{"id":"https://openalex.org/W202947585","doi":null,"title":"Structural and mechanical characterisation of nanocomposite Al2O3-ZrO2 thin films grown by reactive dual radio-frequency magnetron sputtering\u201d","display_name":"Structural and mechanical characterisation of nanocomposite Al2O3-ZrO2 thin films grown by reactive dual radio-frequency magnetron sputtering\u201d","publication_year":2006,"publication_date":"2006-01-01","ids":{"openalex":"https://openalex.org/W202947585","mag":"202947585"},"language":"en","primary_location":{"id":"mag:202947585","doi":null,"is_oa":false,"landing_page_url":"http://liu.diva-portal.org/smash/record.jsf?pid=diva2:22531","pdf_url":null,"source":null,"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null},"volume":null,"type":"article","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111404401","display_name":"David Huy Trinh","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"David Huy Trinh","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003123589","display_name":"Mikael Ottosson","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mikael Ottosson","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":null,"display_name":"Markus Beckers","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Markus Beckers","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000335076","display_name":"M. Collin","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"M. Collin","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046542999","display_name":"Ingrid Reineck","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"I. Reineck","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086073947","display_name":"Lars Hultman","orcid":"https://orcid.org/0000-0002-2837-3656","observed_orcids":["https://orcid.org/0000-0002-2837-3656"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Lars Hultman","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0002-2837-3656","affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5064179326","display_name":"Hans H\u00f6gberg","orcid":"https://orcid.org/0000-0002-1956-483X","observed_orcids":["https://orcid.org/0000-0002-1956-483X"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hans H\u00f6gberg","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":93},"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9922000169754028,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9922000169754028,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.0013000000035390258,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.0008999999845400453,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/reactive-magnetron-sputtering","display_name":"reactive magnetron sputtering","score":0.7990000247955322},{"id":"https://openalex.org/keywords/structural-characterization","display_name":"structural characterization","score":0.7599999904632568},{"id":"https://openalex.org/keywords/mechanical-properties","display_name":"mechanical properties","score":0.9290000200271606},{"id":"https://openalex.org/keywords/ceramic-thin-films","display_name":"ceramic thin films","score":0.5}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7276102304458618},{"id":"https://openalex.org/C92880739","wikidata":"https://www.wikidata.org/wiki/Q2639556","display_name":"Nanocomposite","level":2,"score":0.6256108283996582},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.6231110692024231},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.5900236964225769},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.4989302158355713},{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.49036502838134766},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.4738999903202057},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4399912357330322},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3667624890804291},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.35697299242019653},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2686924934387207}],"mesh":[],"locations_count":1,"locations":[{"id":"mag:202947585","doi":null,"is_oa":false,"landing_page_url":"http://liu.diva-portal.org/smash/record.jsf?pid=diva2:22531","pdf_url":null,"source":null,"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2015532267","https://openalex.org/W2072100728","https://openalex.org/W3137787488","https://openalex.org/W2587433012","https://openalex.org/W2004221670","https://openalex.org/W2168043202","https://openalex.org/W2736062673","https://openalex.org/W3016239086","https://openalex.org/W7098115698","https://openalex.org/W73472394"],"abstract_inverted_index":{"Structural":[0],"and":[1],"mechanical":[2],"characterisation":[3],"of":[4],"nanocomposite":[5],"Al2O3-ZrO2":[6],"thin":[7],"films":[8],"grown":[9],"by":[10],"reactive":[11],"dual":[12],"radio-frequency":[13],"magnetron":[14],"sputtering\u201d":[15]},"counts_by_year":[{"year":2021,"cited_by_count":1}],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}