461,468],"potential":[13],"advantages":[14],"over":[15],"more":[16,230,336],"traditional":[17],"positive":[18],"photoacid":[23,69],"catalyzed":[24],"deprotection":[25],"including":[26],"low":[27],"outgassing,":[28],"intrinsic":[29],"diffusion":[30],"control,":[31],"and":[32,67,76,86,96,143,177,221,349,387,443,465],"improved":[33,219,432,481],"pattern":[34],"collapse":[35],"performance":[36,51,425],"through":[37],"the":[38,48,84,128,141,165,183,200,250,262,279,295,300,309,325,341,347,398,402,416,419,424,473,478],"higher":[39],"modulus":[40],"provided":[41],"by":[42,139],"cross-linked":[44],"network.":[45],"Based":[46],"promising":[49],"baseline":[50,375,399],"achieved":[52],"previously":[53],"in":[54,90,106,117,124,182,223,254,294,308,321,358,384,390,411,491],"simple":[55],"negative":[56,224],"systems":[58,92,126],"composed":[59],"only":[60,367,406],"an":[62,159,173,272,444,459,489],"epoxide":[63,160,226,359,376,429],"functionalized":[64],"molecular":[65],"glass":[66,186],"generator,":[70],"series":[72],"different":[74,420],"methods":[75],"additives":[77,190,253],"that":[78,235,255,339,354],"can":[79,163,236,264],"be":[80,237],"used":[81,116,320,357],"to":[82,157,170,192,249,373,392,397,450,482,494],"control":[83,135,293,422],"extent":[85,142,166],"rate":[87,144],"such":[91,158,205],"been":[94],"developed":[95,197,234],"are":[97],"reported":[98],"here":[99],"which":[100,208],"allow":[101],"for":[102,218,289],"even":[103,476],"further":[104],"improvement":[105,383],"resist":[107,184,227,377,400,430],"performance.":[108],"Simple":[109],"addition":[110,201],"base":[112,193],"quencher,":[113],"as":[114,206,211,239,395],"is":[115,122,132,324,355],"conventional":[118],"chemically":[119],"amplified":[120],"resists,":[121],"ineffective":[123],"these":[125],"because":[127],"patterning":[129],"reaction":[130,175],"mechanism":[131],"different.":[133],"Any":[134],"method":[136],"must":[137],"work":[138],"modifying":[140],"cationic":[146],"epoxides.":[149],"By":[150,414,471],"adding":[151],"molecules":[152],"containing":[153],"phenolic":[154],"OH":[155],"groups":[156],"resist,":[161,301],"one":[162],"slow":[164],"due":[169],"introduction":[171],"additional":[174,273],"pathway":[176],"often":[178],"concomitant":[180],"increase":[181,410,490],"resin":[185],"transition":[187],"temperature.":[188],"Generalized":[189],"similar":[191],"quencher":[194],"were":[195],"also":[196],"strong":[203,251],"nucleophiles":[204],"triphenylphosphine":[207],"act":[209,265],"essentially":[210],"chain":[212,258,268,284],"termination":[213],"agents.":[214],"This":[215,286],"approach":[216,287],"allows":[217,288],"resolution":[220,386,435,452,479],"LER":[222,391,445,460],"systems.":[228],"A":[229],"superior":[231],"additive":[232,404,474],"was":[233,431,480],"described":[238],"photodecomposable":[241],"nucleophile":[242,252],"(PDN).":[243],"The":[244],"unexposed":[245,297],"PDN":[246,263,319,403],"acts":[247],"similarly":[248],"it":[256],"terminates":[257],"propagation.":[259,285],"Upon":[260],"exposure,":[261],"like":[266],"transfer":[269],"agent":[270],"or":[271],"initiator,":[274],"but":[275,302],"no":[276],"longer":[277],"has":[278],"effect":[280],"completely":[282],"terminating":[283],"high":[290,304],"levels":[291],"nominally":[296],"regions":[298],"maintains":[303],"efficiency":[305],"most":[310],"highly":[311,350],"exposed":[312],"regions.":[313],"One":[314],"particular":[315,428],"implementation":[316],"this":[322],"study":[323],"blending":[326],"PAG":[329,353],"(i.e.":[330,361],"triphenylsulfonium":[331,362],"triflate,":[332],"TPS-Tf)":[333],"with":[334,346,458,488],"nucleophilic":[337],"anion":[338],"plays":[340],"role":[342],"PDN,":[345],"common":[348],"effective,":[351],"non-nucleophilic":[352],"conventionally":[356],"photopolymerizations":[360],"hexafluoroantimonate,":[363],"TPS-SbF6).":[364],"Addition":[365],"few":[369],"percent":[370],"TPS-Tf":[372],"formulation":[378],"shows":[379],"5-10":[381],"nm":[382,440,449,455,484],"ultimate":[385],"reduction":[389],"around":[393,447,462],"65%":[394],"compared":[396],"without":[401],"while":[405],"incurring":[407],"moderate":[409],"imaging":[412,492],"dose.":[413],"modulating":[415],"amount":[417],"additives,":[423],"from":[433],"greater":[437],"than":[438],"30":[439],"half":[441,456,485],"pitch":[442],"9":[448],"~20":[454],"pitch,":[457,486],"4":[463],"nm,":[464],"sensitivity":[467],"18":[469],"mJ/cm2.":[470,496],"increasing":[472],"loading":[475],"further,":[477],"~18":[483],"although":[487],"dose":[493],"39":[495]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":4}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}