{"id":"https://openalex.org/W2028291675","doi":"https://doi.org/10.1016/0167-9317(94)00071-2","title":"Electron beam nanolithography with image reversal by ECR plasma oxidation","display_name":"Electron beam nanolithography with image reversal by ECR plasma oxidation","publication_year":1995,"publication_date":"1995-02-01","ids":{"openalex":"https://openalex.org/W2028291675","doi":"https://doi.org/10.1016/0167-9317(94)00071-2","mag":"2028291675"},"language":"en","primary_location":{"id":"doi:10.1016/0167-9317(94)00071-2","doi":"https://doi.org/10.1016/0167-9317(94)00071-2","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0167-9317(94)00071-2","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5022094077","display_name":"K. Kurihara","orcid":"https://orcid.org/0000-0002-2652-3630","observed_orcids":["https://orcid.org/0000-0002-2652-3630"]},"institutions":[{"id":"https://openalex.org/I2251713219","display_name":"NTT (Japan)","ror":"https://ror.org/00berct97","country_code":"JP","type":"company","lineage":["https://openalex.org/I2251713219"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Kurihara","raw_affiliation_strings":["NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","institution_ids":["https://openalex.org/I2251713219"]},{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#","institution_ids":["https://openalex.org/I2251713219"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5012713041","display_name":"K. Iwadate","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2251713219","display_name":"NTT (Japan)","ror":"https://ror.org/00berct97","country_code":"JP","type":"company","lineage":["https://openalex.org/I2251713219"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Iwadate","raw_affiliation_strings":["NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","institution_ids":["https://openalex.org/I2251713219"]},{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#","institution_ids":["https://openalex.org/I2251713219"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109875417","display_name":"H. Namatsu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2251713219","display_name":"NTT (Japan)","ror":"https://ror.org/00berct97","country_code":"JP","type":"company","lineage":["https://openalex.org/I2251713219"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Namatsu","raw_affiliation_strings":["NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","institution_ids":["https://openalex.org/I2251713219"]},{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#","institution_ids":["https://openalex.org/I2251713219"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081457988","display_name":"Masao Nagase","orcid":"https://orcid.org/0000-0002-2550-0146","observed_orcids":["https://orcid.org/0000-0002-2550-0146"]},"institutions":[{"id":"https://openalex.org/I2251713219","display_name":"NTT (Japan)","ror":"https://ror.org/00berct97","country_code":"JP","type":"company","lineage":["https://openalex.org/I2251713219"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Nagase","raw_affiliation_strings":["NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","institution_ids":["https://openalex.org/I2251713219"]},{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#","institution_ids":["https://openalex.org/I2251713219"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5085777680","display_name":"Katsumi Murase","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2251713219","display_name":"NTT (Japan)","ror":"https://ror.org/00berct97","country_code":"JP","type":"company","lineage":["https://openalex.org/I2251713219"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Murase","raw_affiliation_strings":["NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01","institution_ids":["https://openalex.org/I2251713219"]},{"raw_affiliation_string":"NTT LSI Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa ,Japan243-01#TAB#","institution_ids":["https://openalex.org/I2251713219"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I2251713219"],"apc_list":{"value":2860,"currency":"USD","value_usd":2860},"apc_paid":null,"fwci":2.3153,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.86581662,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"27","issue":"1-4","first_page":"125","last_page":"128"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/image-reversal","display_name":"image reversal","score":0.9760000109672546},{"id":"https://openalex.org/keywords/silicon-oxidation","display_name":"silicon oxidation","score":0.6110000014305115},{"id":"https://openalex.org/keywords/koh-anisotropic-etching","display_name":"KOH anisotropic etching","score":0.984000027179718},{"id":"https://openalex.org/keywords/resist-patterning","display_name":"resist patterning","score":0.6800000071525574}],"concepts":[{"id":"https://openalex.org/C162117346","wikidata":"https://www.wikidata.org/wiki/Q1106386","display_name":"Nanolithography","level":4,"score":0.8180885314941406},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7076661586761475},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.6817209720611572},{"id":"https://openalex.org/C107187091","wikidata":"https://www.wikidata.org/wiki/Q2392011","display_name":"Plasma etching","level":4,"score":0.6258439421653748},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.6166655421257019},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5603153705596924},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.518559992313385},{"id":"https://openalex.org/C95312477","wikidata":"https://www.wikidata.org/wiki/Q207340","display_name":"Cathode ray","level":3,"score":0.514577329158783},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.504351019859314},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.40061309933662415},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.37056857347488403},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.3550962805747986},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.1281455159187317},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.11836108565330505},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0167-9317(94)00071-2","doi":"https://doi.org/10.1016/0167-9317(94)00071-2","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0167-9317(94)00071-2","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1964657883","https://openalex.org/W1976150617","https://openalex.org/W1985766013","https://openalex.org/W2002621134","https://openalex.org/W2086800239"],"related_works":["https://openalex.org/W2064085184","https://openalex.org/W2074178636","https://openalex.org/W1989801961","https://openalex.org/W2002251907","https://openalex.org/W2062835433","https://openalex.org/W2068325543","https://openalex.org/W1982984183","https://openalex.org/W1989003107","https://openalex.org/W2083155109","https://openalex.org/W1975439088"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2016-06-24T00:00:00"}